Known targets — ChEMBL curated mechanism
AGTR1DHFRGABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTNR3C2PBP2XPTGS1PTGS2VKORC1blablaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAftsImrcAmrcBmrdApbp1apbp1bpbp2apbp2bpbp3polthyA
The experimentally established mechanism targets of Potassium Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Lithium Ion SCHEMBL18007838 | 0.95 | — | — | |
| SCHEMBL18007980 | 0.95 | — | — | |
| Tetrylammonium SCHEMBL18008068 | 0.88 | TSHR (0.31) | — | |
| Potassium Ion SCHEMBL18008770 | 0.83 | — | — | |
| Potassium Ion SCHEMBL18007815 | 0.79 | KCNH2 (0.33) | — | |
| Potassium Ion SCHEMBL18008904 | 0.78 | — | — | |
| SCHEMBL18009016 | 0.78 | CYP3A4 (0.31) | — | |
| Lithium Ion SCHEMBL18008701 | 0.78 | — | — | |
| SCHEMBL14775259 | 0.78 | — | — | |
| Potassium Ion SCHEMBL18008609 | 0.78 | MAPT (0.36) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20090326116-A1 | POLYCARBONATE COMPOSITIONS HAVING ANTISTATIC ENHANCERS, METHOD OF PREPARING, AND ARTICLES COMPRISING THE SAME | SABIC GLOBAL TECHNOLOGIES B.V. (NL) | 2009-12-31 | — | — | US | claimed |
| EP-3909943-B1 | SULFONIUM SALT, PHOTOACID GENERATOR, CURABLE COMPOSITION AND RESIST COMPOSITION | SAN APRO LTD (JP) | 2025-06-04 | — | — | EP | disclosed |
| US-12129240-B2 | Sulfonium salt, photoacid generator, curable composition and resist composition | SAN-APRO LTD. (JP) | 2024-10-29 | — | — | US | disclosed |
| US-20220089562-A1 | SULFONIUM SALT, PHOTOACID GENERATOR, CURABLE COMPOSITION AND RESIST COMPOSITION | SAN-APRO LTD. (JP) | 2022-03-24 | — | — | US | disclosed |
| EP-3909943-A1 | SULFONIUM SALT, PHOTOACID GENERATOR, CURABLE COMPOSITION AND RESIST COMPOSITION | San-Apro Ltd. (JP) | 2021-11-17 | — | — | EP | disclosed |
| CN-113286781-A | Sulfonium salt, photoacid generator, curable composition, and resist composition | 三亚普罗股份有限公司 | 2021-08-20 | — | — | CN | disclosed |
| EP-3367088-A1 | ELECTROCHEMICAL GAS SENSOR AND ELECTROLYTE FOR AN ELECTROCHEMICAL GAS SENSOR | Dräger Safety AG & Co. KGaA (DE) | 2018-08-29 | — | — | EP | disclosed |
| EP-3259583-A1 | ELECTROCHEMICAL GAS SENSOR AND ELECTROLYTE FOR AN ELECTROCHEMICAL GAS SENSOR | Dräger Safety AG & Co. KGaA (DE) | 2017-12-27 | — | — | EP | disclosed |
| WO-2016131549-A1 | ELECTROCHEMICAL GAS SENSOR AND ELECTROLYTE FOR AN ELECTROCHEMICAL GAS SENSOR | Dräger Safety AG & Co. KGaA (DE) | 2016-08-25 | — | — | WO | disclosed |