SCHEMBL4512917

SCHEMBL4512917

CCC(=O)OOOC(=O)C(C)CC

nearest known ligand 0.39

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 1/20 0.34
HIF1A Q16665 1/20 0.34
NAAA Q02083 1/20 0.32
ALOX15 P16050 1/20 0.32
MGAM O43451 1/20 0.30
GAA P10253 1/20 0.30
SI P14410 1/20 0.30
MGAM2 Q2M2H8 1/20 0.30
ALDH1A1 P00352 1/20 0.30
SOAT1 P35610 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28705124 0.87 NAAA (0.34) ESR1HIF1ANAAAALOX15MGAM
SCHEMBL15140662 0.83 NAAA (0.34) ESR1HIF1ANAAAALOX15MGAM
SCHEMBL11792511 0.82 NAAA (0.37) ESR1HIF1ANAAAALOX15MGAM
SCHEMBL5427965 0.79 ALDH1A1 (0.36) ALOX15MGAMGAASIMGAM2
SCHEMBL6535087 0.79 ALDH1A1 (0.43) ESR1HIF1ANAAAALOX15MGAM
SCHEMBL248665 0.74 SOAT1 (0.39) ALOX15MGAMGAASIMGAM2
SCHEMBL614185 0.74 SOAT1 (0.39) ALOX15MGAMGAASIMGAM2
SCHEMBL2672389 0.73
SCHEMBL7924470 0.73 POLB (0.33) ALDH1A1
SCHEMBL4740532 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112912948-A Black matrix substrate and display device provided with same 凸版印刷株式会社 2021-06-04 CN disclosed
EP-1971899-B1 PHOTOLITHOGRAPHIC SYSTEMS FOR PRODUCING SUB-DIFFRACTION-LIMITED FEATURES MICRON TECHNOLOGY INC (US) 2014-12-10 EP disclosed
US-20090203216-A1 PHOTOLITHOGRAPHIC SYSTEMS AND METHODS FOR PRODUCING SUB-DIFFRACTION-LIMITED FEATURES MICRON TECHNOLOGY, INC. (US) 2009-08-13 US disclosed
US-7538858-B2 Photolithographic systems and methods for producing sub-diffraction-limited features MICRON TECHNOLOGY, INC. (US) 2009-05-26 US disclosed
EP-1971899-A2 PHOTOLITHOGRAPHIC SYSTEMS AND METHODS FOR PRODUCING SUB-DIFFRACTION-LIMITED FEATURES Micron Technology, Inc. (US) 2008-09-24 EP disclosed
WO-2007081813-A2 PHOTOLITHOGRAPHIC SYSTEMS AND METHODS FOR PRODUCING SUB-DIFFRACTION-LIMITED FEATURES MICRON TECHNOLOGY, INC. (US) 2007-07-19 WO disclosed
US-20070159617-A1 Photolithographic systems and methods for producing sub-diffraction-limited features MICRON TECHNOLOGY, INC. 2007-07-12 US disclosed