Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.46 |
| ▸ | TACR3 | P29371 | 4/20 | 0.40 |
| ▸ | THRB | P10828 | 1/20 | 0.39 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.39 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.38 |
| ▸ | AKT1 | P31749 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.37 |
| ▸ | HPGD | P15428 | 1/20 | 0.36 |
| ▸ | ATM | Q13315 | 1/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.36 |
| ▸ | HTT | P42858 | 1/20 | 0.36 |
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
| ▸ | KLK7 | P49862 | 1/20 | 0.36 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24708816 | 0.89 | THRB (0.43) | HCAR2THRBCYP2C19CYP3A4KMT2A | |
| SCHEMBL5580239 | 0.84 | KDM4E (0.45) | HCAR2THRBCYP2C19CYP3A4KMT2A | |
| SCHEMBL5087975 | 0.83 | HCAR2 (0.41) | HCAR2TACR3THRBCYP2C19CYP3A4 | |
| Hydrochloric Acid SCHEMBL7722976 | 0.83 | ALDH1A1 (0.44) | HCAR2THRBCYP2C19CYP3A4KMT2A | |
| SCHEMBL41557 | 0.82 | HCAR2 (0.67) | HCAR2THRBCYP2C19CYP3A4KMT2A | |
| SCHEMBL28863896 | 0.82 | HCAR2 (0.67) | HCAR2THRBCYP2C19CYP3A4KMT2A | |
| SCHEMBL2399072 | 0.82 | HCAR2 (0.40) | HCAR2CYP2C19CYP3A4KMT2AALDH1A1 | |
| SCHEMBL9709219 | 0.81 | HCAR2 (0.71) | HCAR2TACR3CYP3A4KMT2AALDH1A1 | |
| SCHEMBL27822148 | 0.81 | CYP2D6 (0.52) | HCAR2THRBCYP2C19CYP3A4KMT2A | |
| SCHEMBL9709215 | 0.81 | HCAR2 (0.71) | HCAR2TACR3CYP3A4KMT2AALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10739678-B2 | Photocurable composition, pattern forming method, and method for manufacturing device | FUJIFILM CORPORATION (JP) | 2020-08-11 | — | — | US | disclosed |
| US-20180120698-A1 | PHOTOCURABLE COMPOSITION, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING DEVICE | FUJIFILM CORPORATION (JP) | 2018-05-03 | — | — | US | disclosed |
| US-20180120698-A1 | PHOTOCURABLE COMPOSITION, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING DEVICE | FUJIFILM CORPORATION (JP) | 2018-05-03 | — | — | US | disclosed |
| EP-0843218-B1 | Photosensitive composition | FUJIFILM CORP (JP) | 2008-01-16 | — | — | EP | disclosed |
| US-6746812-B2 | USING A FLUORINE-CONTAINING POLYMER IN THE PHOTOSENSITIVE RESIN COMPOSITION TO GIVE HIGH CONTRAST OF PRINTING PLATE IMAGE WHILE MAINTAINING PRESS LIFE | FUJI PHOTO FILM CO., LTD. (JP) | 2004-06-08 | — | — | US | disclosed |
| EP-1314552-A2 | Photosensitive resin composition | FUJI PHOTO FILM CO., LTD. (JP) | 2003-05-28 | — | — | EP | disclosed |
| EP-0949539-B1 | Photosensitive resin composition | FUJI PHOTO FILM CO LTD (JP) | 2003-03-19 | — | — | EP | disclosed |
| EP-1225478-A2 | Photosensitive resin composition | FUJI PHOTO FILM CO., LTD. (JP) | 2002-07-24 | — | — | EP | disclosed |
| US-6423467-B1 | USEFUL IN A LITHOGRAPHIC PRINTING PLATES | FUJI PHOTO FILM CO., LTD. (JP) | 2002-07-23 | — | — | US | disclosed |
| US-20020086233-A1 | Useful in a lithographic printing plates | FUJIFILM CORPORATION (JP) | 2002-07-04 | — | — | US | disclosed |
| US-20020051929-A1 | Using a fluorine-containing polymer in the photosensitive resin composition to give high contrast of printing plate image while maintaining press life | FUJIFILM CORPORATION (JP) | 2002-05-02 | — | — | US | disclosed |
| US-6132931-A | A FLUORINE-CONTAINING POLYURETHANE COPOLYMER; FORMING A HIGH CONTRAST IMAGE, INHIBITING HALATION, A SAFE LIGHT TOLERANCE AND A WIDE DEVELOPMENT LATITUDE, WITHOUT LOWERING THE SENSITIVITY | FUJI PHOTO FILM CO., LTD. (JP) | 2000-10-17 | — | — | US | disclosed |
| US-6110640-A | Photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2000-08-29 | — | — | US | disclosed |
| EP-0949539-A2 | Photosensitive resin composition | FUJI PHOTO FILM CO., LTD. (JP) | 1999-10-13 | — | — | EP | disclosed |
| EP-0843218-A1 | Photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 1998-05-20 | — | — | EP | disclosed |