Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES2 | O00748 | 2/20 | 0.46 |
| ▸ | CYP4F2 | P78329 | 3/20 | 0.44 |
| ▸ | CYP4A11 | Q02928 | 3/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.39 |
| ▸ | ATM | Q13315 | 2/20 | 0.35 |
| ▸ | MEN1 | O00255 | 1/20 | 0.35 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.35 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 2/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | PKM | P14618 | 1/20 | 0.32 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.31 |
| ▸ | HTT | P42858 | 1/20 | 0.31 |
| ▸ | PLA2G4B | P0C869 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16320641 | 0.97 | CES2 (0.46) | CES2CYP4F2CYP4A11ALDH1A1ATM | |
| SCHEMBL16320556 | 0.87 | CES2 (0.38) | CES2CYP4F2CYP4A11ALDH1A1ATM | |
| SCHEMBL6138567 | 0.84 | CES2 (0.38) | CES2CYP4F2CYP4A11ALDH1A1ATM | |
| SCHEMBL28373334 | 0.80 | CES2 (0.51) | CES2ALDH1A1ATMTSHREPHX2 | |
| SCHEMBL15793893 | 0.78 | CYP4F2 (0.36) | CES2CYP4F2CYP4A11ALDH1A1MEN1 | |
| SCHEMBL7642803 | 0.78 | CES2 (0.49) | CES2ALDH1A1ATMTSHREPHX2 | |
| SCHEMBL15793631 | 0.75 | CYP4F2 (0.36) | CYP4F2CYP4A11ALDH1A1MEN1KMT2A | |
| SCHEMBL9738724 | 0.72 | CES2 (0.38) | CES2CYP4F2CYP4A11ALDH1A1ATM | |
| SCHEMBL4917937 | 0.71 | CYP4F2 (0.67) | CYP4F2CYP4A11ALDH1A1ATMMEN1 | |
| SCHEMBL27658429 | 0.70 | CES2 (0.51) | CES2ALDH1A1ATMTSHRPLA2G4B |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11884839-B2 | Acetal-protected silanol group-containing polysiloxane composition | NISSAN CHEMICAL CORPORATION (JP) | 2024-01-30 | — | — | US | disclosed |
| CN-114269860-B | Acoustic lens and composition, acoustic wave and ultrasonic probe and device, photoacoustic wave device, ultrasonic endoscope, and method for manufacturing acoustic wave probe | 富士胶片株式会社 | 2023-04-11 | — | — | CN | disclosed |
| CN-115209811-A | Material for acoustic matching layer, acoustic matching sheet, acoustic wave probe, ultrasonic probe, acoustic wave measurement device, ultrasonic diagnostic device, and method for manufacturing acoustic wave probe | 富士胶片株式会社 | 2022-10-18 | — | — | CN | disclosed |
| CN-114930875-A | Composition for acoustic lens, acoustic wave probe, ultrasonic probe, acoustic wave measurement device, ultrasonic diagnostic device, photoacoustic wave measurement device, ultrasonic endoscope, and method for manufacturing acoustic wave probe | 富士胶片株式会社 | 2022-08-19 | — | — | CN | disclosed |
| CN-114269860-A | Composition for acoustic lens, acoustic wave probe, ultrasonic probe, acoustic wave measurement device, ultrasonic diagnostic device, photoacoustic wave measurement device, ultrasonic endoscope, and method for manufacturing acoustic wave probe | 富士胶片株式会社 | 2022-04-01 | — | — | CN | disclosed |
| US-10838303-B2 | Resist underlayer film forming composition for lithography containing hydrolyzable silane having carbonate skeleton | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2020-11-17 | — | — | US | disclosed |
| US-10558119-B2 | Composition for coating resist pattern | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2020-02-11 | — | — | US | disclosed |
| US-10372040-B2 | Resist underlayer film forming composition for lithography containing hydrolyzable silane having halogen-containing carboxylic acid amide group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2019-08-06 | — | — | US | disclosed |
| US-20190185707-A1 | ACETAL-PROTECTED SILANOL GROUP-CONTAINING POLYSILOXANE COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2019-06-20 | — | — | US | disclosed |
| US-10139729-B2 | Coating composition for pattern reversal on soc pattern | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-11-27 | — | — | US | disclosed |
| US-20050203257-A1 | Resin composition, and optical component, plastic lens and plastic film substrate utilizing the same | FUJI PHOTO FILM CO., LTD. (JP) | 2005-09-15 | — | — | US | disclosed |
| US-20040219380-A1 | Sol-gel method; applying solution containing metal alkoxide and polymer having a hydrogen bond-forming group on film and radiating with electromagnetic waves to form gas barrier layer; durability, accuracy | FUJI PHOTO FILM CO., LTD. | 2004-11-04 | — | — | US | disclosed |
| US-20040209090-A1 | Gas barrier laminate film and method for producing same | FUJI PHOTO FILM CO., LTD. | 2004-10-21 | — | — | US | disclosed |
| US-20040150326-A1 | Network conductor and its production method and use | FUJI PHOTO FILM CO., LTD | 2004-08-05 | — | — | US | disclosed |
| US-20040116555-A1 | Polymer composition containing organic modified layered silicate, film and gas barrier film as well as substrate and image display device using them | FUJI PHOTO FILM CO., LTD. | 2004-06-17 | — | — | US | disclosed |
| US-6716946-B2 | Coating | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-04-06 | — | — | US | disclosed |
| US-20040058157-A1 | Gas barrier film | FUJI PHOTO FILM CO., LTD. | 2004-03-25 | — | — | US | disclosed |
| US-20030004269-A1 | Acrylated resins; high strength, heat resistance | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-01-02 | — | — | US | disclosed |
| EP-1264870-A1 | Coating | Shin-Etsu Chemical Co., Ltd. (JP) | 2002-12-11 | — | — | EP | disclosed |
| EP-1148105-A2 | Composition for film formation, method of film formation, and silica-based film | JSR Corporation (JP) | 2001-10-24 | — | — | EP | disclosed |