Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.52 |
| ▸ | HPGD | P15428 | 5/20 | 0.52 |
| ▸ | HSD17B10 | Q99714 | 4/20 | 0.52 |
| ▸ | CYP1A2 | P05177 | 4/20 | 0.52 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.52 |
| ▸ | TSHR | P16473 | 3/20 | 0.52 |
| ▸ | CYP1A1 | P04798 | 2/20 | 0.52 |
| ▸ | CYP1B1 | Q16678 | 2/20 | 0.52 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.52 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.52 |
| ▸ | ERBB2 | P04626 | 1/20 | 0.48 |
| ▸ | FYN | P06241 | 1/20 | 0.48 |
| ▸ | MAOA | P21397 | 1/20 | 0.48 |
| ▸ | ACHE | P22303 | 1/20 | 0.48 |
| ▸ | AHR | P35869 | 1/20 | 0.48 |
| ▸ | THRB | P10828 | 1/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.42 |
| ▸ | MEN1 | O00255 | 2/20 | 0.42 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.40 |
| ▸ | MAPT | P10636 | 2/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31529058 | 1.00 | ALDH1A1 (0.52) | ALDH1A1HPGDHSD17B10CYP1A2CYP3A4 | |
| SCHEMBL444099 | 0.90 | ALDH1A1 (0.50) | ALDH1A1HPGDHSD17B10CYP1A2CYP3A4 | |
| SCHEMBL443084 | 0.86 | CYP1A2 (0.46) | ALDH1A1HPGDHSD17B10CYP1A2CYP3A4 | |
| SCHEMBL27589979 | 0.84 | ALDH1A1 (0.46) | ALDH1A1HPGDHSD17B10CYP1A2CYP3A4 | |
| SCHEMBL15428349 | 0.82 | ALDH1A1 (0.48) | ALDH1A1HPGDHSD17B10CYP1A2CYP3A4 | |
| SCHEMBL2351815 | 0.82 | HPGD (0.54) | ALDH1A1HPGDHSD17B10CYP1A2CYP3A4 | |
| SCHEMBL717395 | 0.80 | ALDH1A1 (0.47) | ALDH1A1HPGDHSD17B10CYP1A2CYP3A4 | |
| SCHEMBL276464 | 0.79 | HPGD (0.39) | ALDH1A1HPGDHSD17B10CYP1A2CYP3A4 | |
| SCHEMBL27786585 | 0.79 | ALDH1A1 (0.45) | ALDH1A1HPGDHSD17B10CYP1A2CYP3A4 | |
| SCHEMBL14101036 | 0.78 | ALDH1A1 (0.42) | ALDH1A1HPGDHSD17B10CYP1A2TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8846846-B2 | Naphthalene derivative, resist bottom layer material, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-30 | — | — | US | claimed |
| US-20120064725-A1 | NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-15 | — | — | US | claimed |
| US-9045587-B2 | Naphthalene derivative, resist bottom layer material, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-06-02 | — | — | US | disclosed |
| US-20140363768-A1 | NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-12-11 | — | — | US | disclosed |
| US-8846846-B2 | Naphthalene derivative, resist bottom layer material, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-30 | — | — | US | disclosed |
| US-20120064725-A1 | NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-15 | — | — | US | disclosed |
| WO-2011018355-A1 | PRESSURE-SENSITIVE PAINT | Deutsches Zentrum für Luft- und Raumfahrt e.V. (DE) | 2011-02-17 | — | — | WO | disclosed |