SCHEMBL4531763

SCHEMBL4531763

Cc1ccc(/C=C/c2nc(C(Cl)(Cl)CCl)nc(C(Cl)(Cl)CCl)n2)o1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
BRAF P15056 1/20 0.43
ALDH1A1 P00352 9/20 0.38
MAPT P10636 7/20 0.38
KDM4E B2RXH2 6/20 0.38
KMT2A Q03164 4/20 0.38
RAB9A P51151 4/20 0.38
MEN1 O00255 3/20 0.38
HTT P42858 3/20 0.38
SMN1; SMN2 Q16637 3/20 0.38
NPC1 O15118 3/20 0.38
LMNA P02545 2/20 0.38
NFKB1 P19838 1/20 0.38
NFKB2 Q00653 1/20 0.38
RELA Q04206 1/20 0.38
NPSR1 Q6W5P4 1/20 0.38
PKM P14618 3/20 0.33
ALOX5 P09917 2/20 0.33
HPGD P15428 4/20 0.32
MAOA P21397 1/20 0.32
MAOB P27338 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL498610 0.85 BRAF (0.47) BRAFALDH1A1MAPTKDM4EKMT2A
SCHEMBL25422554 0.85 BRAF (0.47) BRAFALDH1A1MAPTKDM4EKMT2A
SCHEMBL498611 0.85 BRAF (0.47) BRAFALDH1A1MAPTKDM4EKMT2A
SCHEMBL30724511 0.77 BRAF (0.40) BRAFALDH1A1MAPTKDM4EKMT2A
SCHEMBL4531766 0.75 BRAF (0.41) BRAFALDH1A1MAPTKDM4EKMT2A
SCHEMBL13742201 0.74 BRAF (0.41) BRAFALDH1A1MAPTKDM4EKMT2A
SCHEMBL5188282 0.74 BRAF (0.41) BRAFALDH1A1MAPTKDM4EKMT2A
SCHEMBL13883530 0.73 BRAF (0.40) BRAFALDH1A1MAPTKDM4EKMT2A
SCHEMBL17122503 0.72 BRAF (0.42) BRAFALDH1A1MAPTKDM4EKMT2A
SCHEMBL14461124 0.70 MAPT (0.61) ALDH1A1MAPTKDM4EKMT2ARAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1562077-B1 CHEMICALLY AMPLIFIED POSITIVE PHOTOSENSITIVE RESIN COMPOSITION MERCK PATENT GMBH (DE) 2018-01-17 EP disclosed
US-20090011367-A1 INTERFACE BINDER, RESIST COMPOSITION CONTAINING THE SAME, LAMINATE FOR FORMING MAGNETIC RECORDING MEDIUM HAVING LAYER CONTAINING THE SAME, MANUFACTURING METHOD OF MAGNETIC RECORDING MEDIUM USING THE SAME, AND MAGNETIC RECORDING MEDIUM PRODUCED BY THE MANUFACTURING METHOD FUJIFILM CORPORATION (JP) 2009-01-08 US disclosed
US-7255972-B2 Chemically amplified positive photosensitive resin composition AZ ELECTRONIC MATERIALS USA CORP. (US) 2007-08-14 US disclosed
US-20050271972-A1 Chemically amplified positive photosensitive resin composition MERCK PATENT GMBH (DE) 2005-12-08 US disclosed
EP-1562077-A1 CHEMICALLY AMPLIFIED POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AZ Electronic Materials (Japan) K.K. (JP) 2005-08-10 EP disclosed