Known targets — ChEMBL curated mechanism
CHRM1CHRM2CHRM3CHRM4CHRM5SLC6A2dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 3/20 | 0.50 |
| ▸ | HTT | P42858 | 1/20 | 0.50 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.50 |
| ▸ | TSHR | P16473 | 1/20 | 0.46 |
| ▸ | BCHE | P06276 | 1/20 | 0.44 |
| ▸ | ACHE | P22303 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.42 |
| ▸ | HSD11B1 | P28845 | 5/20 | 0.42 |
| ▸ | HSD17B2 | P37059 | 3/20 | 0.39 |
| ▸ | HSD17B3 | P37058 | 1/20 | 0.38 |
| ▸ | UQCRB | P14927 | 1/20 | 0.38 |
| ▸ | NPC1 | O15118 | 1/20 | 0.38 |
| ▸ | RECQL | P46063 | 1/20 | 0.38 |
| ▸ | RAB9A | P51151 | 1/20 | 0.38 |
| ▸ | CA1 | P00915 | 2/20 | 0.38 |
| ▸ | CA2 | P00918 | 2/20 | 0.38 |
| ▸ | CA12 | O43570 | 1/20 | 0.38 |
| ▸ | CA9 | Q16790 | 1/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.38 |
| ▸ | MAOA | P21397 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3140895 | 1.00 | LMNA (0.50) | LMNAHTTSMN1; SMN2TSHRBCHE | |
| SCHEMBL5445343 | 0.94 | TSHR (0.52) | LMNAHTTSMN1; SMN2TSHRBCHE | |
| SCHEMBL451538 | 0.92 | ALDH1A1 (0.46) | LMNAHTTSMN1; SMN2ACHEALDH1A1 | |
| SCHEMBL5445839 | 0.91 | ALDH1A1 (0.47) | LMNAHTTSMN1; SMN2ACHEALDH1A1 | |
| SCHEMBL2964104 | 0.89 | CA12 (0.46) | LMNAHTTSMN1; SMN2BCHEACHE | |
| SCHEMBL3144525 | 0.89 | CA12 (0.46) | LMNAHTTSMN1; SMN2BCHEACHE | |
| SCHEMBL5171833 | 0.89 | ALDH1A1 (0.50) | LMNAHTTSMN1; SMN2ALDH1A1HSD11B1 | |
| SCHEMBL7741655 | 0.88 | NR3C2 (0.50) | LMNAHTTSMN1; SMN2ACHEALDH1A1 | |
| SCHEMBL2962482 | 0.87 | GAA (0.45) | LMNAHTTSMN1; SMN2BCHEACHE | |
| SCHEMBL7133269 | 0.87 | CA12 (0.47) | LMNAHTTSMN1; SMN2BCHEACHE |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 205 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-104823110-B | Photosensitive resin composition, photosensitive film, and method for forming resist pattern | 昭和电工材料株式会社 | 2021-06-04 | — | — | CN | claimed |
| JP-4155344-A | — | — | None | — | — | JP | disclosed |
| EP-4328963-B1 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | RESONAC CORP (JP) | 2025-08-27 | — | — | EP | disclosed |
| CN-119836453-A | Polymer, composition, cured product, and display element | JSR株式会社 | 2025-04-15 | — | — | CN | disclosed |
| CN-118749078-A | Photosensitive resin composition set, optical waveguide, method for producing optical waveguide, opto-electric hybrid board, sheet set, core resin composition, coating resin composition, and resin sheet | 味之素株式会社 | 2024-10-08 | — | — | CN | disclosed |
| US-20240282684-A1 | SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME | RESONAC CORPORATION (JP) | 2024-08-22 | — | — | US | disclosed |
| US-20240250025-A1 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE | RESONAC CORPORATION (JP) | 2024-07-25 | — | — | US | disclosed |
| US-11990396-B2 | Substrate and method for manufacturing the same | RESONAC CORPORATION (JP) | 2024-05-21 | — | — | US | disclosed |
| EP-3010943-B1 | CURABLE COMPOSITION, FILM, AND METHOD OF PRODUCING FILM | CANON KK (JP) | 2024-04-03 | — | — | EP | disclosed |
| WO-2024053722-A1 | POLYMER, COMPOSITION, CURED PRODUCT, AND DISPLAY ELEMENT | JSR株式会社 | 2024-03-14 | — | — | WO | disclosed |
| US-20010033994-A1 | Chemical amplification, positive resist compositions | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-10-25 | — | — | US | disclosed |
| US-20010023050-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2001-09-20 | — | — | US | disclosed |
| US-6280902-B1 | RESIN CONVERTED TO ALKALI SOLUBLE TO ALKALI INSOLUBLE OR ALKALI SLIGHTLY ACID SOLUBLE, AN ACID GENERATOR AND NITROGEN CYCLIC COMPOUND | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-08-28 | — | — | US | disclosed |
| US-6280900-B1 | RADIATION SENSITIVE COMPOSITION WITH ALKALINE DEVELOPER SOLUBLE IN POLYMER COATED ON SUBSTRATE | JSR CORPORATION (JP) | 2001-08-28 | — | — | US | disclosed |
| EP-1122605-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| EP-1058153-A1 | Positive working photoresist compositions | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-12-06 | — | — | EP | disclosed |
| US-6143460-A | PHOTOACID GENERATOR PROVIDING IMPROVED PHOTORESIST RESOLUTION | JSR CORPORATION (JP) | 2000-11-07 | — | — | US | disclosed |
| EP-1035436-A1 | Resist pattern formation method | JSR Corporation (JP) | 2000-09-13 | — | — | EP | disclosed |
| EP-0959389-A1 | Diazodisulfone compound and radiation-sensitive resin composition | JSR Corporation (JP) | 1999-11-24 | — | — | EP | disclosed |
| JP-H04155344-A | PHOTO SENSITIVE RESIN COMPOSITION | OKI ELECTRIC IND CO LTD | 1992-05-28 | — | — | JP | disclosed |