SCHEMBL3789167

SCHEMBL3789167

CC(C)(C)c1ccc([S+](c2ccc(O)cc2)c2ccc(C(C)(C)C)cc2)cc1.O=S(=O)([O-])c1ccccc1C(F)(F)F

nearest known ligand 0.45

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 8/20 0.45
UQCRB P14927 3/20 0.43
LMNA P02545 1/20 0.40
TYR P14679 1/20 0.40
ESR1 P03372 1/20 0.39
HSD17B2 P37059 1/20 0.39
KMT2A Q03164 3/20 0.38
KAT6A Q92794 1/20 0.38
FFAR1 O14842 1/20 0.37
FFAR4 Q5NUL3 1/20 0.37
MEN1 O00255 2/20 0.37
ESRRG P62508 1/20 0.37
SLC22A12 Q96S37 1/20 0.36
ALDH1A1 P00352 1/20 0.36
HSD17B3 P37058 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5445938 0.94 HSD11B1 (0.47) HSD11B1KMT2AFFAR1FFAR4MEN1
SCHEMBL38660618 0.92 KAT6A (0.42) HSD11B1ESR1KMT2AKAT6AFFAR4
SCHEMBL29754085 0.91 HSD11B1 (0.45) HSD11B1KMT2AFFAR1FFAR4MEN1
SCHEMBL452162 0.91 HSD11B1 (0.45) HSD11B1KMT2AFFAR1FFAR4MEN1
SCHEMBL2895718 0.90 KMT2A (0.42) HSD11B1ESR1KMT2AKAT6AFFAR4
SCHEMBL451959 0.81 KMT2A (0.46) HSD11B1KMT2AKAT6AMEN1SLC22A12
SCHEMBL3204977 0.79 SLC22A12 (0.42) HSD11B1KMT2AFFAR1FFAR4MEN1
SCHEMBL450233 0.78 GAA (0.53) HSD11B1LMNAKMT2AFFAR4MEN1
SCHEMBL31210331 0.78 HSD11B1 (0.47) HSD11B1KMT2AFFAR1FFAR4MEN1
SCHEMBL453146 0.78 HSD11B1 (0.47) HSD11B1KMT2AFFAR1FFAR4MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7858287-B2 Photosensitive resin, and photosensitive composition HYOGO PREFECTURE (JP) 2010-12-28 US disclosed
US-20090142697-A1 PHOTOSENSITIVE RESIN, AND PHOTOSENSITIVE COMPOSITION TOYO GOSEI CO., LTD. (JP) 2009-06-04 US disclosed