SCHEMBL4594670

SCHEMBL4594670

C=CC(=O)OC(CC(C)C)c1ccccc1

nearest known ligand 0.44

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
HCAR2 Q8TDS4 1/20 0.43
LMNA P02545 2/20 0.40
ALDH1A1 P00352 2/20 0.40
TSHR P16473 2/20 0.40
THRB P10828 1/20 0.40
CYP2C19 P33261 1/20 0.39
CTSK P43235 1/20 0.37
MMP9 P14780 1/20 0.36
MMP8 P22894 1/20 0.36
MMP14 P50281 1/20 0.36
PABPC1 P11940 1/20 0.36
APOBEC3A P31941 1/20 0.36
APOBEC3G Q9HC16 1/20 0.36
CAPN1 P07384 1/20 0.36
MME P08473 1/20 0.35
PPARG P37231 1/20 0.35
PPARA Q07869 1/20 0.35
KMT2A Q03164 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1371364 0.84 THRB (0.41) HCAR2LMNAALDH1A1THRBCYP2C19
SCHEMBL17844649 0.83 THRB (0.41) HCAR2LMNAALDH1A1THRBCYP2C19
SCHEMBL2461302 0.82 GSR (0.47) HCAR2LMNAALDH1A1THRBCYP2C19
SCHEMBL28948579 0.82 CYP2C19 (0.54) HCAR2LMNAALDH1A1THRBCYP2C19
SCHEMBL28013206 0.82 HCAR2 (0.41) HCAR2LMNATHRBCYP2C19PPARG
3-Methylbutanoic Acid SCHEMBL28013211 0.81 FFAR1 (0.41) HCAR2LMNAALDH1A1TSHRTHRB
Acetic Acid SCHEMBL28013205 0.81 THRB (0.40) HCAR2LMNAALDH1A1THRBCYP2C19
SCHEMBL3171202 0.81 THRB (0.40) HCAR2THRBCYP2C19PPARGPPARA
SCHEMBL1006563 0.81 GABBR2 (0.42) HCAR2ALDH1A1THRBCYP2C19PPARG
SCHEMBL6387829 0.81 THRB (0.41) HCAR2LMNAALDH1A1THRBCYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0843218-B1 Photosensitive composition FUJIFILM CORP (JP) 2008-01-16 EP disclosed
US-6746812-B2 USING A FLUORINE-CONTAINING POLYMER IN THE PHOTOSENSITIVE RESIN COMPOSITION TO GIVE HIGH CONTRAST OF PRINTING PLATE IMAGE WHILE MAINTAINING PRESS LIFE FUJI PHOTO FILM CO., LTD. (JP) 2004-06-08 US disclosed
EP-1314552-A2 Photosensitive resin composition FUJI PHOTO FILM CO., LTD. (JP) 2003-05-28 EP disclosed
EP-0949539-B1 Photosensitive resin composition FUJI PHOTO FILM CO LTD (JP) 2003-03-19 EP disclosed
EP-1225478-A2 Photosensitive resin composition FUJI PHOTO FILM CO., LTD. (JP) 2002-07-24 EP disclosed
US-6423467-B1 USEFUL IN A LITHOGRAPHIC PRINTING PLATES FUJI PHOTO FILM CO., LTD. (JP) 2002-07-23 US disclosed
US-20020086233-A1 Useful in a lithographic printing plates FUJIFILM CORPORATION (JP) 2002-07-04 US disclosed
US-20020051929-A1 Using a fluorine-containing polymer in the photosensitive resin composition to give high contrast of printing plate image while maintaining press life FUJIFILM CORPORATION (JP) 2002-05-02 US disclosed
US-6132931-A A FLUORINE-CONTAINING POLYURETHANE COPOLYMER; FORMING A HIGH CONTRAST IMAGE, INHIBITING HALATION, A SAFE LIGHT TOLERANCE AND A WIDE DEVELOPMENT LATITUDE, WITHOUT LOWERING THE SENSITIVITY FUJI PHOTO FILM CO., LTD. (JP) 2000-10-17 US disclosed
US-6110640-A Photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 2000-08-29 US disclosed
EP-0949539-A2 Photosensitive resin composition FUJI PHOTO FILM CO., LTD. (JP) 1999-10-13 EP disclosed
EP-0843218-A1 Photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 1998-05-20 EP disclosed
CN-1017337-B PROCESS FOR PREPARING PHOSPHINIC ACID DERIVATIVES HOFFMANN LA ROCHE (CH) 1992-07-08 CN disclosed
CN-87101164-A PHOSPHINIC ACID DERIVATIVES 1988-06-29 CN disclosed