Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.46 |
| ▸ | HSD11B1 | P28845 | 4/20 | 0.45 |
| ▸ | NPC1 | O15118 | 2/20 | 0.44 |
| ▸ | RAB9A | P51151 | 2/20 | 0.44 |
| ▸ | RECQL | P46063 | 1/20 | 0.44 |
| ▸ | LMNA | P02545 | 2/20 | 0.41 |
| ▸ | HTT | P42858 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.41 |
| ▸ | HSD17B2 | P37059 | 2/20 | 0.41 |
| ▸ | HSD17B3 | P37058 | 1/20 | 0.41 |
| ▸ | UQCRB | P14927 | 1/20 | 0.41 |
| ▸ | CA1 | P00915 | 2/20 | 0.40 |
| ▸ | CA2 | P00918 | 2/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.40 |
| ▸ | MAOA | P21397 | 1/20 | 0.40 |
| ▸ | NR3C2 | P08235 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.39 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.39 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.39 |
| ▸ | ACHE | P22303 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5445839 | 0.98 | ALDH1A1 (0.47) | ALDH1A1HSD11B1NPC1RAB9ARECQL | |
| SCHEMBL7741655 | 0.92 | NR3C2 (0.50) | ALDH1A1HSD11B1NPC1RAB9ARECQL | |
| SCHEMBL452979 | 0.92 | LMNA (0.50) | ALDH1A1HSD11B1NPC1RAB9ARECQL | |
| SCHEMBL3140895 | 0.92 | LMNA (0.50) | ALDH1A1HSD11B1NPC1RAB9ARECQL | |
| SCHEMBL3134793 | 0.91 | HSD11B1 (0.42) | ALDH1A1HSD11B1NPC1RAB9ARECQL | |
| SCHEMBL3693052 | 0.91 | HSD11B1 (0.43) | ALDH1A1HSD11B1NPC1RAB9ARECQL | |
| SCHEMBL3134860 | 0.91 | HSD11B1 (0.42) | ALDH1A1HSD11B1NPC1RAB9ARECQL | |
| SCHEMBL7578509 | 0.90 | ALDH1A1 (0.44) | ALDH1A1HSD11B1NPC1RAB9ARECQL | |
| SCHEMBL7741631 | 0.88 | MAOA (0.43) | ALDH1A1HSD11B1NPC1RAB9ARECQL | |
| SCHEMBL7738770 | 0.88 | ALDH1A1 (0.43) | ALDH1A1HSD11B1NPC1RAB9ARECQL |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 124 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260077385-A1 | FILM FORMING METHOD, CURABLE COMPOSITION, AND ARTICLE MANUFACTURING METHOD | CANON KABUSHIKI KAISHA (JP) | 2026-03-19 | — | — | US | disclosed |
| US-20260042932-A1 | COMPOSITION, PATTERN FORMING METHOD, AND ARTICLE MANUFACTURING METHOD | CANON KK (JP) | 2026-02-12 | — | — | US | disclosed |
| US-12449731-B2 | Photosensitive resin composition, method for producing resist pattern film, and method for producing plated formed product | ISR CORPORATION (JP) | 2025-10-21 | — | — | US | disclosed |
| WO-2025041685-A1 | PHOTOSENSITIVE RESIN COMPOSITION FOR PRODUCING PLATED MOLDED ARTICLE, METHOD FOR PRODUCING RESIST PATTERN FILM, AND METHOD FOR PRODUCING PLATED MOLDED ARTICLE | JSR株式会社 | 2025-02-27 | — | — | WO | disclosed |
| WO-2025041686-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN FILM, AND METHOD FOR PRODUCING PLATED SHAPED ARTICLE | JSR株式会社 | 2025-02-27 | — | — | WO | disclosed |
| US-12174538-B2 | Photosensitive resin composition, method for producing resist pattern film, method for producing plated formed product, and method for producing tin-silver plated-formed product | JSR CORPORATION (JP) | 2024-12-24 | — | — | US | disclosed |
| WO-2024190595-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN FILM, AND METHOD FOR PRODUCING PLATED SHAPED ARTICLE | JSR株式会社 | 2024-09-19 | — | — | WO | disclosed |
| US-20240219832-A1 | PHOTOSENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2024-07-04 | — | — | US | disclosed |
| EP-3010943-B1 | CURABLE COMPOSITION, FILM, AND METHOD OF PRODUCING FILM | CANON KK (JP) | 2024-04-03 | — | — | EP | disclosed |
| US-20230036031-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN FILM, METHOD FOR PRODUCING PLATED FORMED PRODUCT, AND METHOD FOR PRODUCING TIN-SILVER PLATED-FORMED PRODUCT | JSR CORPORATION (JP) | 2023-02-02 | — | — | US | disclosed |
| US-20020090569-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-07-11 | — | — | US | disclosed |
| US-6403288-B1 | COATING WITH COPOLYMER COMPRISING HYDROXYSTYRENE DERIVATIVE MONOMER HAVING ACID DISSOCIABLE GROUP; EXPOSURE TO RADIATION; DEVELOPMENT | JSR CORPORATION (JP) | 2002-06-11 | — | — | US | disclosed |
| US-20020058201-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-05-16 | — | — | US | disclosed |
| EP-1193558-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2002-04-03 | — | — | EP | disclosed |
| US-20020012872-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-31 | — | — | US | disclosed |
| EP-1164433-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-19 | — | — | EP | disclosed |
| US-20010023050-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2001-09-20 | — | — | US | disclosed |
| US-6280900-B1 | RADIATION SENSITIVE COMPOSITION WITH ALKALINE DEVELOPER SOLUBLE IN POLYMER COATED ON SUBSTRATE | JSR CORPORATION (JP) | 2001-08-28 | — | — | US | disclosed |
| EP-1122605-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| EP-1035436-A1 | Resist pattern formation method | JSR Corporation (JP) | 2000-09-13 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260077385-A1 | FILM FORMING METHOD, CURABLE COMPOSITION, AND ARTICLE MANUFACTURING METHOD | EEF1D, RHOA, YWHAH | ALDH1A1 4238/4885HSD11B1 3683/4885NPC1 2879/4885 |
| US-20260042932-A1 | COMPOSITION, PATTERN FORMING METHOD, AND ARTICLE MANUFACTURING METHOD | SMCHD1, PIM1, PIM2 | ALDH1A1 4758/4885HSD11B1 3620/4885NPC1 1497/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.