Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SIRT6 | Q8N6T7 | 1/20 | 0.42 |
| ▸ | NAPRT | Q6XQN6 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | JUN | P05412 | 1/20 | 0.30 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.30 |
| ▸ | NFKB2 | Q00653 | 1/20 | 0.30 |
| ▸ | RELA | Q04206 | 1/20 | 0.30 |
| ▸ | EGFR | P00533 | 1/20 | 0.30 |
| ▸ | GAA | P10253 | 1/20 | 0.30 |
| ▸ | POLB | P06746 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11561904 | 0.85 | KDM4E (0.39) | NAPRTKDM4ESMN1; SMN2 | |
| SCHEMBL20609889 | 0.79 | SIRT6 (0.39) | SIRT6NAPRTSMN1; SMN2MAPTPOLB | |
| SCHEMBL20610121 | 0.77 | CA2 (0.47) | SIRT6SMN1; SMN2MAPTGAA | |
| SCHEMBL422105 | 0.77 | SIRT6 (0.38) | SIRT6SMN1; SMN2MAPTPOLB | |
| SCHEMBL28993826 | 0.76 | SMN1; SMN2 (0.38) | SIRT6SMN1; SMN2MAPTPOLB | |
| SCHEMBL3387459 | 0.71 | L3MBTL1 (0.42) | KDM4EPOLB | |
| Sulfuric Acid SCHEMBL28987143 | 0.71 | SIRT6 (0.41) | SIRT6NAPRTSMN1; SMN2MAPT | |
| SCHEMBL933680 | 0.71 | — | — | |
| SCHEMBL11370935 | 0.70 | HTT (0.49) | KDM4ESMN1; SMN2MAPTGAAPOLB | |
| Hydrochloric Acid SCHEMBL28287282 | 0.70 | L3MBTL1 (0.41) | KDM4EPOLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10254648-B2 | Radiation-sensitive resin composition, resin film, and electronic device | ZEON CORPORTION (JP) | 2019-04-09 | — | — | US | disclosed |
| US-20160209744-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIN FILM, AND ELECTRONIC DEVICE | ZEON CORPORATION (JP) | 2016-07-21 | — | — | US | disclosed |
| US-20090202793-A1 | Photosensitive, Aqueous Alkaline Solution-Soluble Polyimide Resin and Photosensitive Resin Composition Containing the same | NIPPON KAYAKU KABUSHIKI KAISHA | 2009-08-13 | — | — | US | disclosed |
| CN-1235089-C | Photosensitive lithographic printing plate | FUJI PHOTO FILM CO LTD (JP) | 2006-01-04 | — | — | CN | disclosed |