Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.46 |
| ▸ | MAOA | P21397 | 1/20 | 0.45 |
| ▸ | SIGMAR1 | Q99720 | 8/20 | 0.44 |
| ▸ | MAOB | P27338 | 2/20 | 0.44 |
| ▸ | NAAA | Q02083 | 1/20 | 0.43 |
| ▸ | IDO1 | P14902 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28731688 | 0.98 | SIGMAR1 (0.47) | L3MBTL1MAOASIGMAR1MAOB | |
| SCHEMBL2869652 | 0.96 | IDO1 (0.42) | L3MBTL1MAOASIGMAR1NAAAIDO1 | |
| SCHEMBL964291 | 0.88 | ALDH1A1 (0.39) | IDO1 | |
| SCHEMBL15733562 | 0.81 | TAAR1 (0.40) | L3MBTL1SIGMAR1MAOB | |
| SCHEMBL15733704 | 0.80 | TAAR1 (0.39) | L3MBTL1SIGMAR1 | |
| SCHEMBL15735717 | 0.80 | TAAR1 (0.39) | L3MBTL1SIGMAR1 | |
| SCHEMBL15734434 | 0.80 | TAAR1 (0.46) | MAOBIDO1 | |
| SCHEMBL4742953 | 0.79 | MAOA (0.52) | L3MBTL1MAOASIGMAR1MAOB | |
| SCHEMBL16714737 | 0.79 | MAOA (0.56) | MAOASIGMAR1 | |
| SCHEMBL16714770 | 0.79 | MAOA (0.61) | MAOASIGMAR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8968458-B2 | Composition for resist underlayer film and process for producing same | JSR CORPORATION (JP) | 2015-03-03 | — | — | US | disclosed |
| US-8808446-B2 | Composition for resist underlayer film and process for producing same | JSR CORPORATION (JP) | 2014-08-19 | — | — | US | disclosed |
| US-20090050020-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME | JSR CORPORATION (JP) | 2009-02-26 | — | — | US | disclosed |
| EP-1855159-A1 | COMPOSITION FOR UNDERLAYER FILM OF RESIST AND PROCESS FOR PRODUCING THE SAME | JSR Corporation (JP) | 2007-11-14 | — | — | EP | disclosed |