SCHEMBL4463477

SCHEMBL4463477

CC(C)(S)C(=O)OCCCCOC(=O)C(C)(C)S

nearest known ligand 0.38

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
NAAA Q02083 1/20 0.37
ALDH1A1 P00352 2/20 0.36
CYP4F2 P78329 1/20 0.35
CYP4A11 Q02928 1/20 0.35
TSHR P16473 3/20 0.34
CYP3A4 P08684 1/20 0.34
EPHX1 P07099 1/20 0.34
ACHE P22303 6/20 0.33
ATM Q13315 1/20 0.33
CA12 O43570 1/20 0.33
CA1 P00915 1/20 0.33
CA2 P00918 1/20 0.33
CA9 Q16790 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4462237 0.98 NAAA (0.40) NAAAALDH1A1CYP4F2CYP4A11TSHR
SCHEMBL4676466 0.91 NAAA (0.50) NAAAALDH1A1TSHRCYP3A4EPHX1
SCHEMBL1171758 0.90 PRKCA (0.34) ALDH1A1TSHR
SCHEMBL4679753 0.89 NAAA (0.53) NAAAALDH1A1TSHREPHX1ACHE
SCHEMBL28443270 0.89 NAAA (0.53) NAAAALDH1A1TSHREPHX1ACHE
SCHEMBL4677248 0.89 ALDH1A1 (0.52) NAAAALDH1A1TSHREPHX1ACHE
SCHEMBL28443052 0.88 RARB (0.37) NAAACA12CA1CA2CA9
SCHEMBL28390318 0.86 RARB (0.36) NAAAALDH1A1TSHRCYP3A4EPHX1
SCHEMBL4679145 0.85 BLM (0.34) ALDH1A1CYP3A4ACHECA12CA1
SCHEMBL30968214 0.84 RARB (0.36) NAAAALDH1A1TSHRCYP3A4EPHX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240110071-A1 Ultraviolet-Curable Water-Based Ink, Dispersion, Ultraviolet-Curable Water-Based Composition, and Printed Matter MITSUBISHI CHEMICAL CORPORATION (JP) 2024-04-04 US disclosed
EP-4328246-A1 ULTRAVIOLET-CURABLE AQUEOUS INK, DISPERSION, ULTRAVIOLET-CURABLE AQUEOUS COMPOSITION, AND PRINTED MATTER Mitsubishi Chemical Corporation (JP) 2024-02-28 EP disclosed
WO-2022225039-A1 ULTRAVIOLET-CURABLE AQUEOUS INK, DISPERSION, ULTRAVIOLET-CURABLE AQUEOUS COMPOSITION, AND PRINTED MATTER 三菱ケミカル株式会社 2022-10-27 WO disclosed
US-7888399-B2 Curable composition containing thiol compound SHOWA DENKO K.K. (JP) 2011-02-15 US disclosed
US-7888399-B2 Curable composition containing thiol compound SHOWA DENKO K.K. (JP) 2011-02-15 US disclosed
US-7569327-B2 Curable polymer compound SHOWDA DENKO K.K. (JP) 2009-08-04 US disclosed
US-20090023831-A1 Curable Composition Containing Thiol Compound SHOWA DENKO K.K. (JP) 2009-01-22 US disclosed
US-20090023831-A1 Curable Composition Containing Thiol Compound SHOWA DENKO K.K. (JP) 2009-01-22 US disclosed
EP-1983017-A1 CURABLE COMPOSITION CONTAINING THIOL COMPOUND Showa Denko K.K. (JP) 2008-10-22 EP disclosed
EP-1629046-B1 CURABLE POLYMER COMPOUND SHOWA DENKO KK (JP) 2008-05-14 EP disclosed
US-20070083012-A1 Curable polymer compound SHOWA DENKO K.K. (JP) 2007-04-12 US disclosed
US-20070021571-A1 Curable polymer compound SHOWA DENKO K.K. (JP) 2007-01-25 US disclosed
EP-1682589-A1 CURABLE POLYMER COMPOUND Showa Denko K.K. (JP) 2006-07-26 EP disclosed
US-20060079593-A1 Hexaarylbiimidazole compounds and photopolymerization initiator compositions containing the same SHOWA DENKO K.K. (JP) 2006-04-13 US disclosed
US-20060041053-A1 Color filter black matrix resist composition and carbon black dispersion composition used for the composition SHOWA DENKO K.K. (JP) 2006-02-23 US disclosed
US-20060036023-A1 Color filter black matrix resist composition SHOWA DENKO K.K. (JP) 2006-02-16 US disclosed
US-20050258406-A1 Black resist composition for color filter SHOWA DENKO K.K. 2005-11-24 US disclosed
EP-1576418-A1 COLOR FILTER BLACK MATRIX RESIST COMPOSITION AND CARBON BLACK DISPERSION COMPOSITION USED FOR THE COMPOSITION Showa Denko K.K. (JP) 2005-09-21 EP disclosed
WO-2005047346-A1 CURABLE POLYMER COMPOUND SHOWA DENKO K.K. (JP) 2005-05-26 WO disclosed
WO-2004055597-A1 COLOR FILTER BLACK MATRIX RESIST COMPOSITION AND CARBON BLACK DISPERSION COMPOSITION USED FOR THE COMPOSITION SHOWA DENKO K. K. (JP) 2004-07-01 WO disclosed