SCHEMBL45252

SCHEMBL45252

CCC(=O)OSCc1ccccc1

nearest known ligand 0.47

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
RAB9A P51151 2/20 0.47
HTT P42858 2/20 0.47
LMNA P02545 1/20 0.47
NPC1 O15118 1/20 0.42
SMN1; SMN2 Q16637 1/20 0.42
CYP2C19 P33261 1/20 0.42
IDO1 P14902 2/20 0.41
ELANE P08246 1/20 0.41
TSHR P16473 1/20 0.41
ALDH1A1 P00352 5/20 0.40
L3MBTL1 Q9Y468 3/20 0.40
MAPK1 P28482 2/20 0.40
PKM P14618 1/20 0.40
FFAR1 O14842 1/20 0.40
KMT2A Q03164 1/20 0.40
GAA P10253 1/20 0.39
TDP1 Q9NUW8 1/20 0.39
CYP2C9 P11712 1/20 0.38
PAM P19021 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27638031 0.86 CYP2C19 (0.43) RAB9AHTTLMNANPC1SMN1; SMN2
SCHEMBL28722296 0.84 TDP1 (0.46) RAB9AHTTLMNANPC1SMN1; SMN2
SCHEMBL27618281 0.83 L3MBTL1 (0.48) SMN1; SMN2CYP2C19IDO1TSHRALDH1A1
SCHEMBL10519643 0.81 ALDH1A1 (0.52) LMNACYP2C19IDO1TSHRALDH1A1
SCHEMBL28545475 0.80 EPHX2 (0.50) ALDH1A1KMT2APAM
SCHEMBL7606998 0.80 EPHX2 (0.50) ALDH1A1KMT2APAM
SCHEMBL1722106 0.80 CYP2C19 (0.47) LMNASMN1; SMN2CYP2C19IDO1TSHR
SCHEMBL5688937 0.80 CYP2C19 (0.47) LMNASMN1; SMN2CYP2C19IDO1ALDH1A1
SCHEMBL11000853 0.77 LOXL2 (0.42) ALDH1A1FFAR1
SCHEMBL27847625 0.77 TDP1 (0.55) RAB9AHTTLMNANPC1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108570279-A A kind of nano modification coating material and preparation method thereof 沈阳化工研究院有限公司 2018-09-25 CN claimed
CN-111856881-B Photosensitive resin composition, dry film resist and corresponding element 杭州福斯特电子材料有限公司 2024-03-26 CN disclosed
CN-117311093-A Dry film resist laminate and dry film resist composition 杭州福斯特电子材料有限公司 2023-12-29 CN disclosed
CN-111796483-B Resin composition, mixture, dry film resist and corresponding element 福斯特(安吉)新材料有限公司 2021-06-25 CN disclosed
CN-111796483-A Resin composition, mixture, dry film resist and corresponding element 福斯特(安吉)新材料有限公司 2020-10-20 CN disclosed
CN-108570279-A A kind of nano modification coating material and preparation method thereof 沈阳化工研究院有限公司 2018-09-25 CN disclosed