SCHEMBL453405

SCHEMBL453405

CC(C)(C)c1ccc([I+](OS(=O)(=O)c2ccc3ccc4cccc5ccc2c3c45)c2ccc(C(C)(C)C)cc2)cc1

nearest known ligand 0.34

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.34
HPGD P15428 2/20 0.34
CYP3A4 P08684 1/20 0.34
TSHR P16473 1/20 0.34
HSD17B10 Q99714 1/20 0.34
TDP1 Q9NUW8 1/20 0.34
L3MBTL1 Q9Y468 1/20 0.34
HSD17B2 P37059 1/20 0.33
NLRP3 Q96P20 1/20 0.32
HSD11B1 P28845 1/20 0.32
HSD17B3 P37058 1/20 0.32
KDM4E B2RXH2 1/20 0.31
MAPT P10636 1/20 0.31
CA1 P00915 1/20 0.31
CA2 P00918 1/20 0.31
CA9 Q16790 1/20 0.31
NR1I2 O75469 1/20 0.31
ENPP1 P22413 1/20 0.31
GLO1 Q04760 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2904046 0.89 NSD2 (0.34) ALDH1A1HPGDCYP3A4TSHRHSD17B10
SCHEMBL2900120 0.87 ALDH1A1 (0.39) ALDH1A1HPGDCYP3A4TSHRHSD17B10
SCHEMBL221347 0.85 CYP1A2 (0.37) ALDH1A1HPGDCYP3A4TSHRHSD17B10
SCHEMBL2903964 0.84 ALDH1A1 (0.36) ALDH1A1HPGDCYP3A4TSHRHSD17B10
SCHEMBL647379 0.83 CA1 (0.41) HPGDHSD17B2NLRP3HSD11B1HSD17B3
SCHEMBL4653398 0.81 TDP1 (0.39) ALDH1A1HPGDCYP3A4TSHRHSD17B10
SCHEMBL2901777 0.81 ALDH1A1 (0.43) ALDH1A1HPGDCYP3A4TSHRHSD17B10
SCHEMBL28770062 0.80 CA1 (0.46) ALDH1A1HPGDCYP3A4TSHRHSD17B10
Hydrogen Sulfide SCHEMBL14894996 0.79 CA1 (0.45) ALDH1A1HPGDCYP3A4TSHRHSD17B10
SCHEMBL4653539 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 106 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3010943-B1 CURABLE COMPOSITION, FILM, AND METHOD OF PRODUCING FILM CANON KK (JP) 2024-04-03 EP disclosed
EP-2841255-B1 RESIN PRODUCTION METHOD AND RESIN PRODUCTION APPARATUS CANON KK (JP) 2020-05-13 EP disclosed
US-10472445-B2 Photocurable composition and method for manufacturing film CANON KABUSHIKI KAISHA (JP) 2019-11-12 US disclosed
US-10421853-B2 Photosensitive gas generating agent and photocurable composition CANON KABUSHIKI KAISHA (JP) 2019-09-24 US disclosed
EP-2758987-B1 METHOD OF FORMING A FILM CANON KK (JP) 2019-03-20 EP disclosed
US-10208183-B2 Curable composition, film, and method of producing film CANON KABUSHIKI KAISHA (JP) 2019-02-19 US disclosed
US-9982102-B2 Photocurable composition and method of manufacturing film using the composition CANON KABUSHIKI KAISHA (JP) 2018-05-29 US disclosed
US-9961776-B2 Method of producing cured product and method of forming pattern CANON KABUSHIKI KAISHA (JP) 2018-05-01 US disclosed
EP-2847235-B1 PHOTOCURABLE COMPOSITION AND METHOD OF MANUFACTURING FILM USING THE COMPOSITION CANON KK (JP) 2017-11-22 EP disclosed
EP-2850650-B1 PHOTOCURABLE COMPOSITION AND METHOD FOR MANUFACTURING A FILM CANON KK (JP) 2017-09-20 EP disclosed
EP-1164433-A1 Radiation-sensitive resin composition JSR Corporation (JP) 2001-12-19 EP disclosed
US-20010023050-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2001-09-20 US disclosed
US-6280900-B1 RADIATION SENSITIVE COMPOSITION WITH ALKALINE DEVELOPER SOLUBLE IN POLYMER COATED ON SUBSTRATE JSR CORPORATION (JP) 2001-08-28 US disclosed
EP-1122605-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2001-08-08 EP disclosed
US-6235446-B1 MIXTURE OF P-HYDROXYSTYRENE, ACRYLATED ESTER JSR CORPORATION (JP) 2001-05-22 US disclosed
EP-1085379-A1 Radiation-sensitive resin composition JSR Corporation (JP) 2001-03-21 EP disclosed
US-6136500-A CONTAINS A PHOTOACID GENERATOR COMPRISING A COMBINATION OF A COMPOUND THAT GENERATES A CARBOXYLIC ACID UPON EXPOSURE TO RADIATION AND ANOTHER COMPOUND THAT GENERATES ANOTHER ACID UPON EXPOSURE TO RADIATION JSR CORPORATION (JP) 2000-10-24 US disclosed
EP-1035436-A1 Resist pattern formation method JSR Corporation (JP) 2000-09-13 EP disclosed
EP-1011029-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2000-06-21 EP disclosed
EP-0898201-A1 Radiation sensitive resin composition JSR Corporation (JP) 1999-02-24 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10421853-B2 Photosensitive gas generating agent and photocurable composition PFN1, PFAS, FRG1 ALDH1A1 4165/4885HPGD 2092/4885CYP3A4 1320/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.