SCHEMBL1055702

SCHEMBL1055702

CCCCOCC(=O)OCCCC

nearest known ligand 0.54

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.54
NAAA Q02083 1/20 0.54
CES2 O00748 2/20 0.52
ATM Q13315 1/20 0.50
DGKA P23743 1/20 0.48
TSHR P16473 3/20 0.47
HPGD P15428 1/20 0.47
RAD52 P43351 1/20 0.46
NPSR1 Q6W5P4 1/20 0.46
TDP1 Q9NUW8 2/20 0.45
L3MBTL1 Q9Y468 2/20 0.45
FAAH O00519 1/20 0.44
HCAR2 Q8TDS4 1/20 0.44
HTR2C P28335 1/20 0.43
PRSS1 P07477 1/20 0.42
PRSS2 P07478 1/20 0.42
PRSS3 P35030 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18612049 0.96 ALDH1A1 (0.50) ALDH1A1NAAACES2ATMDGKA
SCHEMBL1056775 0.93 CES2 (0.50) ALDH1A1NAAACES2ATMDGKA
SCHEMBL9674827 0.93 NAAA (0.63) ALDH1A1NAAACES2DGKATSHR
SCHEMBL7652075 0.93 ALDH1A1 (0.52) ALDH1A1NAAACES2ATMDGKA
SCHEMBL1053061 0.93 ALDH1A1 (0.52) ALDH1A1NAAACES2ATMDGKA
SCHEMBL21275447 0.93 ALDH1A1 (0.56) ALDH1A1NAAACES2ATMDGKA
SCHEMBL18612048 0.92 TSHR (0.48) ALDH1A1NAAACES2ATMDGKA
SCHEMBL9766365 0.91 NAAA (0.67) NAAACES2DGKATSHRRAD52
SCHEMBL18470078 0.91 DGKA (0.50) ALDH1A1NAAACES2ATMDGKA
SCHEMBL8511737 0.91 NAAA (0.67) NAAACES2DGKATSHRRAD52

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 405 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2019161190-A1 HYDROCHROMIC COATINGS AND RELATED METHODS CHROMATIC TECHNOLOGIES, INC. (US) 2019-08-22 WO claimed
CN-104536265-A Photoresist composition ZHEJIANG YONGTAI TECHNOLOGY CO LTD 2015-04-22 CN claimed
US-12637529-B2 Resin composition and display device using the same SAMSUNG DISPLAY CO., LTD. (KR) 2026-05-26 US disclosed
EP-4578613-A1 ADAPTOR FOR SHAVING CARTRIDGE BIC Violex Single Member S.A. (GR) 2025-07-02 EP disclosed
WO-2025071108-A1 RESIN COMPOSITION FOR ANTI-REFLECTIVE FILM, ANTI-REFLECTIVE FILM, AND SOLID-STATE IMAGING DEVICE 동우 화인켐 주식회사 2025-04-03 WO disclosed
WO-2024158178-A1 THERMOSETTING RESIN COMPOSITION, CURED FILM, AND SOLID-STATE IMAGING DEVICE 동우 화인켐 주식회사 2024-08-02 WO disclosed
WO-2024147537-A1 RESIN COMPOSITION FOR ANTI-REFLECTION FILM, ANTI-REFLECTION FILM, AND SOLID-STATE IMAGING DEVICE 동우 화인켐 주식회사 2024-07-11 WO disclosed
CN-109976097-B Method of forming micropattern and substrate processing apparatus 三星电子株式会社 2024-06-18 CN disclosed
CN-110007563-B Negative photosensitive resin composition, spacer, protective film, and liquid crystal display element 奇美实业股份有限公司 2024-04-02 CN disclosed
CN-111324013-B Chemically amplified positive photosensitive resin composition and application thereof 奇美实业股份有限公司 2023-12-01 CN disclosed
CN-116648671-A Negative photosensitive resin composition capable of realizing low-temperature curing and low refractive index 株式会社东进世美肯 2023-08-25 CN disclosed
US-4981993-A Polyfunctional ethylenic monomers SOCIETE FRANCAISE HOECHST (FR) 1991-01-01 US disclosed
CN-1036770-A Cephalosporins derivatives and preparation method thereof HOECHST AG (DE) 1989-11-01 CN disclosed
US-4854934-A CROSSLINKING; CREASE AND SHRINK RESISTANCE SOCIETE FRANCAISE HOECHST (FR) 1989-08-08 US disclosed
EP-0306410-A1 Polyfunctional ethylenic monomers SOCIETE FRANCAISE HOECHST Société anonyme dite: (FR) 1989-03-08 EP disclosed
EP-0285500-A1 Substituted ureas, process for their preparation and their application in the finishing of cellulose fibres SOCIETE FRANCAISE HOECHST Société anonyme dite: (FR) 1988-10-05 EP disclosed
US-4501917-A REACTING WITH CARBON MONOXIDE; CATALYST IS ACID ORGANIC ION EXCHANGE MATERIAL HOECHST AKTIENGESELLSCHAFT (DE) 1985-02-26 US disclosed
US-4228217-A ALUMINUM OR MAGNESIUM SALT OF A SATURATED MONOCARBOXYLIC ACID SWISS ALUMINUM LTD. (CH) 1980-10-14 US disclosed
US-4193881-A MAGENSIUM OF ALUMINUM CARBOXYLATE SWISS ALUMINIUM LTD. (CH) 1980-03-18 US disclosed
US-3948977-A Alkoxy acid or ester preparation CHEVRON RESEARCH COMPANY (US) 1976-04-06 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12637529-B2 Resin composition and display device using the same JMJD6, ALKBH2, ARID2 ALDH1A1 209/4885NAAA 607/4885CES2 480/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.