Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.38 |
| ▸ | TAS1R3 | Q7RTX0 | 1/20 | 0.35 |
| ▸ | TAS1R1 | Q7RTX1 | 1/20 | 0.35 |
| ▸ | MEN1 | O00255 | 4/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| 2-Methoxyethanol SCHEMBL3856721 | 0.86 | TSHR (0.36) | TSHRKMT2AALDH1A1 | |
| Propene SCHEMBL4579820 | 0.83 | ALDH1A1 (0.36) | TSHRTAS1R3TAS1R1MEN1KMT2A | |
| 2-Methoxyethanol SCHEMBL3217508 | 0.82 | TSHR (0.33) | TSHR | |
| Propene SCHEMBL4579351 | 0.80 | NAAA (0.36) | TSHRTAS1R3TAS1R1MEN1KMT2A | |
| Propene SCHEMBL6440361 | 0.79 | TSHR (0.36) | TSHRTAS1R3TAS1R1MEN1KMT2A | |
| Propylene Glycol SCHEMBL3193743 | 0.79 | TDP1 (0.43) | TSHR | |
| Ethylene Glycol SCHEMBL28391202 | 0.78 | SMN1; SMN2 (0.42) | TSHRMEN1KMT2ASMN1; SMN2 | |
| 2-Methoxyethanol SCHEMBL15182 | 0.78 | — | — | |
| 2-Methoxyethanol SCHEMBL6754641 | 0.78 | TSHR (0.39) | TSHRMEN1KMT2AALDH1A1 | |
| 2-Methoxyethanol SCHEMBL21612730 | 0.78 | TSHR (0.39) | TSHRMEN1KMT2AALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7425404-B2 | Chemical amplification resist composition and pattern-forming method using the same | FUJIFILM CORPORATION (JP) | 2008-09-16 | — | — | US | disclosed |
| US-7291441-B2 | Positive resist composition and pattern forming method utilizing the same | FUJIFILM CORPORATION (JP) | 2007-11-06 | — | — | US | disclosed |
| US-20060046190-A1 | Positive resist composition and pattern forming method utilizing the same | FUJI PHOTO FILM CO., LTD. | 2006-03-02 | — | — | US | disclosed |
| US-20060040208-A1 | Chemical amplification resist composition and pattern-forming method using the same | FUJI PHOTO FILM CO., LTD. | 2006-02-23 | — | — | US | disclosed |