SCHEMBL4537455

SCHEMBL4537455

C=CC(=O)Oc1ccc(C(=O)c2ccc(N(CC)CC)cc2)cc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
THRB P10828 2/20 0.51
ELANE P08246 6/20 0.46
MAPT P10636 7/20 0.42
MEN1 O00255 5/20 0.42
KMT2A Q03164 5/20 0.42
POLB P06746 2/20 0.42
GAA P10253 1/20 0.42
MCL1 Q07820 1/20 0.42
NOX1 Q9Y5S8 1/20 0.42
ALDH1A1 P00352 4/20 0.41
ALDH3A1 P30838 1/20 0.41
ALDH1A3 P47895 1/20 0.41
MAPK1 P28482 2/20 0.41
USP2 O75604 1/20 0.41
RECQL P46063 1/20 0.41
TLR9 Q9NR96 1/20 0.41
TDP1 Q9NUW8 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
KDM4E B2RXH2 1/20 0.40
RXFP1 Q9HBX9 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1263566 0.92 THRB (0.58) THRBMAPTMEN1KMT2APOLB
SCHEMBL12234084 0.89 THRB (0.55) THRBMAPTMEN1KMT2APOLB
SCHEMBL16561484 0.85 ELANE (0.43) ELANEMAPTMEN1KMT2APOLB
SCHEMBL26606109 0.84 ELANE (0.59) ELANEMAPTMEN1KMT2APOLB
SCHEMBL9915676 0.84 THRB (0.50) THRBMAPTMEN1KMT2APOLB
SCHEMBL4526045 0.83 HPGD (0.61) THRBELANEMAPTMEN1KMT2A
SCHEMBL13777536 0.83 ELANE (0.49) THRBELANEMAPTALDH1A1L3MBTL1
SCHEMBL4132764 0.82 THRB (0.55) THRBELANEMAPTMEN1KMT2A
SCHEMBL12234100 0.81 THRB (0.47) THRBELANEMAPTMEN1KMT2A
SCHEMBL61950 0.80 ALDH1A1 (0.58) MAPTMEN1KMT2APOLBGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 87 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6555595-B1 Ethylenically-unsaturated monomer, a photoinitiator and poly-3,4-epoxy-1-butene RENSSELAER POLYTECHNIC INSTITUTE 2003-04-29 US claimed
EP-1302519-A1 Photopolymerizable compositions RENSSELAER POLYTECHNIC INSTITUTE (US) 2003-04-16 EP claimed
US-20090202791-A1 ULTRAVIOLET-CURABLE POLYMER COMPOSITION, RESIN MOLDED ARTICLE AND METHOD FOR PRODUCING SAME JSR CORPORATION (JP) 2009-08-13 US disclosed
EP-1958968-A1 ULTRAVIOLET-CURABLE POLYMER COMPOSITION, RESIN MOLDED ARTICLE AND METHOD FOR PRODUCING SAME JSR Corporation (JP) 2008-08-20 EP disclosed
US-20070084369-A1 Flexographic printing plate and process for production thereof JSR CORPORATION (JP) 2007-04-19 US disclosed
EP-1167025-B1 Polymeric material for laser processing JSR CORP (JP) 2006-11-08 EP disclosed
US-20050277061-A1 Polymeric material for laser processing and a laminated body for laser processing thereof, flexographic printing plate and the method of producing the same, and a seal material JSR CORPORATION (JP) 2005-12-15 US disclosed
US-6555595-B1 Ethylenically-unsaturated monomer, a photoinitiator and poly-3,4-epoxy-1-butene RENSSELAER POLYTECHNIC INSTITUTE 2003-04-29 US disclosed
EP-1302519-A1 Photopolymerizable compositions RENSSELAER POLYTECHNIC INSTITUTE (US) 2003-04-16 EP disclosed
US-20020018958-A1 For engraving; odor/fume free; low adhesion of the worked surface for seals JSR CORPORATION (JP) 2002-02-14 US disclosed
EP-1167025-A2 Polymeric material for laser processing JSR Corporation (JP) 2002-01-02 EP disclosed
US-4245031-A Photopolymerizable compositions based on salt-forming polymers and polyhydroxy polyethers E. I. DU PONT DE NEMOURS AND COMPANY (US) 1981-01-13 US disclosed
US-4198242-A Photopolymerizable composition containing an o-nitroaromatic compound as photoinhibitor E. I. DU PONT DE NEMOURS AND COMPANY (US) 1980-04-15 US disclosed
US-4180403-A PHOTORESISTS, ADDITION POLYMERS, DISSOCIATION OF NITROSO DIMERS TO NITROSO INHIBITORS OF POLYMERIZATION E. I. DU PONT DE NEMOURS AND COMPANY (US) 1979-12-25 US disclosed
US-4177074-A HIGH AND LOW MOLECULAR WEIGHT POLYMERS CONTAINING CARBOXYL GROUPS E. I. DU PONT DE NEMOURS AND COMPANY (US) 1979-12-04 US disclosed
US-4168981-A Bis(substituted amino)sulfides as reversible inhibitor sources for photopolymerization E. I. DU PONT DE NEMOURS AND COMPANY (US) 1979-09-25 US disclosed
US-4168982-A Photopolymerizable compositions containing nitroso dimers to selectively inhibit thermal polymerization E. I. DU PONT DE NEMOURS AND COMPANY (US) 1979-09-25 US disclosed
US-4050942-A Nitroso-dimer-containing compositions and photoimaging process E. I. DU PONT DE NEMOURS AND COMPANY (US) 1977-09-27 US disclosed
US-4050941-A PHOTORESISTS E. I. DU PONT DE NEMOURS AND COMPANY (US) 1977-09-27 US disclosed
US-4029505-A PHOTOPOLYMERIZABLE LAYER OF UNSATURATED COMPOUND, DINITROSO COMPOUND, AND FREE-RADICAL GENERATOR E. I. DU PONT DE NEMOURS AND COMPANY (US) 1977-06-14 US disclosed