⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29779954 | 0.84 | FFAR3 (0.30) | — | |
| SCHEMBL29065871 | 0.79 | FFAR3 (0.41) | — | |
| SCHEMBL632284 | 0.79 | FFAR3 (0.41) | — | |
| SCHEMBL8415864 | 0.76 | — | — | |
| SCHEMBL30203760 | 0.73 | — | — | |
| SCHEMBL30730735 | 0.73 | OR51E2 (0.40) | — | |
| SCHEMBL11007102 | 0.72 | LDHA (0.38) | — | |
| SCHEMBL6526896 | 0.71 | — | — | |
| SCHEMBL512417 | 0.71 | FFAR3 (0.35) | — | |
| SCHEMBL16554200 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 780 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4661890-A1 | PTP1B/TC-PTP DUAL INHIBITORS AND PROTEIN DEGRADERS | Purdue Research Foundation (US) | 2025-12-17 | — | — | EP | claimed |
| CN-118791520-A | Synthesis method of tri (trimethylsilyl) phosphate | 山东阳谷华泰化工股份有限公司 | 2024-10-18 | — | — | CN | claimed |
| CN-118146863-B | Water-soluble wafer cutting fluid and preparation method thereof | 辽宁格物精细化工科技有限公司 | 2024-09-06 | — | — | CN | claimed |
| WO-2024167565-A1 | PTP1B/TC-PTP DUAL INHIBITORS AND PROTEIN DEGRADERS | PURDUE RESEARCH FOUNDATION (US) | 2024-08-15 | — | — | WO | claimed |
| CN-118146863-A | Water-soluble wafer cutting fluid and preparation method thereof | 辽宁格物精细化工科技有限公司 | 2024-06-07 | — | — | CN | claimed |
| CN-116525936-A | Electrolyte containing silicon-based lithium salt and preparation method and application thereof | 厦门稀土材料研究所 | 2023-08-01 | — | — | CN | claimed |
| CN-116022802-A | Nonmetal high-entropy compound and preparation method and application thereof | 广州大学 | 2023-04-28 | — | — | CN | claimed |
| CN-115699259-A | Surface treatment method for semiconductor substrate and surface treatment agent composition | 中央硝子株式会社 | 2023-02-03 | — | — | CN | claimed |
| CN-115458794-A | Non-ignition high-energy-density sodium ion/lithium ion solid-state battery and production method thereof | 新疆赛创新能源有限公司 | 2022-12-09 | — | — | CN | claimed |
| CN-110395939-B | Waterproof enhanced alkali-free liquid accelerator and preparation method thereof | 科之杰新材料集团有限公司 | 2022-04-22 | — | — | CN | claimed |
| US-6042994-A | FORMING A NANOPOROUS DIELECTRIC COMPOSITION ON A SUBSTRATE, OPTIONALLY SURFACE MODIFYING IT, OPTIONALLY HEATING TO EVAPORATE SOLVENT, EXPOSING TO ELECTRON BEAM RADIATION, AND OPTIONALLY THERMAL ANNEALING; STRENGTH, SOLVENT RESISTANCE | ALLIEDSIGNAL INC. (US) | 2000-03-28 | — | — | US | claimed |
| WO-2000002233-A2 | SIMPLIFIED PROCESS FOR PRODUCING NANOPOROUS SILICA | ALLIEDSIGNAL INC. (US) | 2000-01-13 | — | — | WO | claimed |
| WO-1999036953-A1 | NANOPOROUS SILICA DIELECTRIC FILMS MODIFIED BY ELECTRON BEAM EXPOSURE AND HAVING LOW DIELECTRIC CONSTANT AND LOW WATER CONTENT | ALLIEDSIGNAL INC. (US) | 1999-07-22 | — | — | WO | claimed |
| US-5919552-A | Coated substrates and methods | XEROX CORPORATION (US) | 1999-07-06 | — | — | US | claimed |
| EP-0583338-B1 | METHOD FOR SYNTHESIZING PEPTIDES, NOVEL AMINO ACID DERIVATIVES USED THEREIN, AND METHODS FOR PREPARING SAME | PROPEPTIDE SA (FR) | 1997-03-12 | — | — | EP | claimed |
| US-5049611-A | RTV elastomers | DOW CORNING CORPORATION (US) | 1991-09-17 | — | — | US | claimed |
| EP-0291670-B1 | VAPOR PHASE PHOTORESIST SILYLATION PROCESS | International Business Machines Corporation (US) | 1991-02-20 | — | — | EP | claimed |
| US-4808511-A | N,N-DIMETHYLAMINOTRIMETHYLSILANE, TRIMETHYLSILYLACETATE | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1989-02-28 | — | — | US | claimed |
| EP-0291670-A1 | Vapor phase photoresist silylation process | International Business Machines Corporation (US) | 1988-11-23 | — | — | EP | claimed |
| US-4282145-A | Process for the preparation of azetidines | GIST-BROCADES N.V. (NL) | 1981-08-04 | — | — | US | claimed |