Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 2/20 | 0.70 |
| ▸ | MEN1 | O00255 | 2/20 | 0.70 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.70 |
| ▸ | USP2 | O75604 | 2/20 | 0.70 |
| ▸ | LMNA | P02545 | 1/20 | 0.70 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.70 |
| ▸ | GPBAR1 | Q8TDU6 | 5/20 | 0.65 |
| ▸ | SLC10A2 | Q12908 | 2/20 | 0.65 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.65 |
| ▸ | PDE3A | Q14432 | 1/20 | 0.65 |
| ▸ | NR1H4 | Q96RI1 | 1/20 | 0.65 |
| ▸ | CA1 | P00915 | 9/20 | 0.58 |
| ▸ | CA2 | P00918 | 9/20 | 0.58 |
| ▸ | ABCC4 | O15439 | 1/20 | 0.58 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.55 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.55 |
| ▸ | VDR | P11473 | 1/20 | 0.55 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.53 |
| ▸ | SLCO1B3 | Q9NPD5 | 1/20 | 0.53 |
| ▸ | SLCO1B1 | Q9Y6L6 | 1/20 | 0.53 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL136045 | 1.00 | MAPT (0.70) | MAPTMEN1KMT2AUSP2LMNA | |
| SCHEMBL134379 | 0.91 | GPBAR1 (0.68) | MAPTUSP2LMNAMAPK1GPBAR1 | |
| SCHEMBL445628 | 0.91 | GPBAR1 (0.68) | MAPTUSP2LMNAMAPK1GPBAR1 | |
| SCHEMBL134380 | 0.91 | GPBAR1 (0.68) | MAPTUSP2LMNAMAPK1GPBAR1 | |
| SCHEMBL7893722 | 0.89 | CYP3A4 (0.70) | MEN1KMT2AUSP2LMNAGPBAR1 | |
| Lagodeoxycholate SCHEMBL5438247 | 0.83 | GPBAR1 (0.79) | MAPTMEN1KMT2AUSP2LMNA | |
| Methyl Deoxycholate SCHEMBL21904594 | 0.83 | MAPT (1.00) | MAPTMEN1KMT2AUSP2LMNA | |
| Methyl Deoxycholate SCHEMBL21283695 | 0.83 | MAPT (1.00) | MAPTMEN1KMT2AUSP2LMNA | |
| Methyl Deoxycholate SCHEMBL21846440 | 0.83 | MAPT (1.00) | MAPTMEN1KMT2AUSP2LMNA | |
| Methyl Deoxycholate SCHEMBL16728282 | 0.83 | MAPT (1.00) | MAPTMEN1KMT2AUSP2LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9598520-B2 | Radiation-sensitive resin composition, polymer and method for forming a resist pattern | JSR CORPORATION (JP) | 2017-03-21 | — | — | US | disclosed |
| EP-2503392-B1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND RESIST PATTERN FORMATION METHOD | JSR CORP (JP) | 2015-04-15 | — | — | EP | disclosed |
| US-8980529-B2 | Radiation-sensitive resin composition, polymer, and resist pattern-forming method | JSR CORPORATION (JP) | 2015-03-17 | — | — | US | disclosed |
| US-20130244185-A9 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT | JSR CORPORATION (JP) | 2013-09-19 | — | — | US | disclosed |
| US-8507575-B2 | Radiation-sensitive resin composition, polymer, and compound | JSR CORPORATION (JP) | 2013-08-13 | — | — | US | disclosed |
| US-20130203000-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2013-08-08 | — | — | US | disclosed |
| US-20130065186-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT | JSR CORPORATION (JP) | 2013-03-14 | — | — | US | disclosed |
| US-20120295197-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND METHOD FOR FORMING A RESIST PATTERN | JSR CORPORATION (JP) | 2012-11-22 | — | — | US | disclosed |
| EP-2503392-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND RESIST PATTERN FORMATION METHOD | JSR Corporation (JP) | 2012-09-26 | — | — | EP | disclosed |
| US-20120065291-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND COMPOUND | JSR CORPORATION (JP) | 2012-03-15 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20130244185-A9 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT | GLRA3, RER1, RXRG | MAPT 4199/4885MEN1 3808/4885KMT2A 4267/4885 |
| US-20130065186-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT | GLRA3, RER1, FPR3 | MAPT 4206/4885MEN1 3872/4885KMT2A 4261/4885 |
| US-20120065291-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND COMPOUND | RAD51, RER1, XRCC5 | MAPT 1052/4885MEN1 1479/4885KMT2A 2498/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.