Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LIPG | Q9Y5X9 | 1/20 | 0.40 |
| ▸ | STS | P08842 | 2/20 | 0.36 |
| ▸ | KCNH2 | Q12809 | 6/20 | 0.36 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.35 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.35 |
| ▸ | NR1H3 | Q13133 | 1/20 | 0.35 |
| ▸ | CYSLTR2 | Q9NS75 | 2/20 | 0.35 |
| ▸ | CYSLTR1 | Q9Y271 | 2/20 | 0.35 |
| ▸ | APLNR | P35414 | 1/20 | 0.35 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.34 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.34 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.34 |
| ▸ | GHSR | Q92847 | 1/20 | 0.34 |
| ▸ | BID | P55957 | 1/20 | 0.33 |
| ▸ | BCL2L1 | Q07817 | 1/20 | 0.33 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.33 |
| ▸ | BAK1 | Q16611 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1802056 | 0.91 | KCNH2 (0.40) | LIPGKCNH2HSD11B1NR1H2NR1H3 | |
| SCHEMBL218632 | 0.89 | LIPG (0.45) | LIPGKCNH2NR1H2NR1H3CYSLTR2 | |
| Toliodium SCHEMBL2902758 | 0.88 | LIPG (0.42) | LIPGKCNH2NR1H2NR1H3CYSLTR2 | |
| SCHEMBL1802910 | 0.86 | LIPG (0.41) | LIPGKCNH2NR1H2NR1H3CYSLTR2 | |
| SCHEMBL5443786 | 0.85 | LIPG (0.40) | LIPGSTSKCNH2HSD11B1NR1H2 | |
| SCHEMBL16895142 | 0.84 | LIPG (0.54) | LIPGKCNH2NR1H2NR1H3CYSLTR2 | |
| Potassium Ion SCHEMBL23749193 | 0.83 | LIPG (0.53) | LIPGKCNH2NR1H2NR1H3CYSLTR2 | |
| Lithium Ion SCHEMBL21822098 | 0.83 | LIPG (0.53) | LIPGKCNH2NR1H2NR1H3CYSLTR2 | |
| Lithium Ion SCHEMBL21822093 | 0.83 | LIPG (0.53) | LIPGKCNH2NR1H2NR1H3CYSLTR2 | |
| Lithium Ion SCHEMBL21822101 | 0.83 | LIPG (0.53) | LIPGKCNH2NR1H2NR1H3CYSLTR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 259 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3010943-B1 | CURABLE COMPOSITION, FILM, AND METHOD OF PRODUCING FILM | CANON KK (JP) | 2024-04-03 | — | — | EP | disclosed |
| US-11681227-B2 | Enhanced EUV photoresist materials, formulations and processes | IRRESISTIBLE MATERIALS LTD (GB) | 2023-06-20 | — | — | US | disclosed |
| US-20220283499-A1 | COMPOSITION FOR FORMING UNDERLAYER FILM, RESIST PATTERN FORMING METHOD, AND MANUFACTURING METHOD OF ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2022-09-08 | — | — | US | disclosed |
| US-11332597-B2 | Photo-curable composition and patterning method using the same | CANON KABUSHIKI KAISHA (JP) | 2022-05-17 | — | — | US | disclosed |
| US-20200272050-A1 | Enhanced EUV Photoresist Materials, Formulations and Processes | IRRESISTIBLE MATERIALS, LTD (GB) | 2020-08-27 | — | — | US | disclosed |
| EP-2841255-B1 | RESIN PRODUCTION METHOD AND RESIN PRODUCTION APPARATUS | CANON KK (JP) | 2020-05-13 | — | — | EP | disclosed |
| US-20200123343-A1 | PHOTO-CURABLE COMPOSITION AND PATTERNING METHOD USING THE SAME | CANON KK (JP) | 2020-04-23 | — | — | US | disclosed |
| US-10472445-B2 | Photocurable composition and method for manufacturing film | CANON KABUSHIKI KAISHA (JP) | 2019-11-12 | — | — | US | disclosed |
| US-10421853-B2 | Photosensitive gas generating agent and photocurable composition | CANON KABUSHIKI KAISHA (JP) | 2019-09-24 | — | — | US | disclosed |
| EP-2907156-B1 | IMPRINTING METHOD AND CURABLE COMPOSITION FOR IMPRINTING | CANON KK (JP) | 2019-04-10 | — | — | EP | disclosed |
| US-6180316-B1 | SUITABLE FOR USE AS CHEMICALLY AMPLIFIED RESIST USED IN MANUFACTURING OF INTEGRATED CIRCUITS | JSR CORPORATION (JP) | 2001-01-30 | — | — | US | disclosed |
| EP-1048983-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 2000-11-02 | — | — | EP | disclosed |
| US-6136500-A | CONTAINS A PHOTOACID GENERATOR COMPRISING A COMBINATION OF A COMPOUND THAT GENERATES A CARBOXYLIC ACID UPON EXPOSURE TO RADIATION AND ANOTHER COMPOUND THAT GENERATES ANOTHER ACID UPON EXPOSURE TO RADIATION | JSR CORPORATION (JP) | 2000-10-24 | — | — | US | disclosed |
| EP-1045290-A2 | Composition for resist underlayer film and method for producing the same | JSR Corporation (JP) | 2000-10-18 | — | — | EP | disclosed |
| EP-1035436-A1 | Resist pattern formation method | JSR Corporation (JP) | 2000-09-13 | — | — | EP | disclosed |
| EP-1011029-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2000-06-21 | — | — | EP | disclosed |
| EP-0930541-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1999-07-21 | — | — | EP | disclosed |
| EP-0898201-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1999-02-24 | — | — | EP | disclosed |
| EP-0849634-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-06-24 | — | — | EP | disclosed |
| EP-0789278-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-08-13 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10421853-B2 | Photosensitive gas generating agent and photocurable composition | PFN1, PFAS, FRG1 | LIPG 777/4885STS 2869/4885KCNH2 1172/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.