⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15160848 | 0.92 | DNM1 (0.45) | — | |
| SCHEMBL4580487 | 0.90 | DNM1 (0.48) | — | |
| SCHEMBL5843129 | 0.90 | ADRB2 (0.35) | — | |
| SCHEMBL3502859 | 0.90 | DNM1 (0.48) | — | |
| SCHEMBL27629301 | 0.90 | DNM1 (0.48) | — | |
| SCHEMBL115527 | 0.86 | LMNA (0.47) | — | |
| SCHEMBL441399 | 0.83 | — | — | |
| SCHEMBL30539136 | 0.83 | LMNA (0.45) | — | |
| SCHEMBL1609081 | 0.82 | — | — | |
| SCHEMBL28049516 | 0.81 | DNM1 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 78 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9678425-B2 | Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation | CENTRAL GLASS COMPANY, LIMITED (JP) | 2017-06-13 | — | — | US | disclosed |
| US-9678426-B2 | Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation | CENTRAL GLASS COMPANY, LIMITED (JP) | 2017-06-13 | — | — | US | disclosed |
| US-9678426-B2 | Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation | CENTRAL GLASS COMPANY, LIMITED (JP) | 2017-06-13 | — | — | US | disclosed |
| US-9678425-B2 | Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation | CENTRAL GLASS COMPANY, LIMITED (JP) | 2017-06-13 | — | — | US | disclosed |
| US-9627204-B2 | Composition for forming a coating type BPSG film, substrate formed a film by said composition, and patterning process using said composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-04-18 | — | — | US | disclosed |
| US-9604891-B2 | Methods for producing fluorine-containing hydroxyaldehyde, fluorine-containing propanediol, and fluorine-containing alcohol monomer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2017-03-28 | — | — | US | disclosed |
| US-9604891-B2 | Methods for producing fluorine-containing hydroxyaldehyde, fluorine-containing propanediol, and fluorine-containing alcohol monomer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2017-03-28 | — | — | US | disclosed |
| EP-2599818-B1 | Silicon-containing resist underlayer film-forming composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2017-02-01 | — | — | EP | disclosed |
| US-20150361026-A1 | Methods for Producing Fluorine-Containing Hydroxyaldehyde, Fluorine-Containing Propanediol, and Fluorine-Containing Alcohol Monomer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-12-17 | — | — | US | disclosed |
| US-20150361026-A1 | Methods for Producing Fluorine-Containing Hydroxyaldehyde, Fluorine-Containing Propanediol, and Fluorine-Containing Alcohol Monomer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-12-17 | — | — | US | disclosed |
| EP-1122605-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| EP-1085379-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-03-21 | — | — | EP | disclosed |
| EP-1059279-A1 | Polyvinyl ether compound and method of preperation | IDEMITSU KOSAN CO., LTD. (JP) | 2000-12-13 | — | — | EP | disclosed |
| US-6001979-A | AMINO-, IMINO, HYDRAZINO AND AZO SALTS OF TECHNETIUM COMPLEXED WITH NEUTRAL LIGANDS | NYCOMED AMERSHAM PLC (GB) | 1999-12-14 | — | — | US | disclosed |
| EP-0644175-B1 | POLYVINYL ETHER COMPOUND AND LUBRICATING OIL | IDEMITSU KOSAN CO (JP) | 1999-10-20 | — | — | EP | disclosed |
| US-5616812-A | POLYMERIZING VINYL ETHER IN THE PRESENCE OF CATALYST AND SPECIFIC ACETAL | IDEMITSU KOSAN CO., LTD. (JP) | 1997-04-01 | — | — | US | disclosed |
| US-5589597-A | HYDROGENATION | IDEMITSU KOSAN CO., LTD. (JP) | 1996-12-31 | — | — | US | disclosed |
| US-5523491-A | REACTING ACETAL OR KETAL COMPOUND WITH HYDROGEN IN PRESENCE OF HYDROGENATION AND SOLID ACID CATALYSTS | IDEMITSU KOSAN CO., LTD. (JP) | 1996-06-04 | — | — | US | disclosed |
| EP-0644175-A1 | POLYVINYL ETHER COMPOUND AND LUBRICATING OIL | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1995-03-22 | — | — | EP | disclosed |
| US-5399631-A | Polyvinyl ether compound | IDEMITSU KOSAN CO., LTD. (JP) | 1995-03-21 | — | — | US | disclosed |