Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.41 |
| ▸ | TSHR | P16473 | 3/20 | 0.41 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.41 |
| ▸ | AKR1C1 | Q04828 | 1/20 | 0.40 |
| ▸ | ESR1 | P03372 | 1/20 | 0.40 |
| ▸ | CES1 | P23141 | 1/20 | 0.39 |
| ▸ | TP53 | P04637 | 1/20 | 0.39 |
| ▸ | HTT | P42858 | 1/20 | 0.38 |
| ▸ | FBP1 | P09467 | 3/20 | 0.38 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.36 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.36 |
| ▸ | PRMT1 | Q99873 | 1/20 | 0.36 |
| ▸ | MAOB | P27338 | 1/20 | 0.36 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31464217 | 0.98 | ALDH1A1 (0.40) | ALDH1A1TSHRAKR1C3AKR1C1ESR1 | |
| SCHEMBL7031297 | 0.80 | ALDH1A1 (0.41) | ALDH1A1TSHRAKR1C3AKR1C1ESR1 | |
| SCHEMBL17836918 | 0.78 | ALDH1A1 (0.45) | ALDH1A1TSHRAKR1C3AKR1C1ESR1 | |
| SCHEMBL17836916 | 0.78 | ALDH1A1 (0.45) | ALDH1A1TSHRAKR1C3AKR1C1ESR1 | |
| SCHEMBL10416173 | 0.76 | FBP1 (0.44) | ALDH1A1TSHRAKR1C3AKR1C1ESR1 | |
| SCHEMBL9227444 | 0.76 | ALDH1A1 (0.48) | ALDH1A1TSHRAKR1C3AKR1C1ESR1 | |
| SCHEMBL9227437 | 0.76 | ALDH1A1 (0.48) | ALDH1A1TSHRAKR1C3AKR1C1ESR1 | |
| SCHEMBL10416172 | 0.76 | FBP1 (0.44) | ALDH1A1TSHRAKR1C3AKR1C1ESR1 | |
| SCHEMBL31195612 | 0.76 | ALDH1A1 (0.39) | ALDH1A1TSHRAKR1C3AKR1C1ESR1 | |
| SCHEMBL4995920 | 0.75 | ALDH1A1 (0.46) | ALDH1A1TSHRAKR1C3AKR1C1ESR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119819370-A | Preparation method of photocatalytic degradation material for treating acid chrome blue K sewage | 北方工业大学 | 2025-04-15 | — | — | CN | claimed |
| CN-119819370-B | Preparation method of photocatalytic degradation material for treating acid chrome blue K sewage | 北方工业大学 | 2025-10-03 | — | — | CN | disclosed |
| CN-119819370-A | Preparation method of photocatalytic degradation material for treating acid chrome blue K sewage | 北方工业大学 | 2025-04-15 | — | — | CN | disclosed |
| CN-119819370-A | Preparation method of photocatalytic degradation material for treating acid chrome blue K sewage | 北方工业大学 | 2025-04-15 | — | — | CN | disclosed |
| US-20240124632-A1 | Method for Producing Fluorine-Containing Polymer and Composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-04-18 | — | — | US | disclosed |
| US-20240043593-A1 | Fluorine-Containing Polymer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-02-08 | — | — | US | disclosed |
| CN-116848162-A | Fluorine-containing polymer | 中央硝子株式会社 | 2023-10-03 | — | — | CN | disclosed |
| CN-116694256-A | Special resin adhesive for vehicle-gauge-level power soft-package tab and preparation method thereof | 浙江文壹先端新材料有限公司 | 2023-09-05 | — | — | CN | disclosed |
| CN-112585113-B | Process for distillative purification of fluorine-containing polymerizable monomers | 中央硝子株式会社 | 2023-08-22 | — | — | CN | disclosed |
| CN-116615410-A | Method for producing fluorine-containing polymer and composition | 中央硝子株式会社 | 2023-08-18 | — | — | CN | disclosed |
| US-8663903-B2 | Top coating composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-03-04 | — | — | US | disclosed |
| US-8592508-B2 | Top coat composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-11-26 | — | — | US | disclosed |
| US-20130216960-A1 | Water Repellent Additive for Immersion Resist | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-08-22 | — | — | US | disclosed |
| US-20130177848-A1 | Polymer, Resist Material Containing Same, and Method for Forming Pattern Using Same | CENTRAL GLASS COMPANY LIMITED (JP) | 2013-07-11 | — | — | US | disclosed |
| US-20120077126-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition, Top Coat Composition And Pattern Formation Method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-03-29 | — | — | US | disclosed |
| US-20120064459-A1 | Water Repellent Additive for Immersion Resist | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-03-15 | — | — | US | disclosed |
| US-20120040294-A1 | Top Coating Composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-02-16 | — | — | US | disclosed |
| US-20110245395-A1 | Top Coat Composition | CENTRAL GLASS COMPANY, LIMITED | 2011-10-06 | — | — | US | disclosed |
| US-20110244188-A1 | Polymerizable Fluoromonomer, Fluoropolymer, Resist Material, and Method of Pattern Formation | Central Glass Company , Limited (JP) | 2011-10-06 | — | — | US | disclosed |
| WO-1998000750-A1 | PROCESS FOR PRODUCING LIQUID CRYSTAL ALIGNMENT LAYER AND LIQUID CRYSTAL DISPLAY DEVICE WITH THE USE OF THE SAME | HOECHST RESEARCH & TECHNOLOGY DEUTSCHLAND GMBH & CO. KG (DE) | 1998-01-08 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110244188-A1 | Polymerizable Fluoromonomer, Fluoropolymer, Resist Material, and Method of Pattern Formation | AFF1, FRG1, AFF2 | ALDH1A1 2056/4885TSHR 2566/4885AKR1C3 3061/4885 |
| US-20120077126-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition, Top Coat Composition And Pattern Formation Method | FRG1, AFF2, FBXL19 | ALDH1A1 4430/4885TSHR 2270/4885AKR1C3 4079/4885 |
| US-20240124632-A1 | Method for Producing Fluorine-Containing Polymer and Composition | PFAS, AFF2, AFF1 | ALDH1A1 865/4885TSHR 552/4885AKR1C3 868/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.