Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.59 |
| ▸ | TSHR | P16473 | 1/20 | 0.59 |
| ▸ | KIF11 | P52732 | 6/20 | 0.56 |
| ▸ | TRPV6 | Q9H1D0 | 2/20 | 0.47 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.44 |
| ▸ | OPRL1 | P41146 | 1/20 | 0.44 |
| ▸ | BACE1 | P56817 | 1/20 | 0.42 |
| ▸ | NPC1 | O15118 | 1/20 | 0.41 |
| ▸ | RAB9A | P51151 | 1/20 | 0.41 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.40 |
| ▸ | ACP3 | P15309 | 1/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | GAA | P10253 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.39 |
| ▸ | GFER | P55789 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.39 |
| ▸ | GPR3 | P46089 | 1/20 | 0.38 |
| ▸ | CES2 | O00748 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3203731 | 1.00 | ALDH1A1 (0.59) | ALDH1A1TSHRKIF11TRPV6OPRM1 | |
| Hydrochloric Acid SCHEMBL31079531 | 0.98 | ALDH1A1 (0.56) | ALDH1A1TSHRKIF11TRPV6OPRM1 | |
| Bromide SCHEMBL3136045 | 0.98 | ALDH1A1 (0.56) | ALDH1A1TSHRKIF11TRPV6OPRM1 | |
| Bromide SCHEMBL3137320 | 0.98 | ALDH1A1 (0.56) | ALDH1A1TSHRKIF11TRPV6OPRM1 | |
| SCHEMBL3140022 | 0.94 | KIF11 (0.56) | ALDH1A1TSHRKIF11TRPV6OPRM1 | |
| SCHEMBL3136076 | 0.94 | KIF11 (0.56) | ALDH1A1TSHRKIF11TRPV6OPRM1 | |
| Perchlorate SCHEMBL3139982 | 0.92 | ALDH1A1 (0.50) | ALDH1A1TSHRKIF11TRPV6OPRM1 | |
| Perchlorate SCHEMBL3132399 | 0.92 | ALDH1A1 (0.50) | ALDH1A1TSHRKIF11TRPV6OPRM1 | |
| SCHEMBL3190155 | 0.90 | ALDH1A1 (0.48) | ALDH1A1TSHRKIF11TRPV6CES2 | |
| SCHEMBL3130138 | 0.88 | ALDH1A1 (0.46) | ALDH1A1TSHRKIF11TRPV6OPRM1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 89 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1710230-B1 | Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2013-08-14 | — | — | EP | claimed |
| EP-1780199-B1 | Novel fluorohydroxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2012-02-01 | — | — | EP | claimed |
| EP-1780198-B1 | Novel fluorosulfonyloxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2011-10-05 | — | — | EP | claimed |
| US-20190284217-A1 | NOVEL COMPOUND, COMPOSITION INCLUDING SAME, OLEFIN-BASED RESIN COMPOSITION, MOLDED ARTICLE THEREOF, AND METHOD FOR IMPROVING IMPACT RESISTANCE OF MOLDED ARTICLE | ADEKA CORPORATION (JP) | 2019-09-19 | — | — | US | disclosed |
| EP-3533800-A1 | NOVEL COMPOUND, COMPOSITION INCLUDING SAME, OLEFIN-BASED RESIN COMPOSITION, MOLDED ARTICLE THEREOF, AND METHOD FOR IMPROVING IMPACT RESISTANCE OF MOLDED ARTICLE | Adeka Corporation (JP) | 2019-09-04 | — | — | EP | disclosed |
| US-20180011401-A1 | SULFONIC ACID DERIVATIVE, PHOTOACID GENERATOR USING SAME, RESIST COMPOSITION, AND DEVICE MANUFACTURING METHOD | TOYO GOSEI CO., LTD. (JP) | 2018-01-11 | — | — | US | disclosed |
| US-9714217-B2 | Sulfonic acid derivative and photoacid generator | TOYO GOSEI CO., LTD. (JP) | 2017-07-25 | — | — | US | disclosed |
| US-9535325-B2 | Onium salt, chemically amplified positive resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-01-03 | — | — | US | disclosed |
| US-9285678-B2 | Sulfonium salt, resist composition and resist pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-03-15 | — | — | US | disclosed |
| US-9223205-B2 | Acid generator, chemically amplified resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-12-29 | — | — | US | disclosed |
| EP-2105794-B1 | Novel photoacid generator, resist composition, and patterning process | SHINETSU CHEMICAL CO (JP) | 2015-08-19 | — | — | EP | disclosed |
| US-20080085469-A1 | Novel photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2008-04-10 | — | — | US | disclosed |
| US-20070298352-A1 | NOVEL SULFONATE SALTS AND DERIVATIVES, PHOTOACID GENERATORS, RESIST COMPOSITIONS, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-12-27 | — | — | US | disclosed |
| US-20070264596-A1 | Thermal acid generator, resist undercoat material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-11-15 | — | — | US | disclosed |
| US-20070099112-A1 | Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-03 | — | — | US | disclosed |
| US-20070099113-A1 | Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-03 | — | — | US | disclosed |
| EP-1780198-A1 | Novel fluorosulfonyloxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2007-05-02 | — | — | EP | disclosed |
| EP-1780199-A1 | Novel fluorohydroxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2007-05-02 | — | — | EP | disclosed |
| US-20060228648-A1 | Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2006-10-12 | — | — | US | disclosed |
| EP-1710230-A1 | Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2006-10-11 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20180011401-A1 | SULFONIC ACID DERIVATIVE, PHOTOACID GENERATOR USING SAME, RESIST COMPOSITION, AND DEVICE MANUFACTURING METHOD | ASIC1, ASIC3, CRY1 | ALDH1A1 565/4885TSHR 2626/4885KIF11 2935/4885 |
| US-20190284217-A1 | NOVEL COMPOUND, COMPOSITION INCLUDING SAME, OLEFIN-BASED RESIN COMPOSITION, MOLDED ARTICLE THEREOF, AND METHOD FOR IMPROVING IMPACT RESISTANCE OF MOLDED ARTICLE | SETD7, ZMYND8, MRM1 | ALDH1A1 2438/4885TSHR 4643/4885KIF11 942/4885 |
| US-20070298352-A1 | NOVEL SULFONATE SALTS AND DERIVATIVES, PHOTOACID GENERATORS, RESIST COMPOSITIONS, AND PATTERNING PROCESS | HCN3, ASIC3, TST | ALDH1A1 2781/4885TSHR 2374/4885KIF11 2197/4885 |
| US-20080085469-A1 | Novel photoacid generators, resist compositions, and patterning process | RER1, SCO2, ASIC3 | ALDH1A1 1348/4885TSHR 1699/4885KIF11 4152/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.