SCHEMBL446329

SCHEMBL446329

CCCCOCCC(=O)OCCC

nearest known ligand 0.64

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
DGKA P23743 1/20 0.55
TSHR P16473 4/20 0.46
DNM1 Q05193 1/20 0.46
NAAA Q02083 1/20 0.45
ALDH1A1 P00352 2/20 0.45
HTR2C P28335 1/20 0.44
ATM Q13315 1/20 0.42
PAM P19021 2/20 0.41
CYP3A4 P08684 1/20 0.41
MGLL Q99685 1/20 0.40
PRSS1 P07477 1/20 0.40
PRSS2 P07478 1/20 0.40
PRSS3 P35030 1/20 0.40
CES2 O00748 1/20 0.39
HPGD P15428 1/20 0.39
RARB P10826 1/20 0.39
MAPT P10636 1/20 0.39
THRB P10828 1/20 0.39
CNR1 P21554 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3034637 0.98 DGKA (0.53) DGKATSHRDNM1NAAAALDH1A1
SCHEMBL7886826 0.94 DGKA (0.50) DGKATSHRDNM1NAAAALDH1A1
SCHEMBL446057 0.94 DGKA (0.57) DGKATSHRDNM1NAAAALDH1A1
SCHEMBL447965 0.92 DGKA (0.55) DGKATSHRDNM1NAAAALDH1A1
SCHEMBL16631960 0.92 DGKA (0.61) DGKATSHRDNM1NAAAALDH1A1
SCHEMBL21618267 0.91 DGKA (0.52) DGKADNM1NAAAALDH1A1HTR2C
SCHEMBL17908786 0.90 DGKA (0.59) DGKATSHRDNM1NAAAALDH1A1
SCHEMBL17974565 0.90 DGKA (0.53) DGKATSHRDNM1NAAAALDH1A1
SCHEMBL17971058 0.90 DGKA (0.53) DGKATSHRDNM1NAAAALDH1A1
SCHEMBL17908811 0.90 DGKA (0.59) DGKATSHRDNM1NAAAALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 635 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250270481-A1 THINNER COMPOSITION DONGWOO FINE-CHEM CO., LTD. (KR) 2025-08-28 US claimed
CN-104536265-A Photoresist composition ZHEJIANG YONGTAI TECHNOLOGY CO LTD 2015-04-22 CN claimed
CN-103857751-A Composition for preparing alignment layer, alignment layer prepared therefrom, and retardation film DONGWOO FINE CHEM CO LTD 2014-06-11 CN claimed
CN-100429248-C Manufacturing method of acrylic copolymer resin for layer insulation film for TFT-LCD DONGJIN SAEMIGUNG CO LTD (KR) 2008-10-29 CN claimed
CN-101059653-A Photosensitive resin composition DONGJIN SEMICHEM CO LTD (KR) 2007-10-24 CN claimed
CN-1693322-A Manufacturing method of acrylic copolymer resin for layer insulation film for TFT-LCD DONGJIN SAEMIGUNG CO LTD (KR) 2005-11-09 CN claimed
US-12637529-B2 Resin composition and display device using the same SAMSUNG DISPLAY CO., LTD. (KR) 2026-05-26 US disclosed
US-20250270481-A1 THINNER COMPOSITION DONGWOO FINE-CHEM CO., LTD. (KR) 2025-08-28 US disclosed
US-20250230356-A1 THINNER COMPOSITION DONGWOO FINE-CHEM CO., LTD. (KR) 2025-07-17 US disclosed
CN-112947012-B Photosensitive resin and thinner composition for removing antireflection film, and photosensitive resin and method for removing antireflection film using same 东友精细化工有限公司 2025-04-11 CN disclosed
WO-2025071108-A1 RESIN COMPOSITION FOR ANTI-REFLECTIVE FILM, ANTI-REFLECTIVE FILM, AND SOLID-STATE IMAGING DEVICE 동우 화인켐 주식회사 2025-04-03 WO disclosed
CN-109976097-B Method of forming micropattern and substrate processing apparatus 三星电子株式会社 2024-06-18 CN disclosed
CN-110007563-B Negative photosensitive resin composition, spacer, protective film, and liquid crystal display element 奇美实业股份有限公司 2024-04-02 CN disclosed
US-6399267-B1 COPOLYMER CONTAINING UNSATURATED CARBOXY ACID OR ANHYDRIDE AND MONOMER OF EPOXY CONTAINING ACRYLIC ESTER JSR CORPORATION (JP) 2002-06-04 US disclosed
US-20020055059-A1 Radiation sensitive resin composition, cathode separator and el display device JSR CORPORATION (JP) 2002-05-09 US disclosed
EP-1193557-A1 Use of a radiation sensitive resin composition for the formation of cathode separator, cathode separator and electroluminescent display device JSR Corporation (JP) 2002-04-03 EP disclosed
US-20010044075-A1 Radiation sensitive resin composition for forming barrier ribs for an EL display element, barrier rib and EL display element JSR CORPORATION (JP) 2001-11-22 US disclosed
EP-1150165-A1 Radiation sensitive resin composition for forming barrier ribs for an el display element, barrier ribs and el display element JSR Corporation (JP) 2001-10-31 EP disclosed
EP-1057859-A2 Radiation sensitive resin composition and use of the same in an interlaminar insulating film JSR Corporation (JP) 2000-12-06 EP disclosed
EP-0908780-A1 Process for forming a cured film of a thermosetting resin JSR Corporation (JP) 1999-04-14 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12637529-B2 Resin composition and display device using the same JMJD6, ALKBH2, ARID2 DGKA 3299/4885TSHR 3217/4885DNM1 1935/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.