SCHEMBL443084

SCHEMBL443084

c1ccc(Oc2ccc3ccc4cccc5ccc2c3c45)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 4/20 0.46
ERBB2 P04626 1/20 0.46
FYN P06241 1/20 0.46
MAOA P21397 1/20 0.46
ACHE P22303 1/20 0.46
AHR P35869 1/20 0.46
ALDH1A1 P00352 4/20 0.45
HPGD P15428 4/20 0.45
HSD17B10 Q99714 3/20 0.45
THRB P10828 1/20 0.45
TSHR P16473 3/20 0.44
CYP3A4 P08684 3/20 0.44
TDP1 Q9NUW8 2/20 0.44
L3MBTL1 Q9Y468 1/20 0.44
CYP1A1 P04798 1/20 0.42
CYP1B1 Q16678 1/20 0.42
LTA4H P09960 1/20 0.41
KMT2A Q03164 2/20 0.40
MEN1 O00255 1/20 0.40
HRH1 P35367 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16574516 0.94 LTA4H (0.46) CYP1A2ALDH1A1HPGDHSD17B10THRB
SCHEMBL31529058 0.86 ALDH1A1 (0.52) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL442152 0.86 ALDH1A1 (0.52) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL21179294 0.85 CYP1A2 (0.50) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL6516074 0.81 CYP1A2 (0.52) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL444099 0.81 ALDH1A1 (0.50) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL276465 0.80 ALDH1A1 (0.41) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL16890107 0.79 GAA (0.41) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL6293916 0.79 CYP1A2 (0.49) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL14101043 0.77 TSHR (0.42) CYP1A2ALDH1A1HPGDHSD17B10TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8846846-B2 Naphthalene derivative, resist bottom layer material, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-30 US claimed
US-20120064725-A1 NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-03-15 US claimed
US-9045587-B2 Naphthalene derivative, resist bottom layer material, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-06-02 US disclosed
US-20140363768-A1 NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-12-11 US disclosed
US-8846846-B2 Naphthalene derivative, resist bottom layer material, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-30 US disclosed
US-20120064725-A1 NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-03-15 US disclosed