SCHEMBL444178

SCHEMBL444178

CCCOC(=O)CCOCC

nearest known ligand 0.57

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
DGKA P23743 1/20 0.48
ALDH1A1 P00352 5/20 0.46
TSHR P16473 1/20 0.46
ADRA2A P08913 1/20 0.41
ADRA1A P35348 1/20 0.41
THRB P10828 1/20 0.41
MAPT P10636 3/20 0.40
DNM1 Q05193 1/20 0.40
BLM P54132 1/20 0.40
HTR2C P28335 1/20 0.39
NAAA Q02083 1/20 0.39
CYP1A2 P05177 1/20 0.39
HSD17B10 Q99714 1/20 0.38
HCAR2 Q8TDS4 1/20 0.38
LMNA P02545 1/20 0.37
TDP1 Q9NUW8 1/20 0.37
MAPK1 P28482 1/20 0.37
GLA P06280 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21618267 0.91 DGKA (0.52) DGKAALDH1A1ADRA2AADRA1AMAPT
SCHEMBL4818015 0.91 ALDH1A1 (0.56) DGKAALDH1A1TSHRADRA2AADRA1A
SCHEMBL443342 0.88 DGKA (0.50) DGKAALDH1A1ADRA2AADRA1AMAPT
SCHEMBL444159 0.87 DGKA (0.55) DGKAALDH1A1TSHRMAPTDNM1
SCHEMBL20210496 0.87 DGKA (0.55) DGKAALDH1A1TSHRTHRBMAPT
SCHEMBL14513868 0.87 DGKA (0.45) DGKAALDH1A1TSHRADRA2AADRA1A
SCHEMBL37036 0.86 GAA (0.52) DGKAALDH1A1TSHRTHRBCYP1A2
SCHEMBL27502689 0.86 GAA (0.52) DGKAALDH1A1TSHRTHRBCYP1A2
SCHEMBL20210500 0.85 DGKA (0.59) DGKAALDH1A1TSHRMAPTDNM1
SCHEMBL20210503 0.85 NAAA (0.59) DGKATSHRDNM1HTR2CNAAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 554 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250270481-A1 THINNER COMPOSITION DONGWOO FINE-CHEM CO., LTD. (KR) 2025-08-28 US claimed
US-12637529-B2 Resin composition and display device using the same SAMSUNG DISPLAY CO., LTD. (KR) 2026-05-26 US disclosed
US-20250270481-A1 THINNER COMPOSITION DONGWOO FINE-CHEM CO., LTD. (KR) 2025-08-28 US disclosed
US-20250230356-A1 THINNER COMPOSITION DONGWOO FINE-CHEM CO., LTD. (KR) 2025-07-17 US disclosed
US-12346025-B2 Fluorine-containing resin composition and preparation method thereof, and preparation method of cured film containing same XI'AN MANARECO NEW MATERIALS CO., LTD. (CN) 2025-07-01 US disclosed
CN-112947012-B Photosensitive resin and thinner composition for removing antireflection film, and photosensitive resin and method for removing antireflection film using same 东友精细化工有限公司 2025-04-11 CN disclosed
WO-2025071108-A1 RESIN COMPOSITION FOR ANTI-REFLECTIVE FILM, ANTI-REFLECTIVE FILM, AND SOLID-STATE IMAGING DEVICE 동우 화인켐 주식회사 2025-04-03 WO disclosed
CN-119065043-A Composition, optical film, layer, optical filter, optical element, solid-state imaging device, and camera module JSR株式会社 2024-12-03 CN disclosed
CN-118344769-A Liquid crystal aligning agent, liquid crystal alignment film and liquid crystal display element 日产化学工业株式会社 2024-07-16 CN disclosed
CN-109976097-B Method of forming micropattern and substrate processing apparatus 三星电子株式会社 2024-06-18 CN disclosed
US-6168908-B1 COATING AN ALKALI-SOLUBLE THERMOSETTING RESIN ON A SUBSTRATE, AND BAKING IT, COATING A RADIATION SENSITIVE RESIN ON THE COATED FILM, AND BAKING, EXPOSING THE RADIATION SENSITIVE FILM TO A RADIATION THROUGH A MASK AND BAKING, DEVELOPING JSR CORPORATION (JP) 2001-01-02 US disclosed
EP-1057859-A2 Radiation sensitive resin composition and use of the same in an interlaminar insulating film JSR Corporation (JP) 2000-12-06 EP disclosed
EP-0908780-A1 Process for forming a cured film of a thermosetting resin JSR Corporation (JP) 1999-04-14 EP disclosed
EP-0408635-B1 TRANSESTERIFICATION OF ALKOXYESTERS EASTMAN KODAK CO (US) 1994-02-23 EP disclosed
US-5011977-A Transesterification of alkoxyesters EASTMAN KODAK COMPANY (US) 1991-04-30 US disclosed
EP-0408635-A1 TRANSESTERIFICATION OF ALKOXYESTERS. EASTMAN KODAK CO (US) 1991-01-23 EP disclosed
US-4978754-A REACTING B-ALKOXY-SUBSTITUTED CARBOXYLATE WITH CYCLIC AMINE, REMOVING ALCOHOL IN PRESENCE OF BASIC CATALYST MITSUI TOATSU CHEMICALS, INCORPORATED (JP) 1990-12-18 US disclosed
US-4898969-A Transesterification of alkoxyesters EASTMAN KODAK COMPANY (US) 1990-02-06 US disclosed
WO-1989009762-A1 TRANSESTERIFICATION OF ALKOXYESTERS EASTMAN KODAK COMPANY (US) 1989-10-19 WO disclosed
EP-0321256-A2 Process of preparing unsaturated carboxylic acid amides MITSUI TOATSU CHEMICALS, Inc. (JP) 1989-06-21 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12637529-B2 Resin composition and display device using the same JMJD6, ALKBH2, ARID2 DGKA 3299/4885ALDH1A1 209/4885TSHR 3217/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.