Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NAAA | Q02083 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 3/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.38 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.38 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.38 |
| ▸ | ACHE | P22303 | 6/20 | 0.36 |
| ▸ | CYP4F2 | P78329 | 2/20 | 0.34 |
| ▸ | CYP4A11 | Q02928 | 2/20 | 0.34 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.34 |
| ▸ | RAD52 | P43351 | 1/20 | 0.34 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.34 |
| ▸ | CA12 | O43570 | 1/20 | 0.34 |
| ▸ | CA1 | P00915 | 1/20 | 0.34 |
| ▸ | CA2 | P00918 | 1/20 | 0.34 |
| ▸ | CA9 | Q16790 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4463477 | 0.98 | NAAA (0.37) | NAAATSHRALDH1A1CYP3A4EPHX1 | |
| SCHEMBL4679753 | 0.92 | NAAA (0.53) | NAAATSHRALDH1A1EPHX1ACHE | |
| SCHEMBL28443270 | 0.92 | NAAA (0.53) | NAAATSHRALDH1A1EPHX1ACHE | |
| SCHEMBL4676466 | 0.89 | NAAA (0.50) | NAAATSHRALDH1A1CYP3A4EPHX1 | |
| SCHEMBL28390318 | 0.88 | RARB (0.36) | NAAATSHRALDH1A1CYP3A4EPHX1 | |
| SCHEMBL1171758 | 0.87 | PRKCA (0.34) | TSHRALDH1A1NPSR1 | |
| SCHEMBL30968214 | 0.87 | RARB (0.36) | NAAATSHRALDH1A1CYP3A4EPHX1 | |
| SCHEMBL4677248 | 0.86 | ALDH1A1 (0.52) | NAAATSHRALDH1A1EPHX1ACHE | |
| SCHEMBL28443052 | 0.86 | RARB (0.37) | NAAANPSR1CA12CA1CA2 | |
| SCHEMBL4679145 | 0.83 | BLM (0.34) | ALDH1A1CYP3A4ACHENPSR1CA12 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240110071-A1 | Ultraviolet-Curable Water-Based Ink, Dispersion, Ultraviolet-Curable Water-Based Composition, and Printed Matter | MITSUBISHI CHEMICAL CORPORATION (JP) | 2024-04-04 | — | — | US | disclosed |
| EP-4328246-A1 | ULTRAVIOLET-CURABLE AQUEOUS INK, DISPERSION, ULTRAVIOLET-CURABLE AQUEOUS COMPOSITION, AND PRINTED MATTER | Mitsubishi Chemical Corporation (JP) | 2024-02-28 | — | — | EP | disclosed |
| WO-2022225039-A1 | ULTRAVIOLET-CURABLE AQUEOUS INK, DISPERSION, ULTRAVIOLET-CURABLE AQUEOUS COMPOSITION, AND PRINTED MATTER | 三菱ケミカル株式会社 | 2022-10-27 | — | — | WO | disclosed |
| US-7569327-B2 | Curable polymer compound | SHOWDA DENKO K.K. (JP) | 2009-08-04 | — | — | US | disclosed |
| EP-1629046-B1 | CURABLE POLYMER COMPOUND | SHOWA DENKO KK (JP) | 2008-05-14 | — | — | EP | disclosed |
| US-20070083012-A1 | Curable polymer compound | SHOWA DENKO K.K. (JP) | 2007-04-12 | — | — | US | disclosed |
| US-20070021571-A1 | Curable polymer compound | SHOWA DENKO K.K. (JP) | 2007-01-25 | — | — | US | disclosed |
| EP-1682589-A1 | CURABLE POLYMER COMPOUND | Showa Denko K.K. (JP) | 2006-07-26 | — | — | EP | disclosed |
| US-20060041053-A1 | Color filter black matrix resist composition and carbon black dispersion composition used for the composition | SHOWA DENKO K.K. (JP) | 2006-02-23 | — | — | US | disclosed |
| US-20060036023-A1 | Color filter black matrix resist composition | SHOWA DENKO K.K. (JP) | 2006-02-16 | — | — | US | disclosed |
| US-20050258406-A1 | Black resist composition for color filter | SHOWA DENKO K.K. | 2005-11-24 | — | — | US | disclosed |
| EP-1576418-A1 | COLOR FILTER BLACK MATRIX RESIST COMPOSITION AND CARBON BLACK DISPERSION COMPOSITION USED FOR THE COMPOSITION | Showa Denko K.K. (JP) | 2005-09-21 | — | — | EP | disclosed |
| WO-2005047346-A1 | CURABLE POLYMER COMPOUND | SHOWA DENKO K.K. (JP) | 2005-05-26 | — | — | WO | disclosed |
| WO-2004055597-A1 | COLOR FILTER BLACK MATRIX RESIST COMPOSITION AND CARBON BLACK DISPERSION COMPOSITION USED FOR THE COMPOSITION | SHOWA DENKO K. K. (JP) | 2004-07-01 | — | — | WO | disclosed |