SCHEMBL4444020

SCHEMBL4444020

C=CC[S+](CC=C)c1cccc2ccccc12

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 3/20 0.37
MEN1 O00255 2/20 0.37
KDM4E B2RXH2 3/20 0.37
ALDH1A1 P00352 7/20 0.36
CYP2A6 P11509 3/20 0.36
TSHR P16473 2/20 0.36
HSD17B10 Q99714 2/20 0.36
TDP1 Q9NUW8 2/20 0.36
POLB P06746 1/20 0.35
MAPT P10636 1/20 0.35
NPSR1 Q6W5P4 1/20 0.35
CYP1A2 P05177 3/20 0.34
HPGD P15428 3/20 0.34
CYP3A4 P08684 1/20 0.34
KEAP1 Q14145 1/20 0.34
CYP2C9 P11712 1/20 0.34
CYP2C19 P33261 1/20 0.34
L3MBTL1 Q9Y468 1/20 0.34
ALOX12 P18054 1/20 0.34
HPRT1 P00492 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL7708065 0.84 GPR3 (0.35) KMT2AMEN1KDM4EALDH1A1POLB
SCHEMBL1375882 0.81 KMT2A (0.36) KMT2AMEN1KDM4EALDH1A1CYP2A6
SCHEMBL700284 0.74 CYP2A6 (0.43) KDM4EALDH1A1CYP2A6TSHRHSD17B10
SCHEMBL29547056 0.69 ALDH1A1 (0.50) ALDH1A1CYP2A6TSHRHSD17B10TDP1
SCHEMBL245440 0.69 ALDH1A1 (0.50) ALDH1A1CYP2A6TSHRHSD17B10TDP1
SCHEMBL1758997 0.68 HTR1B (0.40) KMT2AMEN1KDM4EALDH1A1CYP2A6
SCHEMBL6679723 0.67 ALDH1A1 (0.37) ALDH1A1CYP2A6TSHRHSD17B10TDP1
SCHEMBL5516425 0.67 CYP1A2 (0.48) KMT2AMEN1KDM4EALDH1A1TDP1
SCHEMBL29891134 0.67 CYP1A2 (0.48) KMT2AMEN1KDM4EALDH1A1TDP1
SCHEMBL2469938 0.66 ALDH1A1 (0.36) ALDH1A1TSHRCYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7638261-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2009-12-29 US disclosed
US-20090148790-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2009-06-11 US disclosed
US-6641974-B2 Copolymer KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) 2003-11-04 US disclosed
US-6458506-B2 GENERATING ANTHRACENE ACID UPON EXPOSURE TO ACTIVATING RADIATION SHIPLEY COMPANY, LLC 2002-10-01 US disclosed
US-20020001770-A1 PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME SHIPLEY COMPANY, L.L.C. 2002-01-03 US disclosed
US-20010041302-A1 Chemically amplified resist composition containing low molecular weight additives SK MATERIALS PERFORMANCE CO., LTD. (KR) 2001-11-15 US disclosed
EP-1126320-A2 Chemically amplified resist composition containing low molecular weight additives Korea Kumho Petrochemical Co. Ltd. (KR) 2001-08-22 EP disclosed
WO-2000010056-A9 PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME SHIPLEY CO LLC (US) 2000-06-08 WO disclosed
WO-2000010056-A1 PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME SHIPLEY COMPANY, L.L.C. (US) 2000-02-24 WO disclosed