Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 15/20 | 0.38 |
| ▸ | CA1 | P00915 | 14/20 | 0.38 |
| ▸ | MMP1 | P03956 | 2/20 | 0.38 |
| ▸ | MMP2 | P08253 | 2/20 | 0.38 |
| ▸ | MMP9 | P14780 | 2/20 | 0.38 |
| ▸ | MMP8 | P22894 | 2/20 | 0.38 |
| ▸ | MMP13 | P45452 | 2/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | CA12 | O43570 | 1/20 | 0.32 |
| ▸ | CA9 | Q16790 | 1/20 | 0.32 |
| ▸ | ENPP2 | Q13822 | 1/20 | 0.32 |
| ▸ | ESR1 | P03372 | 1/20 | 0.32 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.32 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.32 |
| ▸ | F2 | P00734 | 1/20 | 0.32 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.32 |
| ▸ | PRSS2 | P07478 | 1/20 | 0.32 |
| ▸ | PRSS3 | P35030 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5856417 | 0.98 | CA2 (0.40) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL548129 | 0.94 | CA1 (0.34) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL3141380 | 0.94 | CA1 (0.34) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL3136035 | 0.93 | CA2 (0.36) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL1802709 | 0.93 | CA2 (0.36) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL5124094 | 0.90 | LMNA (0.42) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL3798074 | 0.89 | ESR1 (0.36) | CA2CA1MMP2LMNACA12 | |
| SCHEMBL5856324 | 0.88 | CA1 (0.36) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL5857309 | 0.86 | CA2 (0.38) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL1802633 | 0.85 | CA2 (0.36) | CA2CA1MMP1MMP2MMP9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-122043858-A | EUV patterned resist formation method | 亚历克斯·P·G·罗宾逊 | 2026-05-15 | — | — | CN | disclosed |
| US-11681227-B2 | Enhanced EUV photoresist materials, formulations and processes | IRRESISTIBLE MATERIALS LTD (GB) | 2023-06-20 | — | — | US | disclosed |
| US-20200272050-A1 | Enhanced EUV Photoresist Materials, Formulations and Processes | IRRESISTIBLE MATERIALS, LTD (GB) | 2020-08-27 | — | — | US | disclosed |
| US-10095112-B2 | Multiple trigger photoresist compositions and methods | IRRESISTIBLE MATERIALS LTD (GB) | 2018-10-09 | — | — | US | disclosed |
| US-20180246408-A1 | MULTIPLE TRIGGER PHOTORESIST COMPOSITIONS AND METHODS | IRRESISTIBLE MATERIALS, LTD (GB) | 2018-08-30 | — | — | US | disclosed |
| US-9519215-B2 | Composition of matter and molecular resist made therefrom | IRRESISTIBLE MATERIALS, LTD (GB) | 2016-12-13 | — | — | US | disclosed |
| US-20160246173-A1 | Composition of Matter and Molecular Resist Made Therefrom | IRRESISTIBLE MATERIALS LTD (GB) | 2016-08-25 | — | — | US | disclosed |
| US-9383646-B2 | Two-step photoresist compositions and methods | IRRESISTIBLE MATERIALS LTD (GB) | 2016-07-05 | — | — | US | disclosed |
| US-9323149-B2 | Methanofullerenes | IRRESISTIBLE MATERIALS LTD (GB) | 2016-04-26 | — | — | US | disclosed |
| US-9256126-B2 | Methanofullerenes | IRRESISTIBLE MATERIALS LTD (GB) | 2016-02-09 | — | — | US | disclosed |
| US-20140255849-A1 | Methanofullerenes | IRRESISTIBLE MATERIALS LTD (GB) | 2014-09-11 | — | — | US | disclosed |
| WO-2014078097-A1 | METHANOFULLERENES | ROBINSON ALEX PHILIP GRAHAM (GB) | 2014-05-22 | — | — | WO | disclosed |
| US-20140134843-A1 | Methanofullerenes | IRRESISTIBLE MATERIALS LTD (GB) | 2014-05-15 | — | — | US | disclosed |
| US-7374860-B2 | Positive resist composition and pattern forming method using the same | FUJI FILM CORPORATION (JP) | 2008-05-20 | — | — | US | disclosed |
| US-20060216635-A1 | Positive resist composition and pattern forming method using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2006-09-28 | — | — | US | disclosed |
| EP-1705518-A2 | Positive resist composition and pattern forming method using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2006-09-27 | — | — | EP | disclosed |
| US-7078148-B2 | Photoresist with improved sensitivity and resolution to deep ultraviolet rays/excimer lasers; semiconductors; integrated circuits | JSR CORPORATION (JP) | 2006-07-18 | — | — | US | disclosed |
| US-20040072094-A1 | Radiation sensitive resin composition | JSR CORPORATION (JP) | 2004-04-15 | — | — | US | disclosed |
| US-6358665-B1 | ONIUM SALT PRECURSOR FOR GENERATING FLUOROALKYLSULFONATE | CLARIANT INTERNATIONAL LTD. (CH) | 2002-03-19 | — | — | US | disclosed |
| EP-1033624-A1 | RADIATION-SENSITIVE COMPOSITION OF CHEMICAL AMPLIFICATION TYPE | Clariant International Ltd. (CH) | 2000-09-06 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10095112-B2 | Multiple trigger photoresist compositions and methods | ERCC4, ERCC2, APEX1 | CA2 616/4885CA1 2590/4885MMP1 2965/4885 |
| US-20140134843-A1 | Methanofullerenes | WASF2, ERCC4, TUFM | CA2 4656/4885CA1 4687/4885MMP1 4595/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.