SCHEMBL445923

SCHEMBL445923

CCCCOC(=O)COCC

nearest known ligand 0.52

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.52
NAAA Q02083 1/20 0.52
ATM Q13315 1/20 0.48
DGKA P23743 1/20 0.47
TSHR P16473 2/20 0.45
HPGD P15428 1/20 0.45
RAD52 P43351 1/20 0.44
NPSR1 Q6W5P4 1/20 0.44
TDP1 Q9NUW8 2/20 0.44
L3MBTL1 Q9Y468 2/20 0.44
FAAH O00519 1/20 0.43
HCAR2 Q8TDS4 1/20 0.42
HTR2C P28335 1/20 0.42
PRSS1 P07477 1/20 0.41
PRSS2 P07478 1/20 0.41
PRSS3 P35030 1/20 0.41
CES2 O00748 1/20 0.41
MEN1 O00255 1/20 0.40
KMT2A Q03164 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21470448 0.94 NAAA (0.61) ALDH1A1NAAADGKATSHRRAD52
SCHEMBL27528360 0.92 NAAA (0.64) NAAADGKATSHRRAD52NPSR1
SCHEMBL27706515 0.92 NAAA (0.64) NAAADGKATSHRRAD52NPSR1
SCHEMBL28176067 0.92 NAAA (0.64) NAAADGKATSHRRAD52NPSR1
SCHEMBL28245822 0.92 NAAA (0.64) NAAADGKATSHRRAD52NPSR1
SCHEMBL21275447 0.91 ALDH1A1 (0.56) ALDH1A1NAAAATMDGKATSHR
SCHEMBL1055702 0.89 ALDH1A1 (0.54) ALDH1A1NAAAATMDGKATSHR
SCHEMBL17582700 0.88 NAAA (0.42) ALDH1A1NAAAATMDGKATSHR
SCHEMBL7652075 0.87 ALDH1A1 (0.52) ALDH1A1NAAAATMDGKATSHR
SCHEMBL3679273 0.87 ALDH1A1 (0.52) ALDH1A1NAAAATMDGKATSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 923 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104536265-A Photoresist composition ZHEJIANG YONGTAI TECHNOLOGY CO LTD 2015-04-22 CN claimed
CN-103857751-A Composition for preparing alignment layer, alignment layer prepared therefrom, and retardation film DONGWOO FINE CHEM CO LTD 2014-06-11 CN claimed
CN-100429248-C Manufacturing method of acrylic copolymer resin for layer insulation film for TFT-LCD DONGJIN SAEMIGUNG CO LTD (KR) 2008-10-29 CN claimed
CN-101059653-A Photosensitive resin composition DONGJIN SEMICHEM CO LTD (KR) 2007-10-24 CN claimed
CN-1693322-A Manufacturing method of acrylic copolymer resin for layer insulation film for TFT-LCD DONGJIN SAEMIGUNG CO LTD (KR) 2005-11-09 CN claimed
US-12637529-B2 Resin composition and display device using the same SAMSUNG DISPLAY CO., LTD. (KR) 2026-05-26 US disclosed
WO-2025071108-A1 RESIN COMPOSITION FOR ANTI-REFLECTIVE FILM, ANTI-REFLECTIVE FILM, AND SOLID-STATE IMAGING DEVICE 동우 화인켐 주식회사 2025-04-03 WO disclosed
WO-2024158178-A1 THERMOSETTING RESIN COMPOSITION, CURED FILM, AND SOLID-STATE IMAGING DEVICE 동우 화인켐 주식회사 2024-08-02 WO disclosed
WO-2024147537-A1 RESIN COMPOSITION FOR ANTI-REFLECTION FILM, ANTI-REFLECTION FILM, AND SOLID-STATE IMAGING DEVICE 동우 화인켐 주식회사 2024-07-11 WO disclosed
US-12013644-B2 Method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2024-06-18 US disclosed
CN-109976097-B Method of forming micropattern and substrate processing apparatus 三星电子株式会社 2024-06-18 CN disclosed
CN-110007563-B Negative photosensitive resin composition, spacer, protective film, and liquid crystal display element 奇美实业股份有限公司 2024-04-02 CN disclosed
EP-0704424-A1 3-alkoxypropionic ester derivative, olefin polymerization catalyst, and process for preparation of polyolefin SHOWA DENKO KABUSHIKI KAISHA (JP) 1996-04-03 EP disclosed
US-5476825-A Consists of magnesium, titanium and halogen compounds, an organoaluminum compound, a reaction product of organoaluminum or organoboron compound with organosilicon compound SHOWA DENKO K.K. (JP) 1995-12-19 US disclosed
EP-0383346-B1 Catalyst, process for its preparation and process for polymerization of olefins using this catalyst SHOWA DENKO KK (JP) 1995-05-03 EP disclosed
US-5407883-A Containing magnesium, titanium, aluminum and silicon compounds including polymeric aluminum and alumoxanes SHOWA DENKO K.K. (JP) 1995-04-18 US disclosed
EP-0640624-A1 Catalyst for polymerization of olefin and process for the preparation of olefin polymer SHOWA DENKO KABUSHIKI KAISHA (JP) 1995-03-01 EP disclosed
EP-0578473-A1 Catalyst for polymerization of olefin and process for producing olefin polymer SHOWA DENKO KABUSHIKI KAISHA (JP) 1994-01-12 EP disclosed
US-5041403-A Magnesium, titanium, halogen, ester compound, and organic aluminum compound SHOWA DENKO K.K. (JP) 1991-08-20 US disclosed
EP-0383346-A2 Catalyst, process for its preparation and process for polymerization of olefins using this catalyst SHOWA DENKO KABUSHIKI KAISHA (JP) 1990-08-22 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12637529-B2 Resin composition and display device using the same JMJD6, ALKBH2, ARID2 ALDH1A1 209/4885NAAA 607/4885ATM 502/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.