Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 2/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.32 |
| ▸ | MAPT | P10636 | 2/20 | 0.32 |
| ▸ | TP53 | P04637 | 1/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.32 |
| ▸ | HTR2B | P41595 | 1/20 | 0.32 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
| ▸ | GAA | P10253 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1134080 | 0.90 | LMNA (0.30) | LMNACYP3A4MAPTTP53CYP1A2 | |
| SCHEMBL9685437 | 0.90 | LMNA (0.30) | LMNACYP3A4MAPTTP53CYP1A2 | |
| SCHEMBL7081560 | 0.90 | LMNA (0.30) | LMNACYP3A4MAPTTP53CYP1A2 | |
| SCHEMBL31314887 | 0.83 | MAPT (0.32) | LMNACYP3A4MAPTTP53CYP1A2 | |
| SCHEMBL36560 | 0.82 | ALDH1A1 (0.40) | LMNACYP3A4CYP1A2ALDH1A1TDP1 | |
| SCHEMBL30561568 | 0.79 | CYP3A4 (0.35) | LMNACYP3A4MAPTTP53CYP1A2 | |
| Fluoride Ion SCHEMBL25292299 | 0.78 | ALDH1A1 (0.39) | LMNACYP3A4CYP1A2ALDH1A1TDP1 | |
| SCHEMBL12762155 | 0.78 | ALDH1A1 (0.38) | LMNACYP3A4MAPTCYP1A2ALDH1A1 | |
| Water SCHEMBL105507 | 0.78 | ALDH1A1 (0.38) | LMNACYP3A4CYP1A2ALDH1A1TDP1 | |
| SCHEMBL2058395 | 0.78 | ALDH1A1 (0.38) | LMNACYP3A4CYP1A2ALDH1A1TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 245 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250377591-A1 | PHOTORESIST COMPOSITION AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE | SAMSUNG ELECTRONICS CO LTD (KR) | 2025-12-11 | — | — | US | claimed |
| CN-120072405-A | Single-component low-temperature curing silver paste stored at normal temperature and preparation method thereof | 珠海格力新材料有限公司 | 2025-05-30 | — | — | CN | claimed |
| CN-119923600-A | Chemically amplified positive resist composition for improving pattern profile and enhancing adhesion | YC化学制品株式会社 | 2025-05-02 | — | — | CN | claimed |
| CN-119752373-A | Thermosetting electrolyte-resistant adhesive, and preparation method and application thereof | 拓迪化学(上海)股份有限公司 | 2025-04-04 | — | — | CN | claimed |
| CN-112313580-B | Chemical amplification type positive photoresist composition for improving pattern profile | 荣昌化学制品株式会社 | 2024-11-22 | — | — | CN | claimed |
| CN-118818901-A | KrF negative photoresist and preparation method and patterning forming method thereof | 厦门恒坤新材料科技股份有限公司 | 2024-10-22 | — | — | CN | claimed |
| CN-118222229-A | Anisotropic conductive adhesive and curing method thereof | 深圳先进电子材料国际创新研究院 | 2024-06-21 | — | — | CN | claimed |
| CN-117795418-A | Chemically amplified positive resist composition for pattern profile and resolution improvement | YC化学制品株式会社 | 2024-03-29 | — | — | CN | claimed |
| US-11906900-B2 | Chemically amplified positive photoresist composition for improving pattern profile | YOUNG CHANG CHEMICAL CO., LTD (KR) | 2024-02-20 | — | — | US | claimed |
| WO-2023027360-A1 | CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR IMPROVING PATTERN PROFILE AND RESOLUTION | 영창케미칼 주식회사 | 2023-03-02 | — | — | WO | claimed |
| US-20020155379-A1 | Photosensitive monomer, photosensitive polymer and chemically amplified resist composition comprising lactone group having acid-labile protecting group | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2002-10-24 | — | — | US | claimed |
| US-20020146642-A1 | Photosensitive polymers and resist compositions comprising the photosensitive polymers | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2002-10-10 | — | — | US | claimed |
| US-20020042016-A1 | Resist composition comprising photosensitive polymer having loctone in its backbone | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2002-04-11 | — | — | US | claimed |
| US-6300036-B1 | COPOLYMER OF MALEIC ANHYDRIDE AND 2-NORBORNENE-5-METHANOL DERIVATIVE; ACCURATE PATTERNS WHEN EXPOSED TO ARGON FLUORIDE LASERS; DRY ETCHING RESISTANCE | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2001-10-09 | — | — | US | claimed |
| US-20010024763-A1 | Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2001-09-27 | — | — | US | claimed |
| US-6287747-B1 | CONTAINING ORGANOOXYGEN COMPOUNDS AND UNSATURATED COMPOUNDS | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2001-09-11 | — | — | US | claimed |
| US-6143466-A | Chemically amplified photoresist composition | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2000-11-07 | — | — | US | claimed |
| US-6143465-A | Photosensitive polymer having cyclic backbone and resist composition comprising same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2000-11-07 | — | — | US | claimed |
| US-6080524-A | Photosensitive polymer having cyclic backbone and resist composition comprising the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2000-06-27 | — | — | US | claimed |
| EP-0921439-A1 | Photosensitive polymer and chemically amplified resist composition using the same | Samsung Electronics Co., Ltd. (KR) | 1999-06-09 | — | — | EP | claimed |