SCHEMBL4595523

SCHEMBL4595523

C=CC(=O)NCS(=O)(=O)c1ccccc1C

nearest known ligand 0.42

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.42
ALOX12 P18054 1/20 0.42
HTT P42858 1/20 0.42
GAA P10253 1/20 0.41
KMT2A Q03164 2/20 0.40
CYP3A4 P08684 1/20 0.40
CYP2C9 P11712 1/20 0.40
CYP2C19 P33261 1/20 0.40
MEN1 O00255 1/20 0.40
POLB P06746 2/20 0.39
TGM2 P21980 2/20 0.39
ITGAV P06756 1/20 0.39
TP53 P04637 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
THRB P10828 1/20 0.37
KEAP1 Q14145 1/20 0.37
NFE2L2 Q16236 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL959167 0.78 MAPT (0.60) ALDH1A1HTTKMT2ACYP3A4CYP2C9
SCHEMBL960240 0.76 CA1 (0.48) ALDH1A1HTTGAATGM2ITGAV
SCHEMBL8746171 0.76 MEN1 (0.41) ALDH1A1ALOX12HTTGAAKMT2A
Dimethylamine SCHEMBL25290678 0.75 ZDHHC20 (0.43) ALDH1A1GAACYP3A4CYP2C9CYP2C19
SCHEMBL201255 0.75 ALDH1A1 (0.57) ALDH1A1ALOX12KMT2ACYP3A4CYP2C9
O-Xylene SCHEMBL10395160 0.74 PSMB5 (0.46) ALDH1A1GAAKMT2ACYP3A4CYP2C9
SCHEMBL3182778 0.73 ALDH1A1 (0.42) ALDH1A1ALOX12HTTGAAKMT2A
SCHEMBL11692985 0.73 KEAP1 (0.46) ALDH1A1ALOX12HTTGAAKMT2A
SCHEMBL25290677 0.72 HTT (0.42) HTTKMT2AMEN1TGM2
SCHEMBL707747 0.72 ALDH1A1 (0.49) ALDH1A1ALOX12HTTGAAKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0843218-B1 Photosensitive composition FUJIFILM CORP (JP) 2008-01-16 EP disclosed
US-6132931-A A FLUORINE-CONTAINING POLYURETHANE COPOLYMER; FORMING A HIGH CONTRAST IMAGE, INHIBITING HALATION, A SAFE LIGHT TOLERANCE AND A WIDE DEVELOPMENT LATITUDE, WITHOUT LOWERING THE SENSITIVITY FUJI PHOTO FILM CO., LTD. (JP) 2000-10-17 US disclosed
US-6110640-A Photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 2000-08-29 US disclosed
EP-0843218-A1 Photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 1998-05-20 EP disclosed