Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.54 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.54 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.48 |
| ▸ | MEN1 | O00255 | 3/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.44 |
| ▸ | MAPT | P10636 | 2/20 | 0.44 |
| ▸ | RAB9A | P51151 | 2/20 | 0.44 |
| ▸ | HTT | P42858 | 1/20 | 0.44 |
| ▸ | IDH2 | P48735 | 1/20 | 0.44 |
| ▸ | CES2 | O00748 | 1/20 | 0.44 |
| ▸ | MGLL | Q99685 | 1/20 | 0.44 |
| ▸ | IDO1 | P14902 | 1/20 | 0.43 |
| ▸ | TDO2 | P48775 | 1/20 | 0.43 |
| ▸ | KIF11 | P52732 | 2/20 | 0.42 |
| ▸ | LMNA | P02545 | 1/20 | 0.42 |
| ▸ | ACP3 | P15309 | 1/20 | 0.42 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.41 |
| ▸ | NPC1 | O15118 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.41 |
| ▸ | SRD5A2 | P31213 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6384184 | 1.00 | TSHR (0.54) | TSHRALDH1A1MAPK1MEN1KMT2A | |
| SCHEMBL5404369 | 0.93 | TSHR (0.56) | TSHRALDH1A1MAPK1MEN1KMT2A | |
| SCHEMBL4661338 | 0.93 | TSHR (0.54) | TSHRALDH1A1MAPK1MAPTCES2 | |
| SCHEMBL6513245 | 0.86 | TSHR (0.41) | TSHRALDH1A1MAPK1MEN1KMT2A | |
| Trifluoromethanesulfonic Acid SCHEMBL3253135 | 0.86 | PTPN1 (0.46) | TSHRALDH1A1MAPK1MEN1KMT2A | |
| SCHEMBL6518157 | 0.85 | TSHR (0.39) | TSHRALDH1A1MAPK1MEN1KMT2A | |
| SCHEMBL3203731 | 0.82 | ALDH1A1 (0.59) | TSHRALDH1A1MEN1KMT2AMAPT | |
| SCHEMBL244792 | 0.82 | ALDH1A1 (0.59) | TSHRALDH1A1MEN1KMT2AMAPT | |
| SCHEMBL246546 | 0.81 | HDAC4 (0.41) | TSHRALDH1A1MAPK1RAB9AKIF11 | |
| SCHEMBL242616 | 0.81 | HDAC4 (0.41) | TSHRALDH1A1MAPK1RAB9AKIF11 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 63 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11914294-B2 | Positive resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-20240027903-A1 | Resist Material And Patterning Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20240027902-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20240027909-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20240027902-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20240027909-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-11829067-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-28 | — | — | US | disclosed |
| US-11829067-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-28 | — | — | US | disclosed |
| US-20230367214-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-16 | — | — | US | disclosed |
| US-20230367214-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-16 | — | — | US | disclosed |
| US-9244347-B2 | Resist composition, compound, polymeric compound and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-01-26 | — | — | US | disclosed |
| US-9045398-B2 | Sulfonium salt and photo-acid generator | SAN-APRO LIMITED (JP) | 2015-06-02 | — | — | US | disclosed |
| US-20140357896-A1 | SULFONIUM SALT AND PHOTO-ACID GENERATOR | SAN-APRO LTD. (JP) | 2014-12-04 | — | — | US | disclosed |
| US-20140356787-A1 | RESIST COMPOSITION, COMPOUND, POLYMERIC COMPOUND AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-12-04 | — | — | US | disclosed |
| US-8110337-B2 | Mixture of binder, an unsaturated compound and acid generator; lithography | FUJIFILM CORPORATION (JP) | 2012-02-07 | — | — | US | disclosed |
| US-7442485-B2 | Lithographic process involving on press development | FUJIFILM CORPORATION (JP) | 2008-10-28 | — | — | US | disclosed |
| US-20070229637-A1 | Ink set for ink-jet recording and ink-jet recording method | FUJIFILM CORPORATION (JP) | 2007-10-04 | — | — | US | disclosed |
| EP-1484177-B1 | Lithographic process involving on press development | FUJIFILM CORP (JP) | 2007-08-29 | — | — | EP | disclosed |
| US-20050016402-A1 | Lithographic process involving on press development | FUJI PHOTO FILM CO., LTD. | 2005-01-27 | — | — | US | disclosed |
| EP-1484177-A2 | Lithographic process involving on press development | FUJI PHOTO FILM CO., LTD. (JP) | 2004-12-08 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20140357896-A1 | SULFONIUM SALT AND PHOTO-ACID GENERATOR | SLC7A5, SQOR, CYBA | TSHR 3064/4885ALDH1A1 2290/4885MAPK1 438/4885 |
| US-20240027903-A1 | Resist Material And Patterning Process | LBR, HNRNPU, EWSR1 | TSHR 2364/4885ALDH1A1 4741/4885MAPK1 1639/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.