⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8977871 | 0.85 | THRB (0.32) | — | |
| SCHEMBL451219 | 0.79 | — | — | |
| SCHEMBL14937116 | 0.78 | — | — | |
| SCHEMBL25186548 | 0.75 | THRB (0.39) | — | |
| SCHEMBL7062591 | 0.73 | PKM (0.30) | — | |
| SCHEMBL9842301 | 0.73 | — | — | |
| SCHEMBL6062455 | 0.72 | — | — | |
| SCHEMBL3183011 | 0.72 | THRB (0.35) | — | |
| SCHEMBL22118485 | 0.71 | — | — | |
| SCHEMBL8383945 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9604891-B2 | Methods for producing fluorine-containing hydroxyaldehyde, fluorine-containing propanediol, and fluorine-containing alcohol monomer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2017-03-28 | — | — | US | disclosed |
| US-9488914-B2 | Fluorine-containing sulfonic acid salt, fluorine-containing sulfonic acid salt resin, resist composition, and pattern forming method using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2016-11-08 | — | — | US | disclosed |
| US-20150361026-A1 | Methods for Producing Fluorine-Containing Hydroxyaldehyde, Fluorine-Containing Propanediol, and Fluorine-Containing Alcohol Monomer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-12-17 | — | — | US | disclosed |
| US-20150198879-A1 | Fluorine-Containing Sulfonic Acid Salt, Fluorine-Containing Sulfonic Acid Salt Resin, Resist Composition, and Pattern Forming Method Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-07-16 | — | — | US | disclosed |
| US-8663903-B2 | Top coating composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-03-04 | — | — | US | disclosed |
| US-20130216960-A1 | Water Repellent Additive for Immersion Resist | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-08-22 | — | — | US | disclosed |
| US-20120064459-A1 | Water Repellent Additive for Immersion Resist | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-03-15 | — | — | US | disclosed |
| EP-1645554-B1 | NOVEL POLYMERIZABLE ACRYLATE COMPOUND CONTAINING HEXAFLUOROCARBINOL GROUP AND POLYMER MADE THEREFROM | CENTRAL GLASS CO LTD (JP) | 2010-12-08 | — | — | EP | disclosed |
| US-7781602-B2 | Fluorinated cyclic compound, polymerizable fluoromonomer, fluoropolymer, resist material comprising the same, and method of forming pattern with the same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2010-08-24 | — | — | US | disclosed |
| US-7750178-B2 | Polymerizable acrylate compound containing hexafluorocarbinol group and polymer made therefrom | CENTRAL GLASS COMPANY, LIMITED (JP) | 2010-07-06 | — | — | US | disclosed |
| US-20060217507-A1 | Novel polymerizable acrylate compound containing hexafluorocarbinol group and polymer made therefrom | CENTRAL GLASS COMPANY, LIMITED (JP) | 2006-09-28 | — | — | US | disclosed |
| US-20060135744-A1 | Fluorinated cyclic compound, polymerizable fluoromonomer, fluoropolymer, resist material comprising the same, and method of forming pattern with the same | CENTRAL GLASS COMPANY LIMITED (JP) | 2006-06-22 | — | — | US | disclosed |
| EP-1645554-A1 | NOVEL POLYMERIZABLE ACRYLATE COMPOUND CONTAINING HEXAFLUOROCARBINOL GROUP AND POLYMER MADE THEREFROM | Central Glass Company, Limited (JP) | 2006-04-12 | — | — | EP | disclosed |
| US-20060057489-A1 | Lactone compounds, lactone-containing monomers, their polymers, resist compositions using same, and processes for forming patterns using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2006-03-16 | — | — | US | disclosed |
| US-20060008735-A1 | Radiation sensitive resin composition for forming microlens | JSR CORPORATION (JP) | 2006-01-12 | — | — | US | disclosed |
| US-20050250898-A1 | Top coat composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2005-11-10 | — | — | US | disclosed |
| EP-0541395-B1 | Coating agents | TAKEMOTO OIL & FAT CO LTD (JP) | 1996-05-08 | — | — | EP | disclosed |
| US-5501904-A | POLYSILOXANE-VINYL GRAFT POLYMER | TAKEMOTO YUSHI KABUSHIKI KAISHA (JP) | 1996-03-26 | — | — | US | disclosed |
| US-5405691-A | Polysiloxane-polyvinyl graft copolymer | TAKEMOTO YUSHI KABUSHIKI KAISHA (JP) | 1995-04-11 | — | — | US | disclosed |
| EP-0541395-A1 | Coating agents | Takemoto Yushi Kabushiki Kaisha (JP) | 1993-05-12 | — | — | EP | disclosed |