⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4544101 | 1.00 | — | — | |
| SCHEMBL4544097 | 1.00 | — | — | |
| SCHEMBL10686269 | 0.80 | — | — | |
| SCHEMBL8068005 | 0.80 | — | — | |
| SCHEMBL28929333 | 0.80 | — | — | |
| SCHEMBL10686260 | 0.80 | — | — | |
| Propionitrile SCHEMBL28115464 | 0.79 | ALDH1A1 (0.38) | — | |
| SCHEMBL20338617 | 0.77 | LDHA (0.33) | — | |
| SCHEMBL468412 | 0.75 | — | — | |
| SCHEMBL468414 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 78 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119285941-B | Low-sensitization aspartate resin compound and preparation process thereof | 深圳飞扬骏研新材料股份有限公司 | 2026-05-19 | — | — | CN | claimed |
| CN-119285941-A | Low-sensitization aspartate resin compound and preparation process thereof | 深圳飞扬骏研新材料股份有限公司 | 2025-01-10 | — | — | CN | claimed |
| CN-103886925-A | Recovering method for uranium and fluorine in uranium hexafluoride alkali absorption solution waste liquid | UNIV LANGZHOU | 2014-06-25 | — | — | CN | claimed |
| JP-62234063-A | — | — | None | — | — | JP | disclosed |
| CN-119285941-B | Low-sensitization aspartate resin compound and preparation process thereof | 深圳飞扬骏研新材料股份有限公司 | 2026-05-19 | — | — | CN | disclosed |
| CN-119285941-B | Low-sensitization aspartate resin compound and preparation process thereof | 深圳飞扬骏研新材料股份有限公司 | 2026-05-19 | — | — | CN | disclosed |
| US-20250276300-A1 | REDUCTION OF MONOMERIC ISOCYANATES BY POROUS MATERIAL | BASF SE (DE) | 2025-09-04 | — | — | US | disclosed |
| EP-4291588-B1 | REDUCTION OF MONOMERIC ISOCYANATES BY POROUS MATERIAL | BASF SE (DE) | 2025-08-20 | — | — | EP | disclosed |
| CN-119285941-A | Low-sensitization aspartate resin compound and preparation process thereof | 深圳飞扬骏研新材料股份有限公司 | 2025-01-10 | — | — | CN | disclosed |
| CN-119285941-A | Low-sensitization aspartate resin compound and preparation process thereof | 深圳飞扬骏研新材料股份有限公司 | 2025-01-10 | — | — | CN | disclosed |
| CN-115651178-B | Synthesis method of polyester with siloxane side group | 新丰见微化工实业有限公司 | 2024-02-20 | — | — | CN | disclosed |
| US-5405987-A | N-hydroxyaspartic acid derivatives; chemical intermediates | HOECHST CELANESE CORPORATION (US) | 1995-04-11 | — | — | US | disclosed |
| EP-0564083-A1 | Conversion of pyridine-2,3-dicarboxylic acid esters to their cyclic anhydrides | HOECHST CELANESE CORPORATION (US) | 1993-10-06 | — | — | EP | disclosed |
| US-5208342-A | Hydrolysis and dehydration | HOECHST CELANESE CORPORATION (US) | 1993-05-04 | — | — | US | disclosed |
| EP-0218048-B1 | BUTENOIC ACID DERIVATIVES, AND THEIR PRODUCTION AND USE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1992-07-29 | — | — | EP | disclosed |
| US-5059237-A | BUTENOIC ACID DERIVATIVES AND USE AS HERBICIDES | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1991-10-22 | — | — | US | disclosed |
| EP-0452094-A2 | A method of the preparation of N-hydroxy aspartic acid derivate | HOECHST CELANESE CORPORATION (US) | 1991-10-16 | — | — | EP | disclosed |
| JP-S62234063-A | THERMAL STABILIZATION OF N-CYCLOHEXYLMALEIMIDE | NIPPON OIL & FATS CO LTD | 1987-10-14 | — | — | JP | disclosed |
| EP-0218048-A2 | Butenoic acid derivatives, and their production and use | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1987-04-15 | — | — | EP | disclosed |
| US-3719520-A | SYNTHETIC LEATHER | KYOWA HAKKO KOGYO KK | 1973-03-06 | — | — | US | disclosed |