Propene

Propene

SCHEMBL4579820

C=CC.COC(=O)C(C)O.COCCOC(C)=O

nearest known ligand 0.40

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.36
TSHR P16473 3/20 0.36
ALOX15 P16050 1/20 0.36
TAS1R3 Q7RTX0 1/20 0.34
TAS1R1 Q7RTX1 1/20 0.34
SMN1; SMN2 Q16637 3/20 0.32
CHRM5 P08912 2/20 0.32
CHRM1 P11229 2/20 0.32
CHRM3 P20309 2/20 0.32
PGR P06401 1/20 0.32
CHRM2 P08172 1/20 0.32
CHRM4 P08173 1/20 0.32
HTR1A P08908 1/20 0.32
CHRNB2 P17787 1/20 0.32
TBXA2R P21731 1/20 0.32
CHRNB4 P30926 1/20 0.32
CHRNA3 P32297 1/20 0.32
CHRNA7 P36544 1/20 0.32
CHRNA4 P43681 1/20 0.32
CHRNA10 Q9GZZ6 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Propene SCHEMBL4578199 0.87 ALDH1A1 (0.42) ALDH1A1TSHRALOX15SMN1; SMN2CHRM5
Propene SCHEMBL219263 0.86 ALDH1A1 (0.46) ALDH1A1TSHRALOX15SMN1; SMN2CHRM5
Propene SCHEMBL487681 0.86 ALDH1A1 (0.46) ALDH1A1TSHRALOX15SMN1; SMN2CHRM5
Propene SCHEMBL10277714 0.86 ALDH1A1 (0.46) ALDH1A1TSHRALOX15SMN1; SMN2CHRM5
Propene SCHEMBL15666 0.86 ALDH1A1 (0.46) ALDH1A1TSHRALOX15SMN1; SMN2CHRM5
Propene SCHEMBL6440361 0.84 TSHR (0.36) ALDH1A1TSHRTAS1R3TAS1R1SMN1; SMN2
Propene SCHEMBL4579351 0.84 NAAA (0.36) TSHRTAS1R3TAS1R1MEN1KMT2A
2-Methoxyethanol SCHEMBL4579119 0.83 TSHR (0.38) ALDH1A1TSHRTAS1R3TAS1R1SMN1; SMN2
Propene SCHEMBL5145274 0.82 ALDH1A1 (0.38) ALDH1A1TSHRALOX15LMNA
Methyl Isobutyl Ketone SCHEMBL22581578 0.80 ALDH1A1 (0.47) ALDH1A1TSHRALOX15SMN1; SMN2CHRM5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7425404-B2 Chemical amplification resist composition and pattern-forming method using the same FUJIFILM CORPORATION (JP) 2008-09-16 US disclosed
US-7291441-B2 Positive resist composition and pattern forming method utilizing the same FUJIFILM CORPORATION (JP) 2007-11-06 US disclosed
US-20060046190-A1 Positive resist composition and pattern forming method utilizing the same FUJI PHOTO FILM CO., LTD. 2006-03-02 US disclosed
US-20060040208-A1 Chemical amplification resist composition and pattern-forming method using the same FUJI PHOTO FILM CO., LTD. 2006-02-23 US disclosed