SCHEMBL4579816

SCHEMBL4579816

O=C1CSC(=S)N1CCN1CCOCC1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GSK3A P49840 8/20 0.49
GSK3B P49841 8/20 0.49
MEN1 O00255 5/20 0.48
KMT2A Q03164 5/20 0.48
GAA P10253 4/20 0.48
ALDH1A1 P00352 4/20 0.47
RECQL P46063 3/20 0.47
PAX8 Q06710 1/20 0.41
KDM1A O60341 1/20 0.40
MAPT P10636 2/20 0.39
THRB P10828 2/20 0.39
HTT P42858 2/20 0.39
TDP1 Q9NUW8 2/20 0.39
POLB P06746 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
CYP1A2 P05177 1/20 0.39
CYP3A4 P08684 1/20 0.39
CYP2D6 P10635 1/20 0.39
CYP2C9 P11712 1/20 0.39
CYP2C19 P33261 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3081982 0.92 MEN1 (0.51) GSK3AGSK3BMEN1KMT2AGAA
SCHEMBL3062340 0.84 GSK3A (0.62) GSK3AGSK3BMEN1KMT2AGAA
SCHEMBL30479909 0.83 MAPT (0.49) GSK3AGSK3BMEN1KMT2AGAA
SCHEMBL31310510 0.73 CA9 (0.54) MEN1KMT2AALDH1A1KDM1AMAPT
SCHEMBL4579359 0.73 GSK3A (0.59) GSK3AGSK3BMEN1KMT2AGAA
SCHEMBL3138532 0.73 GSK3A (0.56) GSK3AGSK3BMEN1KMT2AGAA
SCHEMBL23930054 0.72
Hydrochloric Acid SCHEMBL7533652 0.71 GSK3A (0.56) GSK3AGSK3BMEN1KMT2AGAA
Morpholine SCHEMBL4579822 0.70 GSK3A (0.44) GSK3AGSK3BMEN1KMT2AGAA
SCHEMBL19588475 0.69 ADRA1B (0.47) MEN1KMT2AGAAALDH1A1KDM1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023064368-A1 NOVEL RHODANINE DERIVATIVES AND USES THEREOF GEORGIA STATE UNIVERSITY RESEARCH FOUNDATION, INC. (US) 2023-04-20 WO disclosed
US-7435529-B2 Photosensitive composition and image recording method using the same FUJIFILM CORPORATION (JP) 2008-10-14 US disclosed
EP-1445120-B1 Photosensitive lithographic printing plate FUJIFILM CORP (JP) 2007-07-18 EP disclosed
US-20070009831-A1 PLANOGRAPHIC PRINTING PLATE MATERIAL AND IMAGE FORMATION METHOD KONICA MINOLTA MEDICAL & GRAPHIC, INC. (JP) 2007-01-11 US disclosed
US-20060128823-A1 Radiation curable inkjet recording ink, and method of producing planographic printing plate using same, and ink composition, inkjet recording method, printed material, method of producing a planographic printing plate, and planographic printing plate FUJI PHOTO FILM CO., LTD. 2006-06-15 US disclosed
EP-1657286-A2 Radiation curable ink jet ink, comprising a polymerisation initiation sensitising dye FUJI PHOTO FILM CO., LTD. (JP) 2006-05-17 EP disclosed
US-20060008733-A1 Photosensitive composition and image recording method using the same FUJI PHOTO FILM CO., LTD. 2006-01-12 US disclosed
EP-1615073-A1 Photosensitive composition and image recording method using the same FUJI PHOTO FILM CO., LTD. (JP) 2006-01-11 EP disclosed
EP-1445120-A2 Photosensitive lithographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 2004-08-11 EP disclosed
US-6468711-B1 TITANOCENE COMPOUNDS AND A CARBONYLTHIAZOLE DYE OR MEROCYANINE DYE FUJI PHOTO FILM CO., LTD. (JP) 2002-10-22 US disclosed
EP-1048982-B1 Photopolymerizable composition for short wavelenght semiconductor laser exposure, photosensitive composition and method for polymerizing photosensitive composition FUJI PHOTO FILM CO LTD (JP) 2002-10-02 EP disclosed
US-6335144-B1 FOR A LITHOGRAPHIC PRINTING PLATE PRECURSOR CAPABLE OF PLATE-MAKING BY SCANNING EXPOSURE BASED ON DIGITAL SIGNALS, USED IN OPTICAL IMAGE-FORMING, HOLOGRAPHY, AND A COLOR HARD COPY, PRODUCTION OF ELECTRONIC MATERIALS SUCH AS PHOTORESISTS FUJI PHOTO FILM CO., LTD. 2002-01-01 US disclosed
EP-1048982-A1 Photopolymerizable composition for short wavelenght semiconductor laser exposure, photosensitive composition and method for polymerizing photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 2000-11-02 EP disclosed
EP-0985683-A1 Photosensitive composition and method for manufacturing lithographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 2000-03-15 EP disclosed