Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.59 |
| ▸ | TSHR | P16473 | 1/20 | 0.59 |
| ▸ | KIF11 | P52732 | 6/20 | 0.56 |
| ▸ | TRPV6 | Q9H1D0 | 2/20 | 0.47 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.44 |
| ▸ | OPRL1 | P41146 | 1/20 | 0.44 |
| ▸ | BACE1 | P56817 | 1/20 | 0.42 |
| ▸ | NPC1 | O15118 | 1/20 | 0.41 |
| ▸ | RAB9A | P51151 | 1/20 | 0.41 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.40 |
| ▸ | ACP3 | P15309 | 1/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | GAA | P10253 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.39 |
| ▸ | GFER | P55789 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.39 |
| ▸ | GPR3 | P46089 | 1/20 | 0.38 |
| ▸ | CES2 | O00748 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL244792 | 1.00 | ALDH1A1 (0.59) | ALDH1A1TSHRKIF11TRPV6OPRM1 | |
| Hydrochloric Acid SCHEMBL31079531 | 0.98 | ALDH1A1 (0.56) | ALDH1A1TSHRKIF11TRPV6OPRM1 | |
| Bromide SCHEMBL3136045 | 0.98 | ALDH1A1 (0.56) | ALDH1A1TSHRKIF11TRPV6OPRM1 | |
| Bromide SCHEMBL3137320 | 0.98 | ALDH1A1 (0.56) | ALDH1A1TSHRKIF11TRPV6OPRM1 | |
| SCHEMBL3140022 | 0.94 | KIF11 (0.56) | ALDH1A1TSHRKIF11TRPV6OPRM1 | |
| SCHEMBL3136076 | 0.94 | KIF11 (0.56) | ALDH1A1TSHRKIF11TRPV6OPRM1 | |
| Perchlorate SCHEMBL3139982 | 0.92 | ALDH1A1 (0.50) | ALDH1A1TSHRKIF11TRPV6OPRM1 | |
| Perchlorate SCHEMBL3132399 | 0.92 | ALDH1A1 (0.50) | ALDH1A1TSHRKIF11TRPV6OPRM1 | |
| SCHEMBL3190155 | 0.90 | ALDH1A1 (0.48) | ALDH1A1TSHRKIF11TRPV6CES2 | |
| SCHEMBL3130138 | 0.88 | ALDH1A1 (0.46) | ALDH1A1TSHRKIF11TRPV6OPRM1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2023228842-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2023-11-30 | — | — | WO | disclosed |
| WO-2023228847-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2023-11-30 | — | — | WO | disclosed |
| US-20230384676-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING PATTERN, POLYMER, AND COMPOUND | JSR CORPORATION (JP) | 2023-11-30 | — | — | US | disclosed |
| US-20230384676-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING PATTERN, POLYMER, AND COMPOUND | JSR CORPORATION (JP) | 2023-11-30 | — | — | US | disclosed |
| US-20230273519-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR CORPORATION (JP) | 2023-08-31 | — | — | US | disclosed |
| US-11739056-B2 | Carboxylate, carboxylic acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-08-29 | — | — | US | disclosed |
| US-11739056-B2 | Carboxylate, carboxylic acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-08-29 | — | — | US | disclosed |
| US-20230236506-A2 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST PATTERN | JSR CORPORATION (JP) | 2023-07-27 | — | — | US | disclosed |
| US-11709426-B2 | Resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-07-25 | — | — | US | disclosed |
| WO-2023120200-A1 | RADIATION-SENSITIVE COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2023-06-29 | — | — | WO | disclosed |
| US-20100035185-A1 | Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method | CENTRAL GLASS COMPANY, LTD. (JP) | 2010-02-11 | — | — | US | disclosed |
| US-7521168-B2 | Compound that has a reduction potential higher than that of diphenyl iodonium salt and generates an acid upon irradiation of an actinic ray or radiation. | FUJIFILM CORPORATION (JP) | 2009-04-21 | — | — | US | disclosed |
| US-7442485-B2 | Lithographic process involving on press development | FUJIFILM CORPORATION (JP) | 2008-10-28 | — | — | US | disclosed |
| US-7414148-B2 | Process for producing alkoxycarbonylfluoroalkanesulfonates | CENTRAL GLASS COMPANY LIMITED (JP) | 2008-08-19 | — | — | US | disclosed |
| US-20080108846-A1 | PROCESS FOR PRODUCING ALKOXYCARBONYLFLUOROALKANESULFONATES | CENTRAL GLASS COMPANY, LIMITED (JP) | 2008-05-08 | — | — | US | disclosed |
| US-20070229637-A1 | Ink set for ink-jet recording and ink-jet recording method | FUJIFILM CORPORATION (JP) | 2007-10-04 | — | — | US | disclosed |
| EP-1484177-B1 | Lithographic process involving on press development | FUJIFILM CORP (JP) | 2007-08-29 | — | — | EP | disclosed |
| EP-1676835-A1 | PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT | Wako Pure Chemical Industries, Ltd. (JP) | 2006-07-05 | — | — | EP | disclosed |
| US-20050016402-A1 | Lithographic process involving on press development | FUJI PHOTO FILM CO., LTD. | 2005-01-27 | — | — | US | disclosed |
| EP-1484177-A2 | Lithographic process involving on press development | FUJI PHOTO FILM CO., LTD. (JP) | 2004-12-08 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20080108846-A1 | PROCESS FOR PRODUCING ALKOXYCARBONYLFLUOROALKANESULFONATES | ARSA, PFAS, MPST | ALDH1A1 713/4885TSHR 3426/4885KIF11 2514/4885 |
| US-11739056-B2 | Carboxylate, carboxylic acid generator, resist composition and method for producing resist pattern | CHRM1, CHRM2, SCO2 | ALDH1A1 836/4885TSHR 636/4885KIF11 3216/4885 |
| US-20230384676-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING PATTERN, POLYMER, AND COMPOUND | RER1, RFT1, RAD51 | ALDH1A1 347/4885TSHR 2652/4885KIF11 3481/4885 |
| US-20100035185-A1 | Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method | ASIC1, RER1, INSRR | ALDH1A1 1210/4885TSHR 1202/4885KIF11 2588/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.