Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 3/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.40 |
| ▸ | MEN1 | O00255 | 2/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.40 |
| ▸ | RAB9A | P51151 | 1/20 | 0.39 |
| ▸ | CES1 | P23141 | 1/20 | 0.38 |
| ▸ | ALKBH2 | Q6NS38 | 1/20 | 0.37 |
| ▸ | ALKBH3 | Q96Q83 | 1/20 | 0.37 |
| ▸ | FTO | Q9C0B1 | 1/20 | 0.37 |
| ▸ | POLB | P06746 | 2/20 | 0.36 |
| ▸ | MMP7 | P09237 | 1/20 | 0.36 |
| ▸ | KAT6A | Q92794 | 2/20 | 0.36 |
| ▸ | RORC | P51449 | 1/20 | 0.35 |
| ▸ | SLC22A12 | Q96S37 | 1/20 | 0.35 |
| ▸ | PTGES | O14684 | 1/20 | 0.34 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL503620 | 0.82 | CES1 (0.46) | HSD11B1RAB9ACES1KAT6A | |
| Trifluoromethylbenzene SCHEMBL28170271 | 0.80 | CES1 (0.50) | HSD11B1ALDH1A1RAB9ACES1 | |
| SCHEMBL27612829 | 0.79 | SMN1; SMN2 (0.50) | HSD11B1ALDH1A1RAB9ACES1POLB | |
| SCHEMBL11057570 | 0.79 | CES1 (0.45) | HSD11B1KMT2AMEN1ALDH1A1RAB9A | |
| SCHEMBL36374 | 0.78 | CES1 (0.48) | KMT2AMEN1ALDH1A1CES1POLB | |
| SCHEMBL29624178 | 0.77 | KMT2A (0.56) | HSD11B1KMT2AMEN1ALDH1A1RAB9A | |
| SCHEMBL247640 | 0.77 | KMT2A (0.56) | HSD11B1KMT2AMEN1ALDH1A1RAB9A | |
| SCHEMBL27909863 | 0.76 | TSHR (0.37) | KMT2A | |
| SCHEMBL29613076 | 0.76 | KMT2A (0.46) | HSD11B1KMT2AMEN1ALDH1A1RAB9A | |
| SCHEMBL21874985 | 0.75 | CES1 (0.39) | HSD11B1KMT2AMEN1CES1KAT6A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 50 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3010943-B1 | CURABLE COMPOSITION, FILM, AND METHOD OF PRODUCING FILM | CANON KK (JP) | 2024-04-03 | — | — | EP | disclosed |
| US-11592605-B2 | Color developing structure having concave-convex layer, method for producing such structure, and display | TOPPAN PRINTING CO., LTD. (JP) | 2023-02-28 | — | — | US | disclosed |
| CN-114975098-A | Nanoimprint liquid material, method for producing pattern of cured product, and method for producing circuit board | 佳能株式会社 | 2022-08-30 | — | — | CN | disclosed |
| CN-107251193-B | Nanoimprint liquid material, method for producing pattern of cured product, method for producing optical component, and method for producing circuit board | 佳能株式会社 | 2022-06-21 | — | — | CN | disclosed |
| CN-104662049-B | Photocurable composition and method for producing film using same | 佳能株式会社 | 2020-06-02 | — | — | CN | disclosed |
| EP-2841255-B1 | RESIN PRODUCTION METHOD AND RESIN PRODUCTION APPARATUS | CANON KK (JP) | 2020-05-13 | — | — | EP | disclosed |
| EP-3647835-A1 | COLORING STRUCTURE, DISPLAY BODY, AND METHOD FOR MANUFACTURING COLORING STRUCTURE | Toppan Printing Co., Ltd. (JP) | 2020-05-06 | — | — | EP | disclosed |
| US-20200132900-A1 | COLOR DEVELOPING STRUCTURE, DISPLAY, AND METHOD FOR PRODUCING COLOR DEVELOPING STRUCTURE | TOPPAN PRINTING CO., LTD. (JP) | 2020-04-30 | — | — | US | disclosed |
| CN-110799861-A | Color developing structure, display body, and method for producing color developing structure | 凸版印刷株式会社 | 2020-02-14 | — | — | CN | disclosed |
| US-10472445-B2 | Photocurable composition and method for manufacturing film | CANON KABUSHIKI KAISHA (JP) | 2019-11-12 | — | — | US | disclosed |
| US-20130137252-A1 | PATTERN FORMING METHOD | CANON KABUSHIKI KAISHA (JP) | 2013-05-30 | — | — | US | disclosed |
| US-8383328-B2 | Method for producing optical part | CANON KABUSHIKI KAISHA (JP) | 2013-02-26 | — | — | US | disclosed |
| US-20120164395-A1 | MANUFACTURING METHOD FOR PLASTIC MEMBER AND PLASTIC MEMBER | CANON KABUSHIKI KAISHA (JP) | 2012-06-28 | — | — | US | disclosed |
| US-20120061864-A1 | METHOD FOR MANUFACTURING LENS, APPARATUS FOR MANUFACTURING LENS, AND METHOD FOR MANUFACTURING OPTICAL APPARATUS | CANON KABUSHIKI KAISHA (JP) | 2012-03-15 | — | — | US | disclosed |
| US-20100273109-A1 | METHOD FOR PRODUCING OPTICAL PART | CANON KABUSHIKI KAISHA (JP) | 2010-10-28 | — | — | US | disclosed |
| EP-2243622-A2 | Method for producing optical part | CANON KABUSHIKI KAISHA (JP) | 2010-10-27 | — | — | EP | disclosed |
| EP-1011029-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2006-08-30 | — | — | EP | disclosed |
| US-6337171-B1 | AS A RESIST APPLICABLE TO FAR ULTRAVIOLET RAYS SUCH AS A KRF EXCIMER LASER, CHARGED PARTICLE RAYS SUCH AS ELECTRON BEAMS, AND X-RAYS | JSR CORPORATION (JP) | 2002-01-08 | — | — | US | disclosed |
| US-6280900-B1 | RADIATION SENSITIVE COMPOSITION WITH ALKALINE DEVELOPER SOLUBLE IN POLYMER COATED ON SUBSTRATE | JSR CORPORATION (JP) | 2001-08-28 | — | — | US | disclosed |
| EP-1011029-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2000-06-21 | — | — | EP | disclosed |