SCHEMBL4428760

SCHEMBL4428760

C[Zr](C)(=[SiH2])(Cl)(Cl)(C1C=Cc2ccccc21)C1C=Cc2ccccc21

nearest known ligand 0.33

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTR2A P28223 2/20 0.33
HTR6 P50406 1/20 0.33
SIGMAR1 Q99720 4/20 0.31
KDM4E B2RXH2 2/20 0.31
BRD4 O60885 1/20 0.31
CCL2 P13500 1/20 0.31
LMNA P02545 1/20 0.31
TP53 P04637 1/20 0.31
CHRM2 P08172 1/20 0.31
CYP3A4 P08684 1/20 0.31
CYP2D6 P10635 1/20 0.31
CHRM1 P11229 1/20 0.31
DRD2 P14416 1/20 0.31
ADRA2B P18089 1/20 0.31
ADRA2C P18825 1/20 0.31
NFKB1 P19838 1/20 0.31
CHRM3 P20309 1/20 0.31
SLC6A2 P23975 1/20 0.31
HTR2C P28335 1/20 0.31
ADRA1A P35348 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5354275 0.85 HTR2A (0.35) HTR2AHTR6SIGMAR1KDM4EBRD4
Hydrochloric Acid SCHEMBL9069920 0.83 HTR2A (0.34) HTR2AHTR6SIGMAR1KDM4EBRD4
SCHEMBL721748 0.81 HTR2A (0.33) HTR2AHTR6SIGMAR1KDM4EBRD4
SCHEMBL936685 0.81 SIGMAR1 (0.34) HTR2AHTR6SIGMAR1KDM4EBRD4
SCHEMBL7883112 0.79 SIGMAR1 (0.40) HTR2AHTR6SIGMAR1
SCHEMBL6857340 0.79 HTR6 (0.32) HTR2AHTR6SIGMAR1
SCHEMBL7605525 0.79 SIGMAR1 (0.33) HTR2AHTR6SIGMAR1
SCHEMBL7766805 0.79 HTR2A (0.35) HTR2AHTR6SIGMAR1KDM4ELMNA
SCHEMBL6906180 0.79 SIGMAR1 (0.33) HTR2AHTR6SIGMAR1
SCHEMBL7640273 0.76 HTR2A (0.33) HTR2AHTR6SIGMAR1KDM4ELMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12393116-B2 Pattern forming method, photosensitive resin composition, cured film, laminate, and device FUJIFILM CORPORATION (JP) 2025-08-19 US disclosed
EP-3893053-B1 PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, CURED FILM, MULTILAYER BODY AND DEVICE FUJIFILM CORP (JP) 2025-01-22 EP disclosed
US-12078929-B2 Photosensitive resin composition, pattern forming method, cured film, laminate, and device FUJIFILM CORPORATION (JP) 2024-09-03 US disclosed
EP-3893053-A1 PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, CURED FILM, MULTILAYER BODY AND DEVICE FUJIFILM Corporation (JP) 2021-10-13 EP disclosed
US-20210302835-A1 PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, CURED FILM, LAMINATE, AND DEVICE FUJIFILM CORPORATION (JP) 2021-09-30 US disclosed
EP-0818472-B2 Cyclic olefin copolymers, compositions and molded articles comprising the copolymers IDEMITSU KOSAN CO (JP) 2009-07-29 EP disclosed
US-7531605-B2 Process for producing polyolefin resin composition and polypropylene composition IDEMITSU KOSAN CO., LTD. (JP) 2009-05-12 US disclosed
EP-1375538-B1 PROCESS FOR PRODUCING POLYOLEFIN RESIN COMPOSITION AND POLYPROPYLENE COMPOSITION IDEMITSU KOSAN CO (JP) 2008-01-09 EP disclosed
US-6787617-B1 FORMING NARROW MOLECULAR WEIGHT HOMOPOLYMERS AS INTERMEDIATES TO BLOCK OR TERMINAL FUNCTIONALIZED POLYMERS; HAFNIUM OR ZIRCONIUM CYCLOPENTADIENYL FUNCTIONALIZED CATALYSTS WITH TRIPHENYLBORON AND TRIALKYLALUMINUM COMPOUNDS JAPAN AS REPRESENTED BY DIRECTOR GENERAL OF THE AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2004-09-07 US disclosed
US-20040106738-A1 Process for producing polyolefin resin composition and polypropylene composition IDEMITSU PETROCHEMICAL CO., LTD. (JP) 2004-06-03 US disclosed
US-5629398-A HOMO- OR COPOLYMERIZE WITH OLEFIN USING CATALYST CONTAINING TRANSITION METAL COMPOUND COMPLEXING WITH ANOTHER COMPOUND AND ORGANOALUMINUM COMPOUND; UNIQUE PHYSICAL PROPERTIES IDEMITSU KOSAN CO., LTD. (JP) 1997-05-13 US disclosed
US-5608009-A OLEFIN-DIOLEFIN GRAFT POLYMER IDEMITSU KOSAN CO., LTD. (JP) 1997-03-04 US disclosed
EP-0727446-A1 BRANCHED ETHYLENE MACROMONOMER AND POLYMER PRODUCED THEREFROM IDEMITSU KOSAN COMPANY LIMITED (JP) 1996-08-21 EP disclosed
EP-0690079-A1 ETHYLENE COPOLYMER, THERMOPLASTIC RESIN COMPOSITION CONTAINING THE SAME, AND PROCESS FOR PRODUCING ETHYLENE COPOLYMER IDEMITSU KOSAN COMPANY LIMITED (JP) 1996-01-03 EP disclosed
EP-0686649-A1 PROPYLENE BLOCK COPOLYMER, PROCESS FOR PRODUCING THE SAME, AND MODIFIED COPOLYMER PRODUCED THEREFROM IDEMITSU KOSAN COMPANY LIMITED (JP) 1995-12-13 EP disclosed
EP-0683184-A1 POLYETHYLENE, THERMOPLASTIC RESIN COMPOSITION CONTAINING THE SAME, AND PROCESS FOR PRODUCING POLYETHYLENE IDEMITSU KOSAN COMPANY LIMITED (JP) 1995-11-22 EP disclosed
EP-0667359-A1 OLEFIN COPOLYMERS AND PROCESS FOR PRODUCING THE SAME IDEMITSU KOSAN COMPANY LIMITED (JP) 1995-08-16 EP disclosed
US-5369196-A Production process of olefin based polymers IDEMITSU KOSAN CO., LTD. (JP) 1994-11-29 US disclosed
EP-0513380-A1 PROCESS FOR PRODUCING OLEFINIC POLYMER IDEMITSU KOSAN COMPANY LIMITED (JP) 1992-11-19 EP disclosed
EP-0504418-A1 PROCESS FOR PRODUCING CYCLOOLEFIN POLYMER, CYCLOOLEFIN COPOLYMER, AND COMPOSITION AND MOLDING PREPARED THEREFROM IDEMITSU KOSAN COMPANY LIMITED (JP) 1992-09-23 EP disclosed