SCHEMBL4422418

SCHEMBL4422418

C=CCNC(CC=C)C(=C)C(=O)O

nearest known ligand 0.36

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
GRIK1 P39086 2/20 0.32
GRIK2 Q13002 2/20 0.32
ALOX15 P16050 1/20 0.31
HSD17B10 Q99714 1/20 0.31
MAPT P10636 1/20 0.31
CYP2C19 P33261 1/20 0.31
CPA1 P15085 1/20 0.31
FAAH O00519 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10782171 0.83 FAAH (0.33) TSHRSMN1; SMN2ALOX15HSD17B10MAPT
SCHEMBL11232959 0.79 GRN (0.31)
SCHEMBL1489421 0.74 ALDH1A1 (0.33) TSHRSMN1; SMN2ALOX15HSD17B10MAPT
SCHEMBL6404366 0.74 GRIK1 (0.30) GRIK1GRIK2
SCHEMBL362182 0.70 GRIK1 (0.47) GRIK1GRIK2ALOX15HSD17B10MAPT
SCHEMBL2286678 0.69 TGFBR1 (0.42) TSHRSMN1; SMN2GRIK1GRIK2MAPT
SCHEMBL2286681 0.69 TGFBR1 (0.42) TSHRSMN1; SMN2GRIK1GRIK2MAPT
SCHEMBL278696 0.69 MAPT (0.37) GRIK1GRIK2ALOX15HSD17B10MAPT
SCHEMBL31199 0.69 CYP2C19 (0.39) GRIK1GRIK2ALOX15HSD17B10MAPT
SCHEMBL902141 0.69 CYP2C19 (0.39) GRIK1GRIK2ALOX15HSD17B10MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10781334-B2 Compositions comprising a copolymer of a solid grade oligomer and a hydrophobic monomer and/or a gas-phase monomer and methods of making the same BASF SE (DE) 2020-09-22 US disclosed
US-20160032138-A1 COMPOSITIONS COMPRISING A COPOLYMER OF A SOLID GRADE OLIGOMER AND A HYDROPHOBIC MONOMER AND/OR A GAS-PHASE MONOMER AND METHODS OF MAKING THE SAME BASF SE (DE) 2016-02-04 US disclosed
US-20090156739-A1 Process for the Preparation of a Dry Powder of a Polymeric Additive CIBA CORP. 2009-06-18 US disclosed
EP-2046850-A1 BLOCK COPOLYMERS OF DIALLYLDIALKYLAMMONIUM DERIVATIVES Ciba Holding Inc. (CH) 2009-04-15 EP disclosed
WO-2008015136-A1 BLOCK COPOLYMERS OF DIALLYLDIALKYLAMMONIUM DERIVATIVES CIBA HOLDING INC. (CH) 2008-02-07 WO disclosed
US-20080033115-A1 Block copolymers of diallyldialkylammonium derivatives CIBA SPECIALTY CHEMICALS CORP. 2008-02-07 US disclosed
EP-0764506-B1 PROCESS FOR PRODUCING MULTI-LAYER MOLDED ARTICLES ARACO KK (JP) 2002-01-02 EP disclosed
US-5961902-A Manufacturing method for molded multilayer article ARACO KABUSHIKI KAISHA (JP) 1999-10-05 US disclosed
EP-0764506-A1 PROCESS FOR PRODUCING MULTI-LAYER MOLDED ARTICLES ARACO KABUSHIKI KAISHA (JP) 1997-03-26 EP disclosed
EP-0737132-A1 POLYMER-COATED MULTI-LAYER MATERIAL AND PROCESS FOR PRODUCING IT Lanitz, Siegfried (DE) 1996-10-16 EP disclosed
WO-1996014208-A1 POLYMER-COATED MULTI-LAYER MATERIAL AND PROCESS FOR PRODUCING IT PIESOLD, Rosemarie (DE) 1996-05-17 WO disclosed
EP-0248424-B1 PHOTOSENSITIVE REGISTRATION ELEMENT BASF Aktiengesellschaft (DE) 1991-06-12 EP disclosed
EP-0194440-B1 LIGHT-SENSITIVE REGISTRATION MATERIAL BASF Aktiengesellschaft (DE) 1988-05-04 EP disclosed
EP-0194440-A1 Light-sensitive registration material BASF Aktiengesellschaft (DE) 1986-09-17 EP disclosed