Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NAAA | Q02083 | 1/20 | 0.36 |
| ▸ | TAS1R3 | Q7RTX0 | 1/20 | 0.33 |
| ▸ | TAS1R1 | Q7RTX1 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Propene SCHEMBL4579715 | 0.89 | NAAA (0.35) | NAAATSHR | |
| Propene SCHEMBL143194 | 0.87 | NAAA (0.45) | NAAATSHR | |
| Propene SCHEMBL4579820 | 0.84 | ALDH1A1 (0.36) | TAS1R3TAS1R1MEN1KMT2ATSHR | |
| Propionic Acid SCHEMBL7662132 | 0.82 | NAAA (0.41) | NAAATSHR | |
| Propene SCHEMBL6440361 | 0.81 | TSHR (0.36) | TAS1R3TAS1R1MEN1KMT2ATSHR | |
| 2-Methoxyethanol SCHEMBL4579796 | 0.80 | NAAA (0.40) | NAAATSHR | |
| 2-Methoxyethanol SCHEMBL4579119 | 0.80 | TSHR (0.38) | TAS1R3TAS1R1MEN1KMT2ATSHR | |
| Propene SCHEMBL6062165 | 0.79 | NAAA (0.52) | NAAATSHR | |
| Propene SCHEMBL181618 | 0.79 | NAAA (0.52) | NAAATSHR | |
| SCHEMBL181426 | 0.77 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7425404-B2 | Chemical amplification resist composition and pattern-forming method using the same | FUJIFILM CORPORATION (JP) | 2008-09-16 | — | — | US | disclosed |
| US-7291441-B2 | Positive resist composition and pattern forming method utilizing the same | FUJIFILM CORPORATION (JP) | 2007-11-06 | — | — | US | disclosed |
| US-20060046190-A1 | Positive resist composition and pattern forming method utilizing the same | FUJI PHOTO FILM CO., LTD. | 2006-03-02 | — | — | US | disclosed |
| US-20060040208-A1 | Chemical amplification resist composition and pattern-forming method using the same | FUJI PHOTO FILM CO., LTD. | 2006-02-23 | — | — | US | disclosed |