SCHEMBL4469349

SCHEMBL4469349

CCC(C)OCC(C)OCC(C)O

nearest known ligand 0.59

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 2/20 0.59
TSHR P16473 2/20 0.43
HSD17B10 Q99714 1/20 0.41
MAPK1 P28482 1/20 0.37
MAPT P10636 1/20 0.31
LMNA P02545 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12308430 1.00 TDP1 (0.59) TDP1TSHRHSD17B10MAPK1MAPT
SCHEMBL1476173 0.95
SCHEMBL16933768 0.86 TDP1 (0.55) TDP1TSHRHSD17B10MAPK1
SCHEMBL4898614 0.83 TDP1 (0.48) TDP1TSHRHSD17B10MAPK1
SCHEMBL250892 0.82 TDP1 (0.68) TDP1TSHRHSD17B10MAPK1LMNA
SCHEMBL17504736 0.82 TDP1 (0.68) TDP1TSHRHSD17B10MAPK1LMNA
SCHEMBL137830 0.82 TDP1 (0.56) TDP1TSHRHSD17B10MAPK1LMNA
SCHEMBL2512363 0.82 TDP1 (0.56) TDP1TSHRHSD17B10MAPK1LMNA
SCHEMBL535994 0.82 TDP1 (0.56) TDP1TSHRHSD17B10MAPK1LMNA
SCHEMBL9999736 0.82 TDP1 (0.56) TDP1TSHRHSD17B10MAPK1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 558 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3617281-B1 SOLVENT COMPOSITION FOR ELECTRONIC DEVICE PRODUCTION DAICEL CORP (JP) 2024-04-17 EP claimed
EP-3382770-B1 INK COMPOSITION FOR FORMING AN ORGANIC LAYER OF A SEMICONDUCTOR NOVALED GMBH (DE) 2023-09-20 EP claimed
US-11655381-B2 Solvent composition for electronic device production DAICEL CORPORATION (JP) 2023-05-23 US claimed
US-11597851-B2 Ink for screen printing DAICEL CORPORATION (JP) 2023-03-07 US claimed
US-20210115272-A1 SOLVENT COMPOSITION FOR ELECTRONIC DEVICE PRODUCTION DAICEL CORPORATION (JP) 2021-04-22 US claimed
EP-3617281-A1 SOLVENT COMPOSITION FOR PRODUCING ELECTRONIC DEVICE Daicel Corporation (JP) 2020-03-04 EP claimed
US-10562991-B2 Developer, pattern forming method, and electronic device manufacturing method FUJIFILM CORPORATION (JP) 2020-02-18 US claimed
EP-2843015-B1 Method of manufacturing ink for forming functional layer and method of manufacturing organic EL element SEIKO EPSON CORP (JP) 2017-04-12 EP claimed
US-20140316054-A1 METHOD OF FORMING FILM TOKYO OHKA KOGYO CO., LTD. (JP) 2014-10-23 US claimed
US-20090176100-A1 VAPOR-GROWN CARBON FIBER AND PRODUCTION PROCESS THEREOF SHOWA DENKO K.K. (JP) 2009-07-09 US claimed
EP-1966420-A4 VAPOR-GROWN CARBON FIBER AND PRODUCTION PROCESS THEREOF SHOWA DENKO KK (JP) 2009-06-10 EP claimed
EP-1966420-A1 VAPOR-GROWN CARBON FIBER AND PRODUCTION PROCESS THEREOF Showa Denko K.K. (JP) 2008-09-10 EP claimed
WO-2007072584-A1 VAPOR-GROWN CARBON FIBER AND PRODUCTION PROCESS THEREOF SHOWA DENKO K.K. (JP) 2007-06-28 WO claimed
US-12638772-B2 Resist underlayer film-forming composition NISSAN CHEMICAL CORPORATION (JP) 2026-05-26 US disclosed
US-12619150-B2 Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic film SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-05-05 US disclosed
US-12620777-B2 Optical member, laser module including said optical member, and laser device DAICEL CORPORATION (JP) 2026-05-05 US disclosed
US-20080083072-A1 Drycleaning method LYONDELL CHEMICAL TECHNOLOGY, L.P. 2008-04-10 US disclosed
WO-2007072584-A1 VAPOR-GROWN CARBON FIBER AND PRODUCTION PROCESS THEREOF SHOWA DENKO K.K. (JP) 2007-06-28 WO disclosed
EP-1689844-A1 METHOD, ARTICLES AND COMPOSITIONS FOR CLEANING BATHROOM SURFACES THE PROCTER & GAMBLE COMPANY (US) 2006-08-16 EP disclosed
WO-2005056745-A1 METHOD, ARTICLES AND COMPOSITIONS FOR CLEANING BATHROOM SURFACES THE PROCTER & GAMBLE COMPANY (US) 2005-06-23 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12638772-B2 Resist underlayer film-forming composition RFC2, RFC1, RFC4 TDP1 1819/4885TSHR 4320/4885HSD17B10 1139/4885
US-20210115272-A1 SOLVENT COMPOSITION FOR ELECTRONIC DEVICE PRODUCTION RER1, EFNA1, EPHA1 TDP1 1268/4885TSHR 4809/4885HSD17B10 643/4885
US-12620777-B2 Optical member, laser module including said optical member, and laser device MARK3, OR10J3, ILK TDP1 4063/4885TSHR 1155/4885HSD17B10 4701/4885
US-11655381-B2 Solvent composition for electronic device production RER1, EFNA1, EPHA1 TDP1 1268/4885TSHR 4809/4885HSD17B10 643/4885
US-12619150-B2 Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic film FN1, POF1B, MTX1 TDP1 1068/4885TSHR 1700/4885HSD17B10 2483/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.