SCHEMBL445613

SCHEMBL445613

CCC(=O)OCCC(C)OC

nearest known ligand 0.45

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
NAAA Q02083 1/20 0.45
GAA P10253 1/20 0.36
HTT P42858 1/20 0.34
CYP19A1 P11511 1/20 0.34
CHRNB2 P17787 5/20 0.33
CHRNA4 P43681 5/20 0.33
CHRNB4 P30926 3/20 0.33
CHRNA3 P32297 3/20 0.33
KDM4E B2RXH2 1/20 0.33
ALDH1A1 P00352 1/20 0.33
CYP1A2 P05177 1/20 0.33
HPGD P15428 1/20 0.33
CYP2C19 P33261 1/20 0.33
BLM P54132 1/20 0.33
WRN Q14191 1/20 0.33
HIF1A Q16665 1/20 0.33
DGKA P23743 1/20 0.32
DNM1 Q05193 1/20 0.31
ALOX15 P16050 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9015495 0.84 DGKA (0.42) NAAACHRNB2CHRNA4CHRNB4CHRNA3
SCHEMBL27634790 0.83 CYP19A1 (0.38) GAACYP19A1CHRNB2CHRNA4CHRNB4
SCHEMBL3985515 0.83 NAAA (0.45) NAAAGAAHTTCYP19A1CHRNB2
SCHEMBL450595 0.82 NAAA (0.44) NAAAGAAHTTCYP19A1CHRNB2
SCHEMBL28394190 0.82 MMP1 (0.37) GAACYP19A1CHRNB2CHRNA4CHRNB4
SCHEMBL15663142 0.82 CYP19A1 (0.33) CYP19A1CHRNB2CHRNA4CHRNB4CHRNA3
SCHEMBL12002784 0.82 CYP19A1 (0.33) CYP19A1CHRNB2CHRNA4CHRNB4CHRNA3
SCHEMBL60446 0.82 TSHR (0.43) CYP19A1CHRNB2CHRNA4CHRNB4CHRNA3
SCHEMBL29108048 0.81 DGKA (0.53) NAAAKDM4EALDH1A1DGKADNM1
SCHEMBL30123458 0.81 SOAT1 (0.41) GAACHRNB2CHRNA4CHRNB4CHRNA3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 105 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114539524-B Photosensitive resin precursor polymer, photosensitive resin composition slurry and application thereof 吉林奥来德光电材料股份有限公司 2023-12-26 CN claimed
CN-115602356-A Conductive paste for improving adhesive force and preparation method and application thereof 南通俊丰新材料科技有限公司(CN) 2023-01-13 CN claimed
CN-115268215-A Photosensitive polyimide resin composition, photosensitive polyimide film containing same and application of photosensitive polyimide resin composition 吉林奥来德光电材料股份有限公司 2022-11-01 CN claimed
CN-113555145-B Flexible high-temperature-resistant conductive paste 西安宏星电子浆料科技股份有限公司 2022-03-25 CN claimed
CN-113555145-A Flexible high-temperature-resistant conductive paste 西安宏星电子浆料科技股份有限公司 2021-10-26 CN claimed
CN-112992404-B High-conductivity conductive slurry 西安宏星电子浆料科技股份有限公司 2021-09-03 CN claimed
CN-109535977-B High-solid-content multifunctional quick-drying type floating coat composition and application thereof 立邦涂料(中国)有限公司 2021-07-16 CN claimed
CN-112992404-A High-conductivity conductive slurry 西安宏星电子浆料科技股份有限公司 2021-06-18 CN claimed
EP-1170343-B1 INFRARED SENSITIVE COATING LIQUID ASAHI KASEI CHEMICALS CORP (JP) 2005-11-02 EP claimed
US-6653046-B2 Flexography printing plates; drawing images; using ester solvents ASAHI KASEI KABUSHIKI KAISHA (JP) 2003-11-25 US claimed
US-20020187429-A1 Infrared sensitive coating liquid ASAHI KASEI KABUSHIKI KAISHA (JP) 2002-12-12 US claimed
EP-1170343-A1 INFRARED SENSITIVE COATING LIQUID Asahi Kasei Kabushiki Kaisha (JP) 2002-01-09 EP claimed
US-5242782-A Flexographic printing plate ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1993-09-07 US claimed
CN-112703447-B Liquid crystal aligning agent, liquid crystal alignment film, liquid crystal display element, diamine, method for producing same, and polymer 日产化学株式会社 2024-12-13 CN disclosed
WO-2024203156-A1 LIQUID CRYSTAL ALIGNING AGENT, LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL DISPLAY ELEMENT 日産化学株式会社 2024-10-03 WO disclosed
CN-114080443-B Liquid crystal aligning agent, liquid crystal alignment film, and liquid crystal display element using same 日产化学株式会社 2024-04-26 CN disclosed
EP-0439123-B1 A method for producing flexographic printing plates having a photocured image structure ASAHI CHEMICAL IND (JP) 1997-07-30 EP disclosed
EP-0744662-A2 Reflection-preventing film-forming composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-11-27 EP disclosed
US-5242782-A Flexographic printing plate ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1993-09-07 US disclosed
EP-0439123-A2 A method for producing a photocured image structure Asahi Kasei Kogyo Kabushiki Kaisha (JP) 1991-07-31 EP disclosed