⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23694120 | 0.77 | CYP2C19 (0.33) | — | |
| SCHEMBL75012 | 0.77 | CYP2C19 (0.33) | — | |
| SCHEMBL18772329 | 0.77 | CYP2C19 (0.33) | — | |
| SCHEMBL4933855 | 0.75 | CYP2D6 (0.31) | — | |
| Maleic Anhydride SCHEMBL6318484 | 0.75 | CYP2D6 (0.32) | — | |
| SCHEMBL2476669 | 0.71 | CYP2D6 (0.32) | — | |
| SCHEMBL14860279 | 0.70 | CYP2D6 (0.30) | — | |
| SCHEMBL4371659 | 0.70 | — | — | |
| SCHEMBL7073285 | 0.69 | CYP2D6 (0.33) | — | |
| SCHEMBL2805726 | 0.68 | CYP2C19 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7579131-B2 | Positive resist composition and method of forming resist pattern using the same | FUJIFILM CORPORATION (JP) | 2009-08-25 | — | — | US | disclosed |
| EP-1505440-A2 | Positive resist composition and method of forming resist pattern using the same | Fuji Photo Film Co., Ltd. (JP) | 2005-02-09 | — | — | EP | disclosed |
| US-20050026073-A1 | Positive resist composition and method of forming resist pattern using the same | FUJI PHOTO FILM CO., LTD. | 2005-02-03 | — | — | US | disclosed |