Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HPGD | P15428 | 3/20 | 0.61 |
| ▸ | MAPT | P10636 | 3/20 | 0.61 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.61 |
| ▸ | RAB9A | P51151 | 2/20 | 0.54 |
| ▸ | NPC1 | O15118 | 2/20 | 0.54 |
| ▸ | LMNA | P02545 | 2/20 | 0.48 |
| ▸ | MEN1 | O00255 | 2/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.48 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.48 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.48 |
| ▸ | TSHR | P16473 | 1/20 | 0.48 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.48 |
| ▸ | THRB | P10828 | 2/20 | 0.47 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.46 |
| ▸ | ELANE | P08246 | 6/20 | 0.45 |
| ▸ | MAOB | P27338 | 2/20 | 0.44 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.43 |
| ▸ | CNR2 | P34972 | 1/20 | 0.42 |
| ▸ | TP53 | P04637 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1263952 | 0.92 | THRB (0.54) | HPGDMAPTALDH1A1RAB9ANPC1 | |
| SCHEMBL13777536 | 0.90 | ELANE (0.49) | HPGDMAPTALDH1A1RAB9ANPC1 | |
| SCHEMBL4132764 | 0.86 | THRB (0.55) | MAPTRAB9ALMNAMEN1KMT2A | |
| SCHEMBL17834009 | 0.85 | RAB9A (0.53) | HPGDMAPTALDH1A1RAB9ANPC1 | |
| SCHEMBL4537455 | 0.83 | THRB (0.51) | MAPTALDH1A1MEN1KMT2ATSHR | |
| SCHEMBL11556448 | 0.83 | MAPT (0.50) | HPGDMAPTALDH1A1RAB9ANPC1 | |
| SCHEMBL21657894 | 0.83 | NPC1 (0.53) | MAPTALDH1A1RAB9ANPC1MEN1 | |
| SCHEMBL12149032 | 0.83 | THRB (0.50) | HPGDMAPTALDH1A1RAB9ANPC1 | |
| SCHEMBL12149002 | 0.83 | THRB (0.50) | HPGDMAPTALDH1A1RAB9ANPC1 | |
| SCHEMBL13777546 | 0.82 | LMNA (0.49) | HPGDMAPTALDH1A1RAB9ANPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 64 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20090202791-A1 | ULTRAVIOLET-CURABLE POLYMER COMPOSITION, RESIN MOLDED ARTICLE AND METHOD FOR PRODUCING SAME | JSR CORPORATION (JP) | 2009-08-13 | — | — | US | disclosed |
| EP-1958968-A1 | ULTRAVIOLET-CURABLE POLYMER COMPOSITION, RESIN MOLDED ARTICLE AND METHOD FOR PRODUCING SAME | JSR Corporation (JP) | 2008-08-20 | — | — | EP | disclosed |
| US-20070084369-A1 | Flexographic printing plate and process for production thereof | JSR CORPORATION (JP) | 2007-04-19 | — | — | US | disclosed |
| EP-1167025-B1 | Polymeric material for laser processing | JSR CORP (JP) | 2006-11-08 | — | — | EP | disclosed |
| US-20050277061-A1 | Polymeric material for laser processing and a laminated body for laser processing thereof, flexographic printing plate and the method of producing the same, and a seal material | JSR CORPORATION (JP) | 2005-12-15 | — | — | US | disclosed |
| US-20020018958-A1 | For engraving; odor/fume free; low adhesion of the worked surface for seals | JSR CORPORATION (JP) | 2002-02-14 | — | — | US | disclosed |
| EP-1167025-A2 | Polymeric material for laser processing | JSR Corporation (JP) | 2002-01-02 | — | — | EP | disclosed |
| EP-0343666-B1 | Correct-reading images from photopolymer electrographic master | DU PONT (US) | 1994-08-03 | — | — | EP | disclosed |
| EP-0084851-B2 | PROCESS FOR PREPARING AN OVERCOATED PHOTOPOLYMER PRINTING PLATE | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-07-14 | — | — | EP | disclosed |
| EP-0185337-B1 | PROCESS FOR PREPARING PHOTOPOLYMER FLEXOGRAPHIC ELEMENT WITH MELT EXTRUSION COATED ELASTOMERIC SURFACE LAYER | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-03-06 | — | — | EP | disclosed |
| US-4180403-A | PHOTORESISTS, ADDITION POLYMERS, DISSOCIATION OF NITROSO DIMERS TO NITROSO INHIBITORS OF POLYMERIZATION | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1979-12-25 | — | — | US | disclosed |
| US-4177074-A | HIGH AND LOW MOLECULAR WEIGHT POLYMERS CONTAINING CARBOXYL GROUPS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1979-12-04 | — | — | US | disclosed |
| EP-0005379-A2 | Photosensitive compositions containing carbonylic halides as activators | Dynachem Corporation (US) | 1979-11-14 | — | — | EP | disclosed |
| EP-0005380-A2 | Phototropic photosensitive compositions containing a fluoran colorformer | Dynachem Corporation (US) | 1979-11-14 | — | — | EP | disclosed |
| US-4168981-A | Bis(substituted amino)sulfides as reversible inhibitor sources for photopolymerization | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1979-09-25 | — | — | US | disclosed |
| US-4168982-A | Photopolymerizable compositions containing nitroso dimers to selectively inhibit thermal polymerization | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1979-09-25 | — | — | US | disclosed |
| US-4065315-A | Phototropic dye system and photosensitive compositions containing the same | DYNACHEM CORPORATION (US) | 1977-12-27 | — | — | US | disclosed |
| US-4050942-A | Nitroso-dimer-containing compositions and photoimaging process | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1977-09-27 | — | — | US | disclosed |
| US-4050941-A | PHOTORESISTS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1977-09-27 | — | — | US | disclosed |
| US-4029505-A | PHOTOPOLYMERIZABLE LAYER OF UNSATURATED COMPOUND, DINITROSO COMPOUND, AND FREE-RADICAL GENERATOR | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1977-06-14 | — | — | US | disclosed |