SCHEMBL4577971

SCHEMBL4577971

OC(COc1ccccc1)CN1CCN(CC(O)COc2ccccc2)CC1

nearest known ligand 0.97

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 1/20 0.97
KDM4E B2RXH2 2/20 0.87
TSHR P16473 3/20 0.84
CYP2D6 P10635 2/20 0.84
HIF1A Q16665 1/20 0.84
MEN1 O00255 2/20 0.80
KMT2A Q03164 2/20 0.80
DRD4 P21917 4/20 0.73
DRD2 P14416 3/20 0.73
DRD3 P35462 3/20 0.73
GLA P06280 1/20 0.71
USP2 O75604 1/20 0.71
ATM Q13315 1/20 0.70
SMN1; SMN2 Q16637 1/20 0.69
HTT P42858 1/20 0.68
CYP2C19 P33261 1/20 0.68
ALDH1A1 P00352 1/20 0.68
MAPT P10636 1/20 0.68
PKM P14618 1/20 0.67
RAB9A P51151 1/20 0.67

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11240406 1.00 L3MBTL1 (0.97) L3MBTL1KDM4ETSHRCYP2D6HIF1A
SCHEMBL3970369 1.00 L3MBTL1 (0.97) L3MBTL1KDM4ETSHRCYP2D6HIF1A
SCHEMBL25010831 0.93 KDM4E (1.00) L3MBTL1KDM4ETSHRCYP2D6HIF1A
SCHEMBL11537591 0.93 KDM4E (1.00) L3MBTL1KDM4ETSHRCYP2D6HIF1A
SCHEMBL25010832 0.93 KDM4E (1.00) L3MBTL1KDM4ETSHRCYP2D6HIF1A
SCHEMBL6131254 0.92 KDM4E (0.85) L3MBTL1KDM4ETSHRCYP2D6HIF1A
SCHEMBL22014323 0.92 L3MBTL1 (0.82) L3MBTL1KDM4ETSHRCYP2D6HIF1A
SCHEMBL4580390 0.92 CYP2D6 (1.00) L3MBTL1KDM4ETSHRCYP2D6HIF1A
SCHEMBL8613867 0.91 MAPT (0.82) L3MBTL1KDM4ETSHRCYP2D6HIF1A
Hydrochloric Acid SCHEMBL11279111 0.90 CYP2D6 (0.97) L3MBTL1KDM4ETSHRCYP2D6HIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 118 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1298490-B1 Photopolymerizable composition and recording material FUJIFILM CORP (JP) 2008-08-13 EP disclosed
US-7399569-B2 Method for producing microcapsules, microcapsules, recording material, and heat-sensitive recording material FUJIFILM CORPORATION (JP) 2008-07-15 US disclosed
US-7300738-B2 Azolinyl acetic acid derivative and azolinyl acetic acid derivative containing recording material FUJIFILM CORPORATION (JP) 2007-11-27 US disclosed
US-7220529-B2 Photopolymerizable composition and recording material using the same FUJIFILM CORPORATION (JP) 2007-05-22 US disclosed
US-7205083-B2 Recording material FUJIFILM CORPORATION (JP) 2007-04-17 US disclosed
EP-1254780-B1 Recording material FUJI PHOTO FILM CO LTD (JP) 2007-01-03 EP disclosed
US-7157407-B2 Heat-sensitive recording material FUJI PHOTO FILM CO., LTD. (JP) 2007-01-02 US disclosed
US-7118844-B2 Diazonium salt and thermal recording material using the same FUJI PHOTO FILM CO., LTD. (JP) 2006-10-10 US disclosed
US-7094731-B2 Recording material FUJI PHOTO FILM CO., LTD. (JP) 2006-08-22 US disclosed
EP-1253466-B1 Diazonium salt and heat-sensitive recording material FUJI PHOTO FILM CO LTD (JP) 2006-05-31 EP disclosed
US-5683850-A HAVING EXCELLENT RAW STOCK STORABILITY AND IMAGE STORAGE CHARACTERISTICS FUJI PHOTO FILM CO., LTD. (JP) 1997-11-04 US disclosed
US-5543260-A RED COLOR; STORAGE STABILITY; COLORFASTNESS FUJI PHOTO FILM CO., LTD. (JP) 1996-08-06 US disclosed
EP-0327318-B1 Heat-sensitive recording materials FUJI PHOTO FILM CO LTD (JP) 1995-07-19 EP disclosed
US-5424164-A Image forming method FUJI PHOTO FILM CO., LTD (JP) 1995-06-13 US disclosed
EP-0337734-B1 Heat-developable diazo copying material FUJI PHOTO FILM CO LTD (JP) 1995-03-08 EP disclosed
US-5236800-A Support; diazo compound; no solvnet; coupling component; basic substance; shelf life FUJI PHOTO FILM CO., LTD. (JP) 1993-08-17 US disclosed
US-4975353-A Support and layer of diazo compound, coupling component for coloration and basic compound FUJI PHOTO FILM CO., LTD. (JP) 1990-12-04 US disclosed
EP-0337734-A2 Heat-developable diazo copying material FUJI PHOTO FILM CO., LTD. (JP) 1989-10-18 EP disclosed
EP-0327318-A2 Heat-sensitive recording materials FUJI PHOTO FILM CO., LTD. (JP) 1989-08-09 EP disclosed
US-4187112-A Photosensitive plate containing nitrogen containing condensation type polyesters TOYOBO CO., LTD. (JP) 1980-02-05 US disclosed