Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DGKA | P23743 | 1/20 | 0.55 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.50 |
| ▸ | NAAA | Q02083 | 1/20 | 0.50 |
| ▸ | HTR2C | P28335 | 1/20 | 0.49 |
| ▸ | ATM | Q13315 | 1/20 | 0.47 |
| ▸ | DNM1 | Q05193 | 1/20 | 0.46 |
| ▸ | TSHR | P16473 | 2/20 | 0.44 |
| ▸ | HPGD | P15428 | 1/20 | 0.44 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.44 |
| ▸ | PRSS2 | P07478 | 1/20 | 0.44 |
| ▸ | PRSS3 | P35030 | 1/20 | 0.44 |
| ▸ | RAD52 | P43351 | 1/20 | 0.43 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.43 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.42 |
| ▸ | FAAH | O00519 | 1/20 | 0.42 |
| ▸ | PAM | P19021 | 2/20 | 0.41 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.41 |
| ▸ | MAPT | P10636 | 1/20 | 0.41 |
| ▸ | RECQL | P46063 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17974565 | 0.98 | DGKA (0.53) | DGKAALDH1A1NAAAHTR2CATM | |
| SCHEMBL17971058 | 0.98 | DGKA (0.53) | DGKAALDH1A1NAAAHTR2CATM | |
| SCHEMBL20210536 | 0.94 | NAAA (0.59) | DGKAALDH1A1NAAAHTR2CDNM1 | |
| SCHEMBL3034637 | 0.94 | DGKA (0.53) | DGKAALDH1A1NAAAHTR2CATM | |
| SCHEMBL446057 | 0.94 | DGKA (0.57) | DGKAALDH1A1NAAAHTR2CATM | |
| SCHEMBL20210609 | 0.92 | NAAA (0.62) | DGKANAAAHTR2CDNM1TSHR | |
| SCHEMBL20210555 | 0.92 | NAAA (0.62) | DGKANAAAHTR2CDNM1TSHR | |
| SCHEMBL20210541 | 0.92 | NAAA (0.62) | DGKANAAAHTR2CDNM1TSHR | |
| SCHEMBL446329 | 0.92 | DGKA (0.55) | DGKAALDH1A1NAAAHTR2CATM | |
| SCHEMBL20210454 | 0.90 | DGKA (0.59) | DGKAALDH1A1NAAAHTR2CATM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 299 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250270481-A1 | THINNER COMPOSITION | DONGWOO FINE-CHEM CO., LTD. (KR) | 2025-08-28 | — | — | US | claimed |
| US-12637529-B2 | Resin composition and display device using the same | SAMSUNG DISPLAY CO., LTD. (KR) | 2026-05-26 | — | — | US | disclosed |
| US-20250270481-A1 | THINNER COMPOSITION | DONGWOO FINE-CHEM CO., LTD. (KR) | 2025-08-28 | — | — | US | disclosed |
| US-20250230356-A1 | THINNER COMPOSITION | DONGWOO FINE-CHEM CO., LTD. (KR) | 2025-07-17 | — | — | US | disclosed |
| CN-112947012-B | Photosensitive resin and thinner composition for removing antireflection film, and photosensitive resin and method for removing antireflection film using same | 东友精细化工有限公司 | 2025-04-11 | — | — | CN | disclosed |
| WO-2025071108-A1 | RESIN COMPOSITION FOR ANTI-REFLECTIVE FILM, ANTI-REFLECTIVE FILM, AND SOLID-STATE IMAGING DEVICE | 동우 화인켐 주식회사 | 2025-04-03 | — | — | WO | disclosed |
| CN-119065043-A | Composition, optical film, layer, optical filter, optical element, solid-state imaging device, and camera module | JSR株式会社 | 2024-12-03 | — | — | CN | disclosed |
| CN-109976097-B | Method of forming micropattern and substrate processing apparatus | 三星电子株式会社 | 2024-06-18 | — | — | CN | disclosed |
| CN-110007563-B | Negative photosensitive resin composition, spacer, protective film, and liquid crystal display element | 奇美实业股份有限公司 | 2024-04-02 | — | — | CN | disclosed |
| CN-111324013-B | Chemically amplified positive photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2023-12-01 | — | — | CN | disclosed |
| WO-2003017001-A1 | PHOTOSENSITIVE RESIN COMPOSITION FOR PHOTORESIST | DONGJIN SEMICHEM CO., LTD. (KR) | 2003-02-27 | — | — | WO | disclosed |
| EP-1235104-A1 | COMPOSITION HAVING REFRACTIVE INDEX SENSITIVELY CHANGEABLE BY RADIATION AND METHOD FOR FORMING REFRACTIVE INDEX PATTERN | JSR Corporation (JP) | 2002-08-28 | — | — | EP | disclosed |
| US-6399267-B1 | COPOLYMER CONTAINING UNSATURATED CARBOXY ACID OR ANHYDRIDE AND MONOMER OF EPOXY CONTAINING ACRYLIC ESTER | JSR CORPORATION (JP) | 2002-06-04 | — | — | US | disclosed |
| US-20020055059-A1 | Radiation sensitive resin composition, cathode separator and el display device | JSR CORPORATION (JP) | 2002-05-09 | — | — | US | disclosed |
| EP-1193557-A1 | Use of a radiation sensitive resin composition for the formation of cathode separator, cathode separator and electroluminescent display device | JSR Corporation (JP) | 2002-04-03 | — | — | EP | disclosed |
| US-20010044075-A1 | Radiation sensitive resin composition for forming barrier ribs for an EL display element, barrier rib and EL display element | JSR CORPORATION (JP) | 2001-11-22 | — | — | US | disclosed |
| EP-1150165-A1 | Radiation sensitive resin composition for forming barrier ribs for an el display element, barrier ribs and el display element | JSR Corporation (JP) | 2001-10-31 | — | — | EP | disclosed |
| US-6168908-B1 | COATING AN ALKALI-SOLUBLE THERMOSETTING RESIN ON A SUBSTRATE, AND BAKING IT, COATING A RADIATION SENSITIVE RESIN ON THE COATED FILM, AND BAKING, EXPOSING THE RADIATION SENSITIVE FILM TO A RADIATION THROUGH A MASK AND BAKING, DEVELOPING | JSR CORPORATION (JP) | 2001-01-02 | — | — | US | disclosed |
| EP-1057859-A2 | Radiation sensitive resin composition and use of the same in an interlaminar insulating film | JSR Corporation (JP) | 2000-12-06 | — | — | EP | disclosed |
| EP-0908780-A1 | Process for forming a cured film of a thermosetting resin | JSR Corporation (JP) | 1999-04-14 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12637529-B2 | Resin composition and display device using the same | JMJD6, ALKBH2, ARID2 | DGKA 3299/4885ALDH1A1 209/4885NAAA 607/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.