SCHEMBL444099

SCHEMBL444099

c1ccc2c(Oc3ccc4ccc5cccc6ccc3c4c56)cccc2c1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.50
HSD17B10 Q99714 5/20 0.50
HPGD P15428 4/20 0.50
CYP1A2 P05177 3/20 0.50
ERBB2 P04626 1/20 0.50
FYN P06241 1/20 0.50
MAOA P21397 1/20 0.50
ACHE P22303 1/20 0.50
AHR P35869 1/20 0.50
THRB P10828 1/20 0.50
TSHR P16473 3/20 0.44
TDP1 Q9NUW8 3/20 0.44
CYP3A4 P08684 2/20 0.44
L3MBTL1 Q9Y468 2/20 0.44
HPRT1 P00492 1/20 0.43
CYP1A1 P04798 1/20 0.42
CYP1B1 Q16678 1/20 0.42
HTR1B P28222 2/20 0.42
ESRRA P11474 1/20 0.41
MAPT P10636 2/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL442152 0.90 ALDH1A1 (0.52) ALDH1A1HSD17B10HPGDCYP1A2ERBB2
SCHEMBL31529058 0.90 ALDH1A1 (0.52) ALDH1A1HSD17B10HPGDCYP1A2ERBB2
SCHEMBL14101036 0.88 ALDH1A1 (0.42) ALDH1A1HSD17B10HPGDCYP1A2ERBB2
SCHEMBL442767 0.83 HTR1B (0.54) ALDH1A1HSD17B10HPGDCYP1A2TSHR
SCHEMBL29577853 0.83 HTR1B (0.54) ALDH1A1HSD17B10HPGDCYP1A2TSHR
SCHEMBL441360 0.82 HPRT1 (0.61) ALDH1A1HSD17B10HPGDCYP1A2THRB
Lithium SCHEMBL6571336 0.81 HTR1B (0.52) ALDH1A1HSD17B10HPGDCYP1A2TSHR
Methane SCHEMBL10959030 0.81 HTR1B (0.52) ALDH1A1HSD17B10HPGDCYP1A2TSHR
SCHEMBL27559989 0.81 HTR1B (0.52) ALDH1A1HSD17B10HPGDCYP1A2TSHR
SCHEMBL7457103 0.81 HTR1B (0.52) ALDH1A1HSD17B10HPGDCYP1A2TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8846846-B2 Naphthalene derivative, resist bottom layer material, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-30 US claimed
US-20120064725-A1 NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-03-15 US claimed
US-9045587-B2 Naphthalene derivative, resist bottom layer material, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-06-02 US disclosed
US-20140363768-A1 NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-12-11 US disclosed
US-8846846-B2 Naphthalene derivative, resist bottom layer material, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-30 US disclosed
US-20120064725-A1 NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-03-15 US disclosed